Patent
US 9,249,026alcohol solvent
base substance
single crystalline silicon, polycrystalline silicon, mica, or quartz
absolute ethyl alcohol
C₂H₅OH
hydrogen-containing atmosphere
| 600–1000 °C |
| — |
Duration | 6–11 hours | — |
alcohol solvent
base substance
single crystalline silicon, polycrystalline silicon, mica, or quartz
absolute ethyl alcohol
C₂H₅OH
hydrogen-containing atmosphere
| 600–1000 °C |
| — |
Duration | 6–11 hours | — |
alcohol solvent
base substance
single crystalline silicon, polycrystalline silicon, mica, or quartz
absolute ethyl alcohol
C₂H₅OH
hydrogen-containing atmosphere
| 600–1000 °C |
| — |
Duration | 6–11 hours | — |
alcohol solvent
base substance
single crystalline silicon, polycrystalline silicon, mica, or quartz
absolute ethyl alcohol
C₂H₅OH
hydrogen-containing atmosphere
| 600–1000 °C |
| — |
Duration | 6–11 hours | — |