Patent
US 10,233,086organic small molecular material
oxidative sulfonating agent
polyethylene wax
chlorinated polyethylene
acetylene oligomer
polyacetylene
polyalkyne containing a halogen element
polyethylene
polyvinyl chloride
polyalkenes containing a halogen element
concentrated sulfuric acid
H₂SO₄
fuming sulfuric acid
thickness (claimed range) | — | sulfonated graphene |
thickness uniformity (claimed) | — | sulfonated graphene |
sheet diameter uniformity (claimed) | — | sulfonated graphene |
Thickness | 1–2 nm | — |
Temperature | 98–102 °C | — |
Thickness | 80–90 µm | — |
Temperature | 127–129 °C | — |
Thickness | 90–100 µm | — |
Thickness | 3–5 nm | — |
Temperature | 96–99 °C | — |
Thickness | 50–60 µm | — |
Temperature | 163–167 °C | — |
Thickness | 3–6 nm | — |
Thickness | 1–15 nm | — |
Thickness | 1–20 nm | — |
Duration | 1–40 hours | — |
Duration | 900–28800 s | — |
Thickness | 1–300 nm | — |
Thickness | 1–200 nm | — |
Thickness | 1–100 nm | — |
Thickness | 1–50 nm | — |
Thickness | 1–40 nm | — |
Thickness | 1–30 nm | — |
Thickness | 3–20 nm | — |
Thickness | 3–15 nm | — |
Thickness | 5–10 nm | — |
Thickness | 1–100 µm | — |
Thickness | 70–80 µm | — |
Duration | 2–35 hours | — |
Duration | 3–30 hours | — |
Duration | 4–28 hours | — |
Duration | 5–25 hours | — |
Duration | 6–20 hours | — |
Duration | 7–18 hours | — |
Duration | 8–16 hours | — |
Duration | 9–12 hours | — |
Duration | 10–11 hours | — |
Thickness | 0.5–300 nm | — |
Thickness | 0.5–100 nm | — |
Thickness | 1–10 nm | — |
Thickness | 10–20 nm | — |
Thickness | 50–100 µm | — |
Thickness | 0–10 nm | — |
Temperature | ≥ 10 °C | — |
Temperature | ≥ 20 °C | — |
Temperature | ≥ 30 °C | — |
Temperature | ≥ 40 °C | — |
Temperature | 40–130 °C | — |
Temperature | 150–220 °C | — |
Thickness | 1–5 nm | — |
organic small molecular material
oxidative sulfonating agent
polyethylene wax
chlorinated polyethylene
acetylene oligomer
polyacetylene
polyalkyne containing a halogen element
polyethylene
polyvinyl chloride
polyalkenes containing a halogen element
concentrated sulfuric acid
H₂SO₄
fuming sulfuric acid
thickness (claimed range) | — | sulfonated graphene |
thickness uniformity (claimed) | — | sulfonated graphene |
sheet diameter uniformity (claimed) | — | sulfonated graphene |
Thickness | 1–2 nm | — |
Temperature | 98–102 °C | — |
Thickness | 80–90 µm | — |
Temperature | 127–129 °C | — |
Thickness | 90–100 µm | — |
Thickness | 3–5 nm | — |
Temperature | 96–99 °C | — |
Thickness | 50–60 µm | — |
Temperature | 163–167 °C | — |
Thickness | 3–6 nm | — |
Thickness | 1–15 nm | — |
Thickness | 1–20 nm | — |
Duration | 1–40 hours | — |
Duration | 900–28800 s | — |
Thickness | 1–300 nm | — |
Thickness | 1–200 nm | — |
Thickness | 1–100 nm | — |
Thickness | 1–50 nm | — |
Thickness | 1–40 nm | — |
Thickness | 1–30 nm | — |
Thickness | 3–20 nm | — |
Thickness | 3–15 nm | — |
Thickness | 5–10 nm | — |
Thickness | 1–100 µm | — |
Thickness | 70–80 µm | — |
Duration | 2–35 hours | — |
Duration | 3–30 hours | — |
Duration | 4–28 hours | — |
Duration | 5–25 hours | — |
Duration | 6–20 hours | — |
Duration | 7–18 hours | — |
Duration | 8–16 hours | — |
Duration | 9–12 hours | — |
Duration | 10–11 hours | — |
Thickness | 0.5–300 nm | — |
Thickness | 0.5–100 nm | — |
Thickness | 1–10 nm | — |
Thickness | 10–20 nm | — |
Thickness | 50–100 µm | — |
Thickness | 0–10 nm | — |
Temperature | ≥ 10 °C | — |
Temperature | ≥ 20 °C | — |
Temperature | ≥ 30 °C | — |
Temperature | ≥ 40 °C | — |
Temperature | 40–130 °C | — |
Temperature | 150–220 °C | — |
Thickness | 1–5 nm | — |
organic small molecular material
oxidative sulfonating agent
polyethylene wax
chlorinated polyethylene
acetylene oligomer
polyacetylene
polyalkyne containing a halogen element
polyethylene
polyvinyl chloride
polyalkenes containing a halogen element
concentrated sulfuric acid
H₂SO₄
fuming sulfuric acid
thickness (claimed range) | — | sulfonated graphene |
thickness uniformity (claimed) | — | sulfonated graphene |
sheet diameter uniformity (claimed) | — | sulfonated graphene |
Thickness | 1–2 nm | — |
Temperature | 98–102 °C | — |
Thickness | 80–90 µm | — |
Temperature | 127–129 °C | — |
Thickness | 90–100 µm | — |
Thickness | 3–5 nm | — |
Temperature | 96–99 °C | — |
Thickness | 50–60 µm | — |
Temperature | 163–167 °C | — |
Thickness | 3–6 nm | — |
Thickness | 1–15 nm | — |
Thickness | 1–20 nm | — |
Duration | 1–40 hours | — |
Duration | 900–28800 s | — |
Thickness | 1–300 nm | — |
Thickness | 1–200 nm | — |
Thickness | 1–100 nm | — |
Thickness | 1–50 nm | — |
Thickness | 1–40 nm | — |
Thickness | 1–30 nm | — |
Thickness | 3–20 nm | — |
Thickness | 3–15 nm | — |
Thickness | 5–10 nm | — |
Thickness | 1–100 µm | — |
Thickness | 70–80 µm | — |
Duration | 2–35 hours | — |
Duration | 3–30 hours | — |
Duration | 4–28 hours | — |
Duration | 5–25 hours | — |
Duration | 6–20 hours | — |
Duration | 7–18 hours | — |
Duration | 8–16 hours | — |
Duration | 9–12 hours | — |
Duration | 10–11 hours | — |
Thickness | 0.5–300 nm | — |
Thickness | 0.5–100 nm | — |
Thickness | 1–10 nm | — |
Thickness | 10–20 nm | — |
Thickness | 50–100 µm | — |
Thickness | 0–10 nm | — |
Temperature | ≥ 10 °C | — |
Temperature | ≥ 20 °C | — |
Temperature | ≥ 30 °C | — |
Temperature | ≥ 40 °C | — |
Temperature | 40–130 °C | — |
Temperature | 150–220 °C | — |
Thickness | 1–5 nm | — |
organic small molecular material
oxidative sulfonating agent
polyethylene wax
chlorinated polyethylene
acetylene oligomer
polyacetylene
polyalkyne containing a halogen element
polyethylene
polyvinyl chloride
polyalkenes containing a halogen element
concentrated sulfuric acid
H₂SO₄
fuming sulfuric acid
thickness (claimed range) | — | sulfonated graphene |
thickness uniformity (claimed) | — | sulfonated graphene |
sheet diameter uniformity (claimed) | — | sulfonated graphene |
Thickness | 1–2 nm | — |
Temperature | 98–102 °C | — |
Thickness | 80–90 µm | — |
Temperature | 127–129 °C | — |
Thickness | 90–100 µm | — |
Thickness | 3–5 nm | — |
Temperature | 96–99 °C | — |
Thickness | 50–60 µm | — |
Temperature | 163–167 °C | — |
Thickness | 3–6 nm | — |
Thickness | 1–15 nm | — |
Thickness | 1–20 nm | — |
Duration | 1–40 hours | — |
Duration | 900–28800 s | — |
Thickness | 1–300 nm | — |
Thickness | 1–200 nm | — |
Thickness | 1–100 nm | — |
Thickness | 1–50 nm | — |
Thickness | 1–40 nm | — |
Thickness | 1–30 nm | — |
Thickness | 3–20 nm | — |
Thickness | 3–15 nm | — |
Thickness | 5–10 nm | — |
Thickness | 1–100 µm | — |
Thickness | 70–80 µm | — |
Duration | 2–35 hours | — |
Duration | 3–30 hours | — |
Duration | 4–28 hours | — |
Duration | 5–25 hours | — |
Duration | 6–20 hours | — |
Duration | 7–18 hours | — |
Duration | 8–16 hours | — |
Duration | 9–12 hours | — |
Duration | 10–11 hours | — |
Thickness | 0.5–300 nm | — |
Thickness | 0.5–100 nm | — |
Thickness | 1–10 nm | — |
Thickness | 10–20 nm | — |
Thickness | 50–100 µm | — |
Thickness | 0–10 nm | — |
Temperature | ≥ 10 °C | — |
Temperature | ≥ 20 °C | — |
Temperature | ≥ 30 °C | — |
Temperature | ≥ 40 °C | — |
Temperature | 40–130 °C | — |
Temperature | 150–220 °C | — |
Thickness | 1–5 nm | — |