Patent
US 11,225,710METHOD FOR PREPARING SUPER-LUBRICATIVE MULTI-LAYER COMPOSITE FULLERENE-LIKE CARBON LAYER/GRAPHENE-LIKE BORON NITRIDE THIN FILM
Kaixiong Gao
US
Copyright © 2026 Matter42. All rights reserved.
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method for preparing a lubricative multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film, comprising: 1) ultrasonically cleaning a substrate sequentially in absolute ethyl alcohol and acetone; 2) cleaning the substrate by argon plasma bombardment for 15 m in; 3) preparing a fullerene-like carbon layer A having an onion-like structure by high-vacuum medium-frequency magnetron sputtering; 4) preparing a graphene-like boron nitride layer B using a high-vacuum medium-frequency magnetron sputtering and coating device to sputter an elemental boron target; 5) repeating steps (3) and (4) 60-80 times to overlay the fullerene-like carbon layer A and the graphene-like boron nitride layer B in an alternate way to obtain the lubricative multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film with a first layer and a last layer being the fullerene-like carbon layer A. Currently amended
The method of claim 1, wherein the substrate is made of metal or ceramic. Original
The method of claim 1, wherein the fullerene-like carbon layer A has a thickness of 6-12 nm, the graphene-like boron nitride layer B has a thickness of 2.1- 3.5 nm, and the multilayer fullerene-like carbon layer/graphene-like boron nitride lubricative composite thin film has a total thickness of 2-3.5 pm. Previously presented
The method of claim 1, wherein the fullerene-like carbon layer A is prepared by high-vacuum medium-frequency magnetron sputtering using methane or acetylene under a pressure of 10-15 Pa, a negative bias pulsed voltage of 800-1000 V and a duty ratio of 60 %-80% for 10- 50 s. Original
The method of claim 1, wherein the graphene-like boron nitride layer B is prepared using the high-vacuum medium-frequency magnetron sputtering and coating device to sputter the elemental boron target in an atmosphere of nitrogen and argon under a pressure of 0.4- 0.5 Pa, a negative bias pulsed voltage of 400-1000 V and a duty ratio of 60 %-80% for 10-50 s; wherein the nitrogen has a purity of more than 99.99% and a flow rate of 55-95 s cc m; and the argon has a purity of more than 99.99 % and a flow rate of 60-120 s c cm. Original
The method of claim 1, wherein the elemental boron target is rectangular, circular or a rotary column. Previously presented
The preparation method of claim 1, wherein a purity of the elemental boron target is more than 99.9% and is produced by hot forming; and the elemental boron target has a length of 60-90 cm, a width of 10-20 cm and a height of 1-5 cm. Previously presented
Embodiments described in the patent, grouped by the materials and process steps they use.
7 materials3 process steps
A 304 stainless steel substrate is ultrasonically cleaned in ethyl alcohol and acetone for 15 min, blown dry with nitrogen, and placed 80 mm from a target in a chamber. When chamber pressure is below 5×10⁻³ Pa, argon enters at 120 sccm, bias voltage −1000 V, duty ratio 70%, and the substrate is cleaned by argon plasma bombardment for 15 min. CH₄ is introduced at 80 sccm and Ar as process gas to deposit the fullerene-like carbon layer A by medium-frequency magnetron sputtering. Steps are repeated 80 times, alternating with graphene-like boron nitride layer B deposition by sputtering the elemental boron target in N₂/Ar atmosphere.
Layer stacks claimed or described, ordered top of device to substrate.
multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film
Materials described outside the worked examples.
substrate (metal or ceramic)
multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Friction Coefficient | 0.004 dimensionless | multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film |
Friction Coefficient Range | 0.002–0.006 dimensionless | multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film |
Hardness | 20–36 GPa | multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film |
High Temperature Resistance | 600–2000 °C | multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film |
Layer Thickness | 6–12 nm | C |
Layer Thickness | 2.1–3.5 nm | BN |
Total Film Thickness | 2–3.5 µm | multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film |
Pressure | 10–15 Pa | — |
Voltage | 800–1000 V | — |
Pressure | 0.4–0.5 Pa | — |
Voltage | 400–1000 V | — |
Thickness | 60–90 cm | — |
Thickness | 10–20 cm | — |
Thickness | 1–5 cm | — |
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method for preparing a lubricative multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film, comprising: 1) ultrasonically cleaning a substrate sequentially in absolute ethyl alcohol and acetone; 2) cleaning the substrate by argon plasma bombardment for 15 m in; 3) preparing a fullerene-like carbon layer A having an onion-like structure by high-vacuum medium-frequency magnetron sputtering; 4) preparing a graphene-like boron nitride layer B using a high-vacuum medium-frequency magnetron sputtering and coating device to sputter an elemental boron target; 5) repeating steps (3) and (4) 60-80 times to overlay the fullerene-like carbon layer A and the graphene-like boron nitride layer B in an alternate way to obtain the lubricative multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film with a first layer and a last layer being the fullerene-like carbon layer A. Currently amended
The method of claim 1, wherein the substrate is made of metal or ceramic. Original
The method of claim 1, wherein the fullerene-like carbon layer A has a thickness of 6-12 nm, the graphene-like boron nitride layer B has a thickness of 2.1- 3.5 nm, and the multilayer fullerene-like carbon layer/graphene-like boron nitride lubricative composite thin film has a total thickness of 2-3.5 pm. Previously presented
The method of claim 1, wherein the fullerene-like carbon layer A is prepared by high-vacuum medium-frequency magnetron sputtering using methane or acetylene under a pressure of 10-15 Pa, a negative bias pulsed voltage of 800-1000 V and a duty ratio of 60 %-80% for 10- 50 s. Original
The method of claim 1, wherein the graphene-like boron nitride layer B is prepared using the high-vacuum medium-frequency magnetron sputtering and coating device to sputter the elemental boron target in an atmosphere of nitrogen and argon under a pressure of 0.4- 0.5 Pa, a negative bias pulsed voltage of 400-1000 V and a duty ratio of 60 %-80% for 10-50 s; wherein the nitrogen has a purity of more than 99.99% and a flow rate of 55-95 s cc m; and the argon has a purity of more than 99.99 % and a flow rate of 60-120 s c cm. Original
The method of claim 1, wherein the elemental boron target is rectangular, circular or a rotary column. Previously presented
The preparation method of claim 1, wherein a purity of the elemental boron target is more than 99.9% and is produced by hot forming; and the elemental boron target has a length of 60-90 cm, a width of 10-20 cm and a height of 1-5 cm. Previously presented
Embodiments described in the patent, grouped by the materials and process steps they use.
7 materials3 process steps
A 304 stainless steel substrate is ultrasonically cleaned in ethyl alcohol and acetone for 15 min, blown dry with nitrogen, and placed 80 mm from a target in a chamber. When chamber pressure is below 5×10⁻³ Pa, argon enters at 120 sccm, bias voltage −1000 V, duty ratio 70%, and the substrate is cleaned by argon plasma bombardment for 15 min. CH₄ is introduced at 80 sccm and Ar as process gas to deposit the fullerene-like carbon layer A by medium-frequency magnetron sputtering. Steps are repeated 80 times, alternating with graphene-like boron nitride layer B deposition by sputtering the elemental boron target in N₂/Ar atmosphere.
Layer stacks claimed or described, ordered top of device to substrate.
multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film
Materials described outside the worked examples.
substrate (metal or ceramic)
multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Friction Coefficient | 0.004 dimensionless | multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film |
Friction Coefficient Range | 0.002–0.006 dimensionless | multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film |
Hardness | 20–36 GPa | multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film |
High Temperature Resistance | 600–2000 °C | multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film |
Layer Thickness | 6–12 nm | C |
Layer Thickness | 2.1–3.5 nm | BN |
Total Film Thickness | 2–3.5 µm | multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film |
Pressure | 10–15 Pa | — |
Voltage | 800–1000 V | — |
Pressure | 0.4–0.5 Pa | — |
Voltage | 400–1000 V | — |
Thickness | 60–90 cm | — |
Thickness | 10–20 cm | — |
Thickness | 1–5 cm | — |
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method for preparing a lubricative multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film, comprising: 1) ultrasonically cleaning a substrate sequentially in absolute ethyl alcohol and acetone; 2) cleaning the substrate by argon plasma bombardment for 15 m in; 3) preparing a fullerene-like carbon layer A having an onion-like structure by high-vacuum medium-frequency magnetron sputtering; 4) preparing a graphene-like boron nitride layer B using a high-vacuum medium-frequency magnetron sputtering and coating device to sputter an elemental boron target; 5) repeating steps (3) and (4) 60-80 times to overlay the fullerene-like carbon layer A and the graphene-like boron nitride layer B in an alternate way to obtain the lubricative multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film with a first layer and a last layer being the fullerene-like carbon layer A. Currently amended
The method of claim 1, wherein the substrate is made of metal or ceramic. Original
The method of claim 1, wherein the fullerene-like carbon layer A has a thickness of 6-12 nm, the graphene-like boron nitride layer B has a thickness of 2.1- 3.5 nm, and the multilayer fullerene-like carbon layer/graphene-like boron nitride lubricative composite thin film has a total thickness of 2-3.5 pm. Previously presented
The method of claim 1, wherein the fullerene-like carbon layer A is prepared by high-vacuum medium-frequency magnetron sputtering using methane or acetylene under a pressure of 10-15 Pa, a negative bias pulsed voltage of 800-1000 V and a duty ratio of 60 %-80% for 10- 50 s. Original
The method of claim 1, wherein the graphene-like boron nitride layer B is prepared using the high-vacuum medium-frequency magnetron sputtering and coating device to sputter the elemental boron target in an atmosphere of nitrogen and argon under a pressure of 0.4- 0.5 Pa, a negative bias pulsed voltage of 400-1000 V and a duty ratio of 60 %-80% for 10-50 s; wherein the nitrogen has a purity of more than 99.99% and a flow rate of 55-95 s cc m; and the argon has a purity of more than 99.99 % and a flow rate of 60-120 s c cm. Original
The method of claim 1, wherein the elemental boron target is rectangular, circular or a rotary column. Previously presented
The preparation method of claim 1, wherein a purity of the elemental boron target is more than 99.9% and is produced by hot forming; and the elemental boron target has a length of 60-90 cm, a width of 10-20 cm and a height of 1-5 cm. Previously presented
Embodiments described in the patent, grouped by the materials and process steps they use.
7 materials3 process steps
A 304 stainless steel substrate is ultrasonically cleaned in ethyl alcohol and acetone for 15 min, blown dry with nitrogen, and placed 80 mm from a target in a chamber. When chamber pressure is below 5×10⁻³ Pa, argon enters at 120 sccm, bias voltage −1000 V, duty ratio 70%, and the substrate is cleaned by argon plasma bombardment for 15 min. CH₄ is introduced at 80 sccm and Ar as process gas to deposit the fullerene-like carbon layer A by medium-frequency magnetron sputtering. Steps are repeated 80 times, alternating with graphene-like boron nitride layer B deposition by sputtering the elemental boron target in N₂/Ar atmosphere.
Layer stacks claimed or described, ordered top of device to substrate.
multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film
Materials described outside the worked examples.
substrate (metal or ceramic)
multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Friction Coefficient | 0.004 dimensionless | multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film |
Friction Coefficient Range | 0.002–0.006 dimensionless | multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film |
Hardness | 20–36 GPa | multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film |
High Temperature Resistance | 600–2000 °C | multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film |
Layer Thickness | 6–12 nm | C |
Layer Thickness | 2.1–3.5 nm | BN |
Total Film Thickness | 2–3.5 µm | multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film |
Pressure | 10–15 Pa | — |
Voltage | 800–1000 V | — |
Pressure | 0.4–0.5 Pa | — |
Voltage | 400–1000 V | — |
Thickness | 60–90 cm | — |
Thickness | 10–20 cm | — |
Thickness | 1–5 cm | — |
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method for preparing a lubricative multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film, comprising: 1) ultrasonically cleaning a substrate sequentially in absolute ethyl alcohol and acetone; 2) cleaning the substrate by argon plasma bombardment for 15 m in; 3) preparing a fullerene-like carbon layer A having an onion-like structure by high-vacuum medium-frequency magnetron sputtering; 4) preparing a graphene-like boron nitride layer B using a high-vacuum medium-frequency magnetron sputtering and coating device to sputter an elemental boron target; 5) repeating steps (3) and (4) 60-80 times to overlay the fullerene-like carbon layer A and the graphene-like boron nitride layer B in an alternate way to obtain the lubricative multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film with a first layer and a last layer being the fullerene-like carbon layer A. Currently amended
The method of claim 1, wherein the substrate is made of metal or ceramic. Original
The method of claim 1, wherein the fullerene-like carbon layer A has a thickness of 6-12 nm, the graphene-like boron nitride layer B has a thickness of 2.1- 3.5 nm, and the multilayer fullerene-like carbon layer/graphene-like boron nitride lubricative composite thin film has a total thickness of 2-3.5 pm. Previously presented
The method of claim 1, wherein the fullerene-like carbon layer A is prepared by high-vacuum medium-frequency magnetron sputtering using methane or acetylene under a pressure of 10-15 Pa, a negative bias pulsed voltage of 800-1000 V and a duty ratio of 60 %-80% for 10- 50 s. Original
The method of claim 1, wherein the graphene-like boron nitride layer B is prepared using the high-vacuum medium-frequency magnetron sputtering and coating device to sputter the elemental boron target in an atmosphere of nitrogen and argon under a pressure of 0.4- 0.5 Pa, a negative bias pulsed voltage of 400-1000 V and a duty ratio of 60 %-80% for 10-50 s; wherein the nitrogen has a purity of more than 99.99% and a flow rate of 55-95 s cc m; and the argon has a purity of more than 99.99 % and a flow rate of 60-120 s c cm. Original
The method of claim 1, wherein the elemental boron target is rectangular, circular or a rotary column. Previously presented
The preparation method of claim 1, wherein a purity of the elemental boron target is more than 99.9% and is produced by hot forming; and the elemental boron target has a length of 60-90 cm, a width of 10-20 cm and a height of 1-5 cm. Previously presented
Embodiments described in the patent, grouped by the materials and process steps they use.
7 materials3 process steps
A 304 stainless steel substrate is ultrasonically cleaned in ethyl alcohol and acetone for 15 min, blown dry with nitrogen, and placed 80 mm from a target in a chamber. When chamber pressure is below 5×10⁻³ Pa, argon enters at 120 sccm, bias voltage −1000 V, duty ratio 70%, and the substrate is cleaned by argon plasma bombardment for 15 min. CH₄ is introduced at 80 sccm and Ar as process gas to deposit the fullerene-like carbon layer A by medium-frequency magnetron sputtering. Steps are repeated 80 times, alternating with graphene-like boron nitride layer B deposition by sputtering the elemental boron target in N₂/Ar atmosphere.
Layer stacks claimed or described, ordered top of device to substrate.
multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film
Materials described outside the worked examples.
substrate (metal or ceramic)
multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Friction Coefficient | 0.004 dimensionless | multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film |
Friction Coefficient Range | 0.002–0.006 dimensionless | multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film |
Hardness | 20–36 GPa | multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film |
High Temperature Resistance | 600–2000 °C | multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film |
Layer Thickness | 6–12 nm | C |
Layer Thickness | 2.1–3.5 nm | BN |
Total Film Thickness | 2–3.5 µm | multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film |
Pressure | 10–15 Pa | — |
Voltage | 800–1000 V | — |
Pressure | 0.4–0.5 Pa | — |
Voltage | 400–1000 V | — |
Thickness | 60–90 cm | — |
Thickness | 10–20 cm | — |
Thickness | 1–5 cm | — |