Patent
US 10,266,413graphene-based material (uGO)
heptane
C₇H₁₆
toluene
C₇H₈
chloroform
CHCl₃
HMA (hexyl methacrylate or similar monomer)
N,N'-Methylenebisacrylamide
DI water
H₂O
KPS (potassium persulfate)
K₂S₂O₈
TEMED (tetramethylethylenediamine)
graphene-based material (uGO)
heptane
C₇H₁₆
toluene
C₇H₈
chloroform
CHCl₃
HMA (hexyl methacrylate or similar monomer)
N,N'-Methylenebisacrylamide
DI water
H₂O
KPS (potassium persulfate)
K₂S₂O₈
TEMED (tetramethylethylenediamine)
graphene-based material (uGO)
heptane
C₇H₁₆
toluene
C₇H₈
chloroform
CHCl₃
HMA (hexyl methacrylate or similar monomer)
N,N'-Methylenebisacrylamide
DI water
H₂O
KPS (potassium persulfate)
K₂S₂O₈
TEMED (tetramethylethylenediamine)
graphene-based material (uGO)
heptane
C₇H₁₆
toluene
C₇H₈
chloroform
CHCl₃
HMA (hexyl methacrylate or similar monomer)
N,N'-Methylenebisacrylamide
DI water
H₂O
KPS (potassium persulfate)
K₂S₂O₈
TEMED (tetramethylethylenediamine)