Patent
US 9,337,392insulator layer
semiconductor substrate
silicon
Si
C-shaped graphene arch layer
doped silicon substrate
reverse T-shaped deposited silicon layer
SiO₂ insulator layer
SiO₂
graphene
arcuate-shaped graphene layer active length (L_Active = pi*Rc) along first surface in x-z plane | 100–1500 | arcuate-shaped graphene layer |
pre-determined contact length (L_contact) along z-axis for C-shaped graphene arch | 10–100 | C-shaped graphene arch layer |
C-shaped graphene arch layer width in y-direction | 10–100 | C-shaped graphene arch layer |
C-shaped graphene arch layer active length (L_Active = pi*Rc) along first surface in x-z plane | 100–1500 | C-shaped graphene arch layer |
supplementary SiO2 insulator layer height along z-axis | 1–2 | SiO₂ |
SiO2 insulator layer (104B) height along z-axis | 1–2 | insulator layer |
Thickness | 0.5–5 nm | — |
Thickness | 10–100 nm | — |
Thickness | 1–2 µm | — |
Thickness | 100–1500 nm | — |
DEPOSITING A PASSIVATION LAYER ON A GRAPHENE SHEET
insulator layer
semiconductor substrate
silicon
Si
C-shaped graphene arch layer
doped silicon substrate
reverse T-shaped deposited silicon layer
SiO₂ insulator layer
SiO₂
graphene
arcuate-shaped graphene layer active length (L_Active = pi*Rc) along first surface in x-z plane | 100–1500 | arcuate-shaped graphene layer |
pre-determined contact length (L_contact) along z-axis for C-shaped graphene arch | 10–100 | C-shaped graphene arch layer |
C-shaped graphene arch layer width in y-direction | 10–100 | C-shaped graphene arch layer |
C-shaped graphene arch layer active length (L_Active = pi*Rc) along first surface in x-z plane | 100–1500 | C-shaped graphene arch layer |
supplementary SiO2 insulator layer height along z-axis | 1–2 | SiO₂ |
SiO2 insulator layer (104B) height along z-axis | 1–2 | insulator layer |
Thickness | 0.5–5 nm | — |
Thickness | 10–100 nm | — |
Thickness | 1–2 µm | — |
Thickness | 100–1500 nm | — |
DEPOSITING A PASSIVATION LAYER ON A GRAPHENE SHEET
insulator layer
semiconductor substrate
silicon
Si
C-shaped graphene arch layer
doped silicon substrate
reverse T-shaped deposited silicon layer
SiO₂ insulator layer
SiO₂
graphene
arcuate-shaped graphene layer active length (L_Active = pi*Rc) along first surface in x-z plane | 100–1500 | arcuate-shaped graphene layer |
pre-determined contact length (L_contact) along z-axis for C-shaped graphene arch | 10–100 | C-shaped graphene arch layer |
C-shaped graphene arch layer width in y-direction | 10–100 | C-shaped graphene arch layer |
C-shaped graphene arch layer active length (L_Active = pi*Rc) along first surface in x-z plane | 100–1500 | C-shaped graphene arch layer |
supplementary SiO2 insulator layer height along z-axis | 1–2 | SiO₂ |
SiO2 insulator layer (104B) height along z-axis | 1–2 | insulator layer |
Thickness | 0.5–5 nm | — |
Thickness | 10–100 nm | — |
Thickness | 1–2 µm | — |
Thickness | 100–1500 nm | — |
DEPOSITING A PASSIVATION LAYER ON A GRAPHENE SHEET
insulator layer
semiconductor substrate
silicon
Si
C-shaped graphene arch layer
doped silicon substrate
reverse T-shaped deposited silicon layer
SiO₂ insulator layer
SiO₂
graphene
arcuate-shaped graphene layer active length (L_Active = pi*Rc) along first surface in x-z plane | 100–1500 | arcuate-shaped graphene layer |
pre-determined contact length (L_contact) along z-axis for C-shaped graphene arch | 10–100 | C-shaped graphene arch layer |
C-shaped graphene arch layer width in y-direction | 10–100 | C-shaped graphene arch layer |
C-shaped graphene arch layer active length (L_Active = pi*Rc) along first surface in x-z plane | 100–1500 | C-shaped graphene arch layer |
supplementary SiO2 insulator layer height along z-axis | 1–2 | SiO₂ |
SiO2 insulator layer (104B) height along z-axis | 1–2 | insulator layer |
Thickness | 0.5–5 nm | — |
Thickness | 10–100 nm | — |
Thickness | 1–2 µm | — |
Thickness | 100–1500 nm | — |
DEPOSITING A PASSIVATION LAYER ON A GRAPHENE SHEET