Patent
US 9,550,678Patent
Atlas literature
Patent
US 9,550,678Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
1: An oligophenylene monomer of general formula (I): SVG 14367041.06-30-2016.IQ₂LE₇S₉RXEAPX2.CLM.1.svg 3.87 1.7 Black and white wherein R 1 is a linear or branched C 1 -C 30 alkyl and R 2 is H; W and R 2 are cach independently H, halogen, OH, NHL, CN, NO 2 or a linear or branched, saturated or unsaturated C 4 -F 4 hydrocarbon residue, which may be substituted 1 to 5 fold with halogen (F, Cl, Br, I), OR 3, NR T, CN and/or NO2, and wherein one or more CH I groups may be replaced by O, S, NR ' NR 4, OC(O) or C(O), or an optionally substituted aryl, alkylaryl or alkoxyaryl residue; each R 3 are each independently H, C -C- akyl, C₂ -C-q alkenyl, C 2-C alkynyl, C 1 -Go haloalkyl, C 2 -G haloalkenyl, C 2 -Ca haloalkynyl or C 2 -Go acyl; 3 Application No. 14/367,041 Reply to the Office Action dated each R 4 are each independently of each other H, C₄ -G. alkyl, C;-Go alkenyl, C- 2 -G- alkynyl, C₄ -Go haloalkyl, C 2 -G- haloalkenyl, C 2 -G- haloalk y nyl or C 2 -Go acyl; and m represents 0, 1 or 2.
2: The oligophenylene monomer of claim 1, wherein each R I represents a methyl, ethyl, n-propyl, isopropyl, n-butyl, sec.-butyl, isobutyl, tert-butyl, n- pentyl, 2-pentyl, 3-pentyl, 2,2-dimethylpropyl, 1,1,3,3-tetramethylpentyl, n-hexvl, 1- methylhexyl, 1,1,3,3,5,5-hexamethylhexyl, n-heptyl, isoheptyl, 1,1,3,3-tetramethylbutyl, 1- methylheptyl, 3-methylheptyl, n-octyl, 1,1,3,3-tetramethylbutyl and 2-ethylhexyl, n-nonyl, decyl, undecyl, dodecyl, tridecyl, tetradecyl, pentadecyl, hexadecyl, heptadecyl, octadecyl, eicosyl, heneicosyl, docosvl, tetracosvl, or pentacosvl group and R₂ are each independently H, C -Go alkyl, C 4 -Ga alkoxy, C -G al k ylthio, C 2-G o alkenyl, C;-G alkynyl, C 4 -G haloalkyl, C;-QG haloalkenyl or haloalk y nyl.
3: The oligophenylene monomer of claim 1, wherein m represents 0.
4. canceled
5: A polymeric precursor for preparing graphene nanoribbons having repeating units of general formula (II): 4 Application No. 14/367,041 Reply to the Office Action dated SVG 14367041.06-30-2016.IQ₂LE₇S₉RXEAPX2.CLM.2.svg 3.65 1.48 Black and white (0) wherein R₁ is a linear or branched C 1 -C 30 alkyl and R 2 is H; R 4 and R 2 are each independently H, halogen, OH, NH S, CN, NO 2 or a linear or branched, saturated or unsaturated C 4 -@44 hydrocarbon residue, which may be substituted 1 to 5 fold with halogen (F, CI, Br, I), OR ', NR 2, CN and/or NO 2, and wherein one or more CH L groups may be replaced by O, S, NR 4, OC(O) or C(O), or an optionally substituted aryl, alkylaryl or alkoxyaryl residue; each R 3 are each independently H, C 1 -C 30 akyl, C 2 -C 30 alkenyl, C 2 -C 30 alkynyl, C 1 -C 30 haloalkyl, C 2 -C 3 0 haloalkenyl, C 2 -C 3 o haloalkynyl or C 2 -C 3 0 acyl; each R 4 are each independently H, C 1 -C 30 alkyl, C 2 -C 3 0 alkenyl, C 2 -C 3 0 alkynyl, C 1 -C 3 o haloalkyl, C 2 -C haloalkenyl, C 2 -C 30 haloalkynyl or C 2 -C 30 acyl; m represents 0, 1 or 2; and 5 Application No. 14/367,041 Reply to the Office Action dated n represents a number of from 2 to
Materials described outside the worked examples.
oligophenylene monomer of general formula (I)
polymeric precursor for graphene nanoribbons of general formula (II)
graphene nanoribbons
Additional fabrication and treatment steps described in the patent.
Patent
Atlas literature
Patent
US 9,550,678Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
1: An oligophenylene monomer of general formula (I): SVG 14367041.06-30-2016.IQ₂LE₇S₉RXEAPX2.CLM.1.svg 3.87 1.7 Black and white wherein R 1 is a linear or branched C 1 -C 30 alkyl and R 2 is H; W and R 2 are cach independently H, halogen, OH, NHL, CN, NO 2 or a linear or branched, saturated or unsaturated C 4 -F 4 hydrocarbon residue, which may be substituted 1 to 5 fold with halogen (F, Cl, Br, I), OR 3, NR T, CN and/or NO2, and wherein one or more CH I groups may be replaced by O, S, NR ' NR 4, OC(O) or C(O), or an optionally substituted aryl, alkylaryl or alkoxyaryl residue; each R 3 are each independently H, C -C- akyl, C₂ -C-q alkenyl, C 2-C alkynyl, C 1 -Go haloalkyl, C 2 -G haloalkenyl, C 2 -Ca haloalkynyl or C 2 -Go acyl; 3 Application No. 14/367,041 Reply to the Office Action dated each R 4 are each independently of each other H, C₄ -G. alkyl, C;-Go alkenyl, C- 2 -G- alkynyl, C₄ -Go haloalkyl, C 2 -G- haloalkenyl, C 2 -G- haloalk y nyl or C 2 -Go acyl; and m represents 0, 1 or 2.
2: The oligophenylene monomer of claim 1, wherein each R I represents a methyl, ethyl, n-propyl, isopropyl, n-butyl, sec.-butyl, isobutyl, tert-butyl, n- pentyl, 2-pentyl, 3-pentyl, 2,2-dimethylpropyl, 1,1,3,3-tetramethylpentyl, n-hexvl, 1- methylhexyl, 1,1,3,3,5,5-hexamethylhexyl, n-heptyl, isoheptyl, 1,1,3,3-tetramethylbutyl, 1- methylheptyl, 3-methylheptyl, n-octyl, 1,1,3,3-tetramethylbutyl and 2-ethylhexyl, n-nonyl, decyl, undecyl, dodecyl, tridecyl, tetradecyl, pentadecyl, hexadecyl, heptadecyl, octadecyl, eicosyl, heneicosyl, docosvl, tetracosvl, or pentacosvl group and R₂ are each independently H, C -Go alkyl, C 4 -Ga alkoxy, C -G al k ylthio, C 2-G o alkenyl, C;-G alkynyl, C 4 -G haloalkyl, C;-QG haloalkenyl or haloalk y nyl.
3: The oligophenylene monomer of claim 1, wherein m represents 0.
4. canceled
5: A polymeric precursor for preparing graphene nanoribbons having repeating units of general formula (II): 4 Application No. 14/367,041 Reply to the Office Action dated SVG 14367041.06-30-2016.IQ₂LE₇S₉RXEAPX2.CLM.2.svg 3.65 1.48 Black and white (0) wherein R₁ is a linear or branched C 1 -C 30 alkyl and R 2 is H; R 4 and R 2 are each independently H, halogen, OH, NH S, CN, NO 2 or a linear or branched, saturated or unsaturated C 4 -@44 hydrocarbon residue, which may be substituted 1 to 5 fold with halogen (F, CI, Br, I), OR ', NR 2, CN and/or NO 2, and wherein one or more CH L groups may be replaced by O, S, NR 4, OC(O) or C(O), or an optionally substituted aryl, alkylaryl or alkoxyaryl residue; each R 3 are each independently H, C 1 -C 30 akyl, C 2 -C 30 alkenyl, C 2 -C 30 alkynyl, C 1 -C 30 haloalkyl, C 2 -C 3 0 haloalkenyl, C 2 -C 3 o haloalkynyl or C 2 -C 3 0 acyl; each R 4 are each independently H, C 1 -C 30 alkyl, C 2 -C 3 0 alkenyl, C 2 -C 3 0 alkynyl, C 1 -C 3 o haloalkyl, C 2 -C haloalkenyl, C 2 -C 30 haloalkynyl or C 2 -C 30 acyl; m represents 0, 1 or 2; and 5 Application No. 14/367,041 Reply to the Office Action dated n represents a number of from 2 to
Materials described outside the worked examples.
oligophenylene monomer of general formula (I)
polymeric precursor for graphene nanoribbons of general formula (II)
graphene nanoribbons
Additional fabrication and treatment steps described in the patent.
Patent
Atlas literature
Patent
US 9,550,678Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
1: An oligophenylene monomer of general formula (I): SVG 14367041.06-30-2016.IQ₂LE₇S₉RXEAPX2.CLM.1.svg 3.87 1.7 Black and white wherein R 1 is a linear or branched C 1 -C 30 alkyl and R 2 is H; W and R 2 are cach independently H, halogen, OH, NHL, CN, NO 2 or a linear or branched, saturated or unsaturated C 4 -F 4 hydrocarbon residue, which may be substituted 1 to 5 fold with halogen (F, Cl, Br, I), OR 3, NR T, CN and/or NO2, and wherein one or more CH I groups may be replaced by O, S, NR ' NR 4, OC(O) or C(O), or an optionally substituted aryl, alkylaryl or alkoxyaryl residue; each R 3 are each independently H, C -C- akyl, C₂ -C-q alkenyl, C 2-C alkynyl, C 1 -Go haloalkyl, C 2 -G haloalkenyl, C 2 -Ca haloalkynyl or C 2 -Go acyl; 3 Application No. 14/367,041 Reply to the Office Action dated each R 4 are each independently of each other H, C₄ -G. alkyl, C;-Go alkenyl, C- 2 -G- alkynyl, C₄ -Go haloalkyl, C 2 -G- haloalkenyl, C 2 -G- haloalk y nyl or C 2 -Go acyl; and m represents 0, 1 or 2.
2: The oligophenylene monomer of claim 1, wherein each R I represents a methyl, ethyl, n-propyl, isopropyl, n-butyl, sec.-butyl, isobutyl, tert-butyl, n- pentyl, 2-pentyl, 3-pentyl, 2,2-dimethylpropyl, 1,1,3,3-tetramethylpentyl, n-hexvl, 1- methylhexyl, 1,1,3,3,5,5-hexamethylhexyl, n-heptyl, isoheptyl, 1,1,3,3-tetramethylbutyl, 1- methylheptyl, 3-methylheptyl, n-octyl, 1,1,3,3-tetramethylbutyl and 2-ethylhexyl, n-nonyl, decyl, undecyl, dodecyl, tridecyl, tetradecyl, pentadecyl, hexadecyl, heptadecyl, octadecyl, eicosyl, heneicosyl, docosvl, tetracosvl, or pentacosvl group and R₂ are each independently H, C -Go alkyl, C 4 -Ga alkoxy, C -G al k ylthio, C 2-G o alkenyl, C;-G alkynyl, C 4 -G haloalkyl, C;-QG haloalkenyl or haloalk y nyl.
3: The oligophenylene monomer of claim 1, wherein m represents 0.
4. canceled
5: A polymeric precursor for preparing graphene nanoribbons having repeating units of general formula (II): 4 Application No. 14/367,041 Reply to the Office Action dated SVG 14367041.06-30-2016.IQ₂LE₇S₉RXEAPX2.CLM.2.svg 3.65 1.48 Black and white (0) wherein R₁ is a linear or branched C 1 -C 30 alkyl and R 2 is H; R 4 and R 2 are each independently H, halogen, OH, NH S, CN, NO 2 or a linear or branched, saturated or unsaturated C 4 -@44 hydrocarbon residue, which may be substituted 1 to 5 fold with halogen (F, CI, Br, I), OR ', NR 2, CN and/or NO 2, and wherein one or more CH L groups may be replaced by O, S, NR 4, OC(O) or C(O), or an optionally substituted aryl, alkylaryl or alkoxyaryl residue; each R 3 are each independently H, C 1 -C 30 akyl, C 2 -C 30 alkenyl, C 2 -C 30 alkynyl, C 1 -C 30 haloalkyl, C 2 -C 3 0 haloalkenyl, C 2 -C 3 o haloalkynyl or C 2 -C 3 0 acyl; each R 4 are each independently H, C 1 -C 30 alkyl, C 2 -C 3 0 alkenyl, C 2 -C 3 0 alkynyl, C 1 -C 3 o haloalkyl, C 2 -C haloalkenyl, C 2 -C 30 haloalkynyl or C 2 -C 30 acyl; m represents 0, 1 or 2; and 5 Application No. 14/367,041 Reply to the Office Action dated n represents a number of from 2 to
Materials described outside the worked examples.
oligophenylene monomer of general formula (I)
polymeric precursor for graphene nanoribbons of general formula (II)
graphene nanoribbons
Additional fabrication and treatment steps described in the patent.
Patent
Atlas literature
Patent
US 9,550,678Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
1: An oligophenylene monomer of general formula (I): SVG 14367041.06-30-2016.IQ₂LE₇S₉RXEAPX2.CLM.1.svg 3.87 1.7 Black and white wherein R 1 is a linear or branched C 1 -C 30 alkyl and R 2 is H; W and R 2 are cach independently H, halogen, OH, NHL, CN, NO 2 or a linear or branched, saturated or unsaturated C 4 -F 4 hydrocarbon residue, which may be substituted 1 to 5 fold with halogen (F, Cl, Br, I), OR 3, NR T, CN and/or NO2, and wherein one or more CH I groups may be replaced by O, S, NR ' NR 4, OC(O) or C(O), or an optionally substituted aryl, alkylaryl or alkoxyaryl residue; each R 3 are each independently H, C -C- akyl, C₂ -C-q alkenyl, C 2-C alkynyl, C 1 -Go haloalkyl, C 2 -G haloalkenyl, C 2 -Ca haloalkynyl or C 2 -Go acyl; 3 Application No. 14/367,041 Reply to the Office Action dated each R 4 are each independently of each other H, C₄ -G. alkyl, C;-Go alkenyl, C- 2 -G- alkynyl, C₄ -Go haloalkyl, C 2 -G- haloalkenyl, C 2 -G- haloalk y nyl or C 2 -Go acyl; and m represents 0, 1 or 2.
2: The oligophenylene monomer of claim 1, wherein each R I represents a methyl, ethyl, n-propyl, isopropyl, n-butyl, sec.-butyl, isobutyl, tert-butyl, n- pentyl, 2-pentyl, 3-pentyl, 2,2-dimethylpropyl, 1,1,3,3-tetramethylpentyl, n-hexvl, 1- methylhexyl, 1,1,3,3,5,5-hexamethylhexyl, n-heptyl, isoheptyl, 1,1,3,3-tetramethylbutyl, 1- methylheptyl, 3-methylheptyl, n-octyl, 1,1,3,3-tetramethylbutyl and 2-ethylhexyl, n-nonyl, decyl, undecyl, dodecyl, tridecyl, tetradecyl, pentadecyl, hexadecyl, heptadecyl, octadecyl, eicosyl, heneicosyl, docosvl, tetracosvl, or pentacosvl group and R₂ are each independently H, C -Go alkyl, C 4 -Ga alkoxy, C -G al k ylthio, C 2-G o alkenyl, C;-G alkynyl, C 4 -G haloalkyl, C;-QG haloalkenyl or haloalk y nyl.
3: The oligophenylene monomer of claim 1, wherein m represents 0.
4. canceled
5: A polymeric precursor for preparing graphene nanoribbons having repeating units of general formula (II): 4 Application No. 14/367,041 Reply to the Office Action dated SVG 14367041.06-30-2016.IQ₂LE₇S₉RXEAPX2.CLM.2.svg 3.65 1.48 Black and white (0) wherein R₁ is a linear or branched C 1 -C 30 alkyl and R 2 is H; R 4 and R 2 are each independently H, halogen, OH, NH S, CN, NO 2 or a linear or branched, saturated or unsaturated C 4 -@44 hydrocarbon residue, which may be substituted 1 to 5 fold with halogen (F, CI, Br, I), OR ', NR 2, CN and/or NO 2, and wherein one or more CH L groups may be replaced by O, S, NR 4, OC(O) or C(O), or an optionally substituted aryl, alkylaryl or alkoxyaryl residue; each R 3 are each independently H, C 1 -C 30 akyl, C 2 -C 30 alkenyl, C 2 -C 30 alkynyl, C 1 -C 30 haloalkyl, C 2 -C 3 0 haloalkenyl, C 2 -C 3 o haloalkynyl or C 2 -C 3 0 acyl; each R 4 are each independently H, C 1 -C 30 alkyl, C 2 -C 3 0 alkenyl, C 2 -C 3 0 alkynyl, C 1 -C 3 o haloalkyl, C 2 -C haloalkenyl, C 2 -C 30 haloalkynyl or C 2 -C 30 acyl; m represents 0, 1 or 2; and 5 Application No. 14/367,041 Reply to the Office Action dated n represents a number of from 2 to
Materials described outside the worked examples.
oligophenylene monomer of general formula (I)
polymeric precursor for graphene nanoribbons of general formula (II)
graphene nanoribbons
Additional fabrication and treatment steps described in the patent.
