: The process according to claim [[3]] 1, wherein at least step said (b) polymerization is carried out at a partial oxygen pressure p(O 2) and a partial water pressure p(H 2 0) which satisfy the following relation: 2.59 x 10- 1 9 mbar2 < p(O 2) x p(H 2 0) < [[3]] 2.76 x 10 -1 4 mbar 2. 5: The process according to claim 1, wherein at least one of said (a) providing and said (c) at least partially cyclodehydrogenating step (a) and/or step (c) is/are is carried out at a total pressure p(total) of at least 1 x 1 0- 9 mbar; and optionally a partial oxygen pressure p(O 2) and partial water pressure p(H 2 0) which satisfy the following relation: 2.59 x 10- 1 9 mbar2 < p(O 2) x p(H 2 0) < [[3]] 2.76 x 10 -1 4 mbar 2. 6: The process according to claim 1, wherein the total pressure p(total) in at least one of said (a) providing, said (b) polymerization, and said (c) at least partially cyclodehydrogenating in step (a) and/or step (b) and/or step (c) is within the range of from 1 x 10 -9 mbar to 1 x 10 -3 mbar. 7: The process according to claim 1, wherein the partial oxygen pressure p(O 2) and the partial water pressure p(H 2 0) in at least one of said (b) polymerization and said (c) at least partially cyclodehydrogenating step (b) and,/or step (c) satisfy the following relation: 2.5 x 10- 1 9 mbar 2 < p(O₂) x p(H 2 0) < 3 x 10- 15 mbar 2. 8: The process according to claim 2, wherein the total pressure p(total) in the substrate surface treatment step during said treating is within the range of from 1 x 1 0-9 mbar to 1 x 1 0-3 mbar. 9: The process according to claim 2, wherein said treating is carried out by at least one of ion sputtering, plasma cleaning, thermal annealing, thin layer deposition of the substrate surface material, and cleavage of the substrate the substrate surface treatment step is selected from ion sputtering, plasma cleaning, thermal annealing, thin layer deposition of the substrate surface material, cleavage of the substrate, or any combination thereof. 10: The process according to claim 2, wherein said (a) providing is carried out immediately and directly after said treating the process does not comprise any intermediate steps in between the substrate surface treatment step and step (a). 11: The process according to claim 1, wherein the process is carried out in a vacuum chamber.

: The process according to claim 1, wherein at least said (b) polymerization is carried out at a total pressure p(total) of at least 1 x 10 -8 mbar. 14: The process according to claim 1, wherein at least said (b) polymerization is carried out at a total pressure p(total) of from 1 x 10 -8 mbar to 1 x 1 0- 5 mbar. 15: The process according to claim 1, wherein said polymer obtained from said (b) polymerization is a linear polymer. 16: The process according to claim 1, wherein said polymer obtained from said (b) polymerization is a linear graphene nanoribbon.

: The process according to claim [[3]] 1, wherein at least step said (b) polymerization is carried out at a partial oxygen pressure p(O 2) and a partial water pressure p(H 2 0) which satisfy the following relation: 2.59 x 10- 1 9 mbar2 < p(O 2) x p(H 2 0) < [[3]] 2.76 x 10 -1 4 mbar 2. 5: The process according to claim 1, wherein at least one of said (a) providing and said (c) at least partially cyclodehydrogenating step (a) and/or step (c) is/are is carried out at a total pressure p(total) of at least 1 x 1 0- 9 mbar; and optionally a partial oxygen pressure p(O 2) and partial water pressure p(H 2 0) which satisfy the following relation: 2.59 x 10- 1 9 mbar2 < p(O 2) x p(H 2 0) < [[3]] 2.76 x 10 -1 4 mbar 2. 6: The process according to claim 1, wherein the total pressure p(total) in at least one of said (a) providing, said (b) polymerization, and said (c) at least partially cyclodehydrogenating in step (a) and/or step (b) and/or step (c) is within the range of from 1 x 10 -9 mbar to 1 x 10 -3 mbar. 7: The process according to claim 1, wherein the partial oxygen pressure p(O 2) and the partial water pressure p(H 2 0) in at least one of said (b) polymerization and said (c) at least partially cyclodehydrogenating step (b) and,/or step (c) satisfy the following relation: 2.5 x 10- 1 9 mbar 2 < p(O₂) x p(H 2 0) < 3 x 10- 15 mbar 2. 8: The process according to claim 2, wherein the total pressure p(total) in the substrate surface treatment step during said treating is within the range of from 1 x 1 0-9 mbar to 1 x 1 0-3 mbar. 9: The process according to claim 2, wherein said treating is carried out by at least one of ion sputtering, plasma cleaning, thermal annealing, thin layer deposition of the substrate surface material, and cleavage of the substrate the substrate surface treatment step is selected from ion sputtering, plasma cleaning, thermal annealing, thin layer deposition of the substrate surface material, cleavage of the substrate, or any combination thereof. 10: The process according to claim 2, wherein said (a) providing is carried out immediately and directly after said treating the process does not comprise any intermediate steps in between the substrate surface treatment step and step (a). 11: The process according to claim 1, wherein the process is carried out in a vacuum chamber.

: The process according to claim 1, wherein at least said (b) polymerization is carried out at a total pressure p(total) of at least 1 x 10 -8 mbar. 14: The process according to claim 1, wherein at least said (b) polymerization is carried out at a total pressure p(total) of from 1 x 10 -8 mbar to 1 x 1 0- 5 mbar. 15: The process according to claim 1, wherein said polymer obtained from said (b) polymerization is a linear polymer. 16: The process according to claim 1, wherein said polymer obtained from said (b) polymerization is a linear graphene nanoribbon.

: The process according to claim [[3]] 1, wherein at least step said (b) polymerization is carried out at a partial oxygen pressure p(O 2) and a partial water pressure p(H 2 0) which satisfy the following relation: 2.59 x 10- 1 9 mbar2 < p(O 2) x p(H 2 0) < [[3]] 2.76 x 10 -1 4 mbar 2. 5: The process according to claim 1, wherein at least one of said (a) providing and said (c) at least partially cyclodehydrogenating step (a) and/or step (c) is/are is carried out at a total pressure p(total) of at least 1 x 1 0- 9 mbar; and optionally a partial oxygen pressure p(O 2) and partial water pressure p(H 2 0) which satisfy the following relation: 2.59 x 10- 1 9 mbar2 < p(O 2) x p(H 2 0) < [[3]] 2.76 x 10 -1 4 mbar 2. 6: The process according to claim 1, wherein the total pressure p(total) in at least one of said (a) providing, said (b) polymerization, and said (c) at least partially cyclodehydrogenating in step (a) and/or step (b) and/or step (c) is within the range of from 1 x 10 -9 mbar to 1 x 10 -3 mbar. 7: The process according to claim 1, wherein the partial oxygen pressure p(O 2) and the partial water pressure p(H 2 0) in at least one of said (b) polymerization and said (c) at least partially cyclodehydrogenating step (b) and,/or step (c) satisfy the following relation: 2.5 x 10- 1 9 mbar 2 < p(O₂) x p(H 2 0) < 3 x 10- 15 mbar 2. 8: The process according to claim 2, wherein the total pressure p(total) in the substrate surface treatment step during said treating is within the range of from 1 x 1 0-9 mbar to 1 x 1 0-3 mbar. 9: The process according to claim 2, wherein said treating is carried out by at least one of ion sputtering, plasma cleaning, thermal annealing, thin layer deposition of the substrate surface material, and cleavage of the substrate the substrate surface treatment step is selected from ion sputtering, plasma cleaning, thermal annealing, thin layer deposition of the substrate surface material, cleavage of the substrate, or any combination thereof. 10: The process according to claim 2, wherein said (a) providing is carried out immediately and directly after said treating the process does not comprise any intermediate steps in between the substrate surface treatment step and step (a). 11: The process according to claim 1, wherein the process is carried out in a vacuum chamber.

: The process according to claim 1, wherein at least said (b) polymerization is carried out at a total pressure p(total) of at least 1 x 10 -8 mbar. 14: The process according to claim 1, wherein at least said (b) polymerization is carried out at a total pressure p(total) of from 1 x 10 -8 mbar to 1 x 1 0- 5 mbar. 15: The process according to claim 1, wherein said polymer obtained from said (b) polymerization is a linear polymer. 16: The process according to claim 1, wherein said polymer obtained from said (b) polymerization is a linear graphene nanoribbon.

: The process according to claim [[3]] 1, wherein at least step said (b) polymerization is carried out at a partial oxygen pressure p(O 2) and a partial water pressure p(H 2 0) which satisfy the following relation: 2.59 x 10- 1 9 mbar2 < p(O 2) x p(H 2 0) < [[3]] 2.76 x 10 -1 4 mbar 2. 5: The process according to claim 1, wherein at least one of said (a) providing and said (c) at least partially cyclodehydrogenating step (a) and/or step (c) is/are is carried out at a total pressure p(total) of at least 1 x 1 0- 9 mbar; and optionally a partial oxygen pressure p(O 2) and partial water pressure p(H 2 0) which satisfy the following relation: 2.59 x 10- 1 9 mbar2 < p(O 2) x p(H 2 0) < [[3]] 2.76 x 10 -1 4 mbar 2. 6: The process according to claim 1, wherein the total pressure p(total) in at least one of said (a) providing, said (b) polymerization, and said (c) at least partially cyclodehydrogenating in step (a) and/or step (b) and/or step (c) is within the range of from 1 x 10 -9 mbar to 1 x 10 -3 mbar. 7: The process according to claim 1, wherein the partial oxygen pressure p(O 2) and the partial water pressure p(H 2 0) in at least one of said (b) polymerization and said (c) at least partially cyclodehydrogenating step (b) and,/or step (c) satisfy the following relation: 2.5 x 10- 1 9 mbar 2 < p(O₂) x p(H 2 0) < 3 x 10- 15 mbar 2. 8: The process according to claim 2, wherein the total pressure p(total) in the substrate surface treatment step during said treating is within the range of from 1 x 1 0-9 mbar to 1 x 1 0-3 mbar. 9: The process according to claim 2, wherein said treating is carried out by at least one of ion sputtering, plasma cleaning, thermal annealing, thin layer deposition of the substrate surface material, and cleavage of the substrate the substrate surface treatment step is selected from ion sputtering, plasma cleaning, thermal annealing, thin layer deposition of the substrate surface material, cleavage of the substrate, or any combination thereof. 10: The process according to claim 2, wherein said (a) providing is carried out immediately and directly after said treating the process does not comprise any intermediate steps in between the substrate surface treatment step and step (a). 11: The process according to claim 1, wherein the process is carried out in a vacuum chamber.

: The process according to claim 1, wherein at least said (b) polymerization is carried out at a total pressure p(total) of at least 1 x 10 -8 mbar. 14: The process according to claim 1, wherein at least said (b) polymerization is carried out at a total pressure p(total) of from 1 x 10 -8 mbar to 1 x 1 0- 5 mbar. 15: The process according to claim 1, wherein said polymer obtained from said (b) polymerization is a linear polymer. 16: The process according to claim 1, wherein said polymer obtained from said (b) polymerization is a linear graphene nanoribbon.