Research paperExperimental CharacterizationHelium atom micro-diffraction as a characterisation tool for 2D materialsNick A. von Jeinsen, Aleksandar Radić, Ke Wang, Chenyang Zhao et al.arXiv·2024·10.48550/arxiv.2409.20461·arXiv:2409.20461AbstractWe present helium atom micro-diffraction as an ideal technique for characterization of 2D materials due to its ultimate surface sensitivity combined with sub-micron spatial resolution. Thermal energy neutral helium scatters from the valence electron density, 2–3 Å above the ionic cores of a surface, making the technique ideal for studying 2D materials, where other approaches can struggle due to small interaction cross-sections with few-layer samples. Sub-micron spatial resolution is key development in neutral atom scattering to allow measurements from device-scale samples. We present measurements of monolayer-substrate interactions, thermal expansion coefficients, the electron-phonon coupling constant and vacancy-type defect density on monolayer-MoS2. We also discuss extensions to the presented methods which can be immediately implemented on existing instruments to perform spatial mapping of these material properties.Read more
Monolayer MoS₂ on few-layer hBN on SiO₂ sample used for real-space imaging and diffraction.2 preparations1 characterization1 property4 figuresExperimentalMoS₂Studied MaterialBNSubstrate / DielectricSiO₂Substrate / DielectricExpand
Few-layer hBN on SiO₂ reference region used for comparison of scattering and cleanliness.2 preparations1 characterization4 figuresExperimentalBNSubstrate / DielectricSiO₂Substrate / DielectricSiSubstrate / DielectricExpand
Exposed SiO₂ reference region used as an amorphous scattering reference.2 preparations1 characterization4 figuresExperimentalSiO₂Substrate / DielectricSiSubstrate / DielectricExpand
Monolayer MoS₂ directly on SiO₂ used to compare substrate-induced morphology with hBN-buffered MoS2.2 preparations1 characterization4 figuresExperimentalMoS₂Studied MaterialSiO₂Substrate / DielectricSiSubstrate / DielectricExpand
Bulk MoS₂ reference region used for comparison in real-space imaging and diffraction.2 preparations1 characterization1 property4 figuresReferenceMoS₂Studied MaterialExpand
Research paperExperimental CharacterizationHelium atom micro-diffraction as a characterisation tool for 2D materialsNick A. von Jeinsen, Aleksandar Radić, Ke Wang, Chenyang Zhao et al.arXiv·2024·10.48550/arxiv.2409.20461·arXiv:2409.20461AbstractWe present helium atom micro-diffraction as an ideal technique for characterization of 2D materials due to its ultimate surface sensitivity combined with sub-micron spatial resolution. Thermal energy neutral helium scatters from the valence electron density, 2–3 Å above the ionic cores of a surface, making the technique ideal for studying 2D materials, where other approaches can struggle due to small interaction cross-sections with few-layer samples. Sub-micron spatial resolution is key development in neutral atom scattering to allow measurements from device-scale samples. We present measurements of monolayer-substrate interactions, thermal expansion coefficients, the electron-phonon coupling constant and vacancy-type defect density on monolayer-MoS2. We also discuss extensions to the presented methods which can be immediately implemented on existing instruments to perform spatial mapping of these material properties.Read more
Monolayer MoS₂ on few-layer hBN on SiO₂ sample used for real-space imaging and diffraction.2 preparations1 characterization1 property4 figuresExperimentalMoS₂Studied MaterialBNSubstrate / DielectricSiO₂Substrate / DielectricExpand
Few-layer hBN on SiO₂ reference region used for comparison of scattering and cleanliness.2 preparations1 characterization4 figuresExperimentalBNSubstrate / DielectricSiO₂Substrate / DielectricSiSubstrate / DielectricExpand
Exposed SiO₂ reference region used as an amorphous scattering reference.2 preparations1 characterization4 figuresExperimentalSiO₂Substrate / DielectricSiSubstrate / DielectricExpand
Monolayer MoS₂ directly on SiO₂ used to compare substrate-induced morphology with hBN-buffered MoS2.2 preparations1 characterization4 figuresExperimentalMoS₂Studied MaterialSiO₂Substrate / DielectricSiSubstrate / DielectricExpand
Bulk MoS₂ reference region used for comparison in real-space imaging and diffraction.2 preparations1 characterization1 property4 figuresReferenceMoS₂Studied MaterialExpand
Research paperExperimental CharacterizationHelium atom micro-diffraction as a characterisation tool for 2D materialsNick A. von Jeinsen, Aleksandar Radić, Ke Wang, Chenyang Zhao et al.arXiv·2024·10.48550/arxiv.2409.20461·arXiv:2409.20461AbstractWe present helium atom micro-diffraction as an ideal technique for characterization of 2D materials due to its ultimate surface sensitivity combined with sub-micron spatial resolution. Thermal energy neutral helium scatters from the valence electron density, 2–3 Å above the ionic cores of a surface, making the technique ideal for studying 2D materials, where other approaches can struggle due to small interaction cross-sections with few-layer samples. Sub-micron spatial resolution is key development in neutral atom scattering to allow measurements from device-scale samples. We present measurements of monolayer-substrate interactions, thermal expansion coefficients, the electron-phonon coupling constant and vacancy-type defect density on monolayer-MoS2. We also discuss extensions to the presented methods which can be immediately implemented on existing instruments to perform spatial mapping of these material properties.Read more
Monolayer MoS₂ on few-layer hBN on SiO₂ sample used for real-space imaging and diffraction.2 preparations1 characterization1 property4 figuresExperimentalMoS₂Studied MaterialBNSubstrate / DielectricSiO₂Substrate / DielectricExpand
Few-layer hBN on SiO₂ reference region used for comparison of scattering and cleanliness.2 preparations1 characterization4 figuresExperimentalBNSubstrate / DielectricSiO₂Substrate / DielectricSiSubstrate / DielectricExpand
Exposed SiO₂ reference region used as an amorphous scattering reference.2 preparations1 characterization4 figuresExperimentalSiO₂Substrate / DielectricSiSubstrate / DielectricExpand
Monolayer MoS₂ directly on SiO₂ used to compare substrate-induced morphology with hBN-buffered MoS2.2 preparations1 characterization4 figuresExperimentalMoS₂Studied MaterialSiO₂Substrate / DielectricSiSubstrate / DielectricExpand
Bulk MoS₂ reference region used for comparison in real-space imaging and diffraction.2 preparations1 characterization1 property4 figuresReferenceMoS₂Studied MaterialExpand
Research paperExperimental CharacterizationHelium atom micro-diffraction as a characterisation tool for 2D materialsNick A. von Jeinsen, Aleksandar Radić, Ke Wang, Chenyang Zhao et al.arXiv·2024·10.48550/arxiv.2409.20461·arXiv:2409.20461AbstractWe present helium atom micro-diffraction as an ideal technique for characterization of 2D materials due to its ultimate surface sensitivity combined with sub-micron spatial resolution. Thermal energy neutral helium scatters from the valence electron density, 2–3 Å above the ionic cores of a surface, making the technique ideal for studying 2D materials, where other approaches can struggle due to small interaction cross-sections with few-layer samples. Sub-micron spatial resolution is key development in neutral atom scattering to allow measurements from device-scale samples. We present measurements of monolayer-substrate interactions, thermal expansion coefficients, the electron-phonon coupling constant and vacancy-type defect density on monolayer-MoS2. We also discuss extensions to the presented methods which can be immediately implemented on existing instruments to perform spatial mapping of these material properties.Read more
Monolayer MoS₂ on few-layer hBN on SiO₂ sample used for real-space imaging and diffraction.2 preparations1 characterization1 property4 figuresExperimentalMoS₂Studied MaterialBNSubstrate / DielectricSiO₂Substrate / DielectricExpand
Few-layer hBN on SiO₂ reference region used for comparison of scattering and cleanliness.2 preparations1 characterization4 figuresExperimentalBNSubstrate / DielectricSiO₂Substrate / DielectricSiSubstrate / DielectricExpand
Exposed SiO₂ reference region used as an amorphous scattering reference.2 preparations1 characterization4 figuresExperimentalSiO₂Substrate / DielectricSiSubstrate / DielectricExpand
Monolayer MoS₂ directly on SiO₂ used to compare substrate-induced morphology with hBN-buffered MoS2.2 preparations1 characterization4 figuresExperimentalMoS₂Studied MaterialSiO₂Substrate / DielectricSiSubstrate / DielectricExpand
Bulk MoS₂ reference region used for comparison in real-space imaging and diffraction.2 preparations1 characterization1 property4 figuresReferenceMoS₂Studied MaterialExpand