Research paperComputational DFTTheoreticalComputed PhononImplementation and application of a DFT+U+V approach within the all-electron FLAPW methodW. Beida, G. Bihlmayer, C. Friedrich, G. Michalicek et al.arXiv preprint·2026·arXiv:2511.08002AbstractWe present an implementation of the density-functional theory DFT+U+V formalism within the all-electron full-potential linearized augmented-plane-wave (FLAPW) method as implemented in the FLEUR code. The DFT+U+V formalism extends DFT, supplemented by the onsite Coulomb interaction U, to address local correlation effects in localized states by incorporating intersite Coulomb interaction terms V. U and V parameters are obtained from first principles using the constrained random-phase approximation (cRPA) employing two different atom basis representations to project the screened Coulomb interaction: the Wannier and the muffin-tin basis functions. We investigate in detail the impact of the V term for typical covalently bonded materials like graphene, for bulk semiconductors such as silicon and germanium, and for charge-transfer insulators like NiO. Our results demonstrate an improvement in accuracy of specific properties across these systems, providing a framework for describing materials with different interaction regimes.Read more
DFT/DFT+U+V benchmark system for graphene band-structure calculations.1 characterization2 figuresSimulated Supercell DftCStudied MaterialExpand
Bulk diamond-structure silicon benchmark system.2 propertiesSimulated Supercell DftSiStudied MaterialExpand
Bulk diamond-structure germanium benchmark system.No measurements recordedSimulated Supercell DftGeStudied MaterialExpand
Bulk NiO benchmark system for correlated charge-transfer insulator calculations.No measurements recordedSimulated Supercell DftNiOStudied MaterialExpand
Research paperComputational DFTTheoreticalComputed PhononImplementation and application of a DFT+U+V approach within the all-electron FLAPW methodW. Beida, G. Bihlmayer, C. Friedrich, G. Michalicek et al.arXiv preprint·2026·arXiv:2511.08002AbstractWe present an implementation of the density-functional theory DFT+U+V formalism within the all-electron full-potential linearized augmented-plane-wave (FLAPW) method as implemented in the FLEUR code. The DFT+U+V formalism extends DFT, supplemented by the onsite Coulomb interaction U, to address local correlation effects in localized states by incorporating intersite Coulomb interaction terms V. U and V parameters are obtained from first principles using the constrained random-phase approximation (cRPA) employing two different atom basis representations to project the screened Coulomb interaction: the Wannier and the muffin-tin basis functions. We investigate in detail the impact of the V term for typical covalently bonded materials like graphene, for bulk semiconductors such as silicon and germanium, and for charge-transfer insulators like NiO. Our results demonstrate an improvement in accuracy of specific properties across these systems, providing a framework for describing materials with different interaction regimes.Read more
DFT/DFT+U+V benchmark system for graphene band-structure calculations.1 characterization2 figuresSimulated Supercell DftCStudied MaterialExpand
Bulk diamond-structure silicon benchmark system.2 propertiesSimulated Supercell DftSiStudied MaterialExpand
Bulk diamond-structure germanium benchmark system.No measurements recordedSimulated Supercell DftGeStudied MaterialExpand
Bulk NiO benchmark system for correlated charge-transfer insulator calculations.No measurements recordedSimulated Supercell DftNiOStudied MaterialExpand
Research paperComputational DFTTheoreticalComputed PhononImplementation and application of a DFT+U+V approach within the all-electron FLAPW methodW. Beida, G. Bihlmayer, C. Friedrich, G. Michalicek et al.arXiv preprint·2026·arXiv:2511.08002AbstractWe present an implementation of the density-functional theory DFT+U+V formalism within the all-electron full-potential linearized augmented-plane-wave (FLAPW) method as implemented in the FLEUR code. The DFT+U+V formalism extends DFT, supplemented by the onsite Coulomb interaction U, to address local correlation effects in localized states by incorporating intersite Coulomb interaction terms V. U and V parameters are obtained from first principles using the constrained random-phase approximation (cRPA) employing two different atom basis representations to project the screened Coulomb interaction: the Wannier and the muffin-tin basis functions. We investigate in detail the impact of the V term for typical covalently bonded materials like graphene, for bulk semiconductors such as silicon and germanium, and for charge-transfer insulators like NiO. Our results demonstrate an improvement in accuracy of specific properties across these systems, providing a framework for describing materials with different interaction regimes.Read more
DFT/DFT+U+V benchmark system for graphene band-structure calculations.1 characterization2 figuresSimulated Supercell DftCStudied MaterialExpand
Bulk diamond-structure silicon benchmark system.2 propertiesSimulated Supercell DftSiStudied MaterialExpand
Bulk diamond-structure germanium benchmark system.No measurements recordedSimulated Supercell DftGeStudied MaterialExpand
Bulk NiO benchmark system for correlated charge-transfer insulator calculations.No measurements recordedSimulated Supercell DftNiOStudied MaterialExpand
Research paperComputational DFTTheoreticalComputed PhononImplementation and application of a DFT+U+V approach within the all-electron FLAPW methodW. Beida, G. Bihlmayer, C. Friedrich, G. Michalicek et al.arXiv preprint·2026·arXiv:2511.08002AbstractWe present an implementation of the density-functional theory DFT+U+V formalism within the all-electron full-potential linearized augmented-plane-wave (FLAPW) method as implemented in the FLEUR code. The DFT+U+V formalism extends DFT, supplemented by the onsite Coulomb interaction U, to address local correlation effects in localized states by incorporating intersite Coulomb interaction terms V. U and V parameters are obtained from first principles using the constrained random-phase approximation (cRPA) employing two different atom basis representations to project the screened Coulomb interaction: the Wannier and the muffin-tin basis functions. We investigate in detail the impact of the V term for typical covalently bonded materials like graphene, for bulk semiconductors such as silicon and germanium, and for charge-transfer insulators like NiO. Our results demonstrate an improvement in accuracy of specific properties across these systems, providing a framework for describing materials with different interaction regimes.Read more
DFT/DFT+U+V benchmark system for graphene band-structure calculations.1 characterization2 figuresSimulated Supercell DftCStudied MaterialExpand
Bulk diamond-structure silicon benchmark system.2 propertiesSimulated Supercell DftSiStudied MaterialExpand
Bulk diamond-structure germanium benchmark system.No measurements recordedSimulated Supercell DftGeStudied MaterialExpand
Bulk NiO benchmark system for correlated charge-transfer insulator calculations.No measurements recordedSimulated Supercell DftNiOStudied MaterialExpand