Research paper
Computational DFTComputed Raman| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Band Structure Agreement | bulk semiconductor band structures | agrees with fully relativistic GW approximation and experiment | DFT-computed bulk semiconductor Si with self-consistent exteDFT-computed bulk semiconductor Ge with self-consistent exteDFT-computed bulk semiconductor GaAs with self-consistent exDFT-computed bulk semiconductor GaSb with self-consistent exDFT-computed bulk semiconductor CdSe with self-consistent exDFT-computed bulk semiconductor PdO with self-consistent ext | — | ||
| Topological Classification | HgTe | topologically nontrivial | — | |||
| Topological Classification | CuTlS₂ | topologically nontrivial | — | |||
| Topological Classification | CuTlSe₂ | topologically nontrivial | — | |||
| Surface State Thickness Dependence | Bi₂Se₃ and Bi₂Te₃ slab states | topological surface states evolve with thickness up to eight quintuple layers | — | |||
| Xrd Lattice Constant A | lattice constant a | 4.3Å | — | — | — | — |
| Xrd Lattice Constant C | lattice constant c | 6.99Å | — | — | — | — |
| Optical Band Gap | band gap | 0.25eV | — | — | — | — |
Implementation and application of a DFT+U+V approach within the all-electron FLAPW method
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Band Structure Agreement | bulk semiconductor band structures | agrees with fully relativistic GW approximation and experiment | DFT-computed bulk semiconductor Si with self-consistent exteDFT-computed bulk semiconductor Ge with self-consistent exteDFT-computed bulk semiconductor GaAs with self-consistent exDFT-computed bulk semiconductor GaSb with self-consistent exDFT-computed bulk semiconductor CdSe with self-consistent exDFT-computed bulk semiconductor PdO with self-consistent ext | — | ||
| Topological Classification | HgTe | topologically nontrivial | — | |||
| Topological Classification | CuTlS₂ | topologically nontrivial | — | |||
| Topological Classification | CuTlSe₂ | topologically nontrivial | — | |||
| Surface State Thickness Dependence | Bi₂Se₃ and Bi₂Te₃ slab states | topological surface states evolve with thickness up to eight quintuple layers | — | |||
| Xrd Lattice Constant A | lattice constant a | 4.3Å | — | — | — | — |
| Xrd Lattice Constant C | lattice constant c | 6.99Å | — | — | — | — |
| Optical Band Gap | band gap | 0.25eV | — | — | — | — |
Implementation and application of a DFT+U+V approach within the all-electron FLAPW method
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Band Structure Agreement | bulk semiconductor band structures | agrees with fully relativistic GW approximation and experiment | DFT-computed bulk semiconductor Si with self-consistent exteDFT-computed bulk semiconductor Ge with self-consistent exteDFT-computed bulk semiconductor GaAs with self-consistent exDFT-computed bulk semiconductor GaSb with self-consistent exDFT-computed bulk semiconductor CdSe with self-consistent exDFT-computed bulk semiconductor PdO with self-consistent ext | — | ||
| Topological Classification | HgTe | topologically nontrivial | — | |||
| Topological Classification | CuTlS₂ | topologically nontrivial | — | |||
| Topological Classification | CuTlSe₂ | topologically nontrivial | — | |||
| Surface State Thickness Dependence | Bi₂Se₃ and Bi₂Te₃ slab states | topological surface states evolve with thickness up to eight quintuple layers | — | |||
| Xrd Lattice Constant A | lattice constant a | 4.3Å | — | — | — | — |
| Xrd Lattice Constant C | lattice constant c | 6.99Å | — | — | — | — |
| Optical Band Gap | band gap | 0.25eV | — | — | — | — |
Implementation and application of a DFT+U+V approach within the all-electron FLAPW method
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Band Structure Agreement | bulk semiconductor band structures | agrees with fully relativistic GW approximation and experiment | DFT-computed bulk semiconductor Si with self-consistent exteDFT-computed bulk semiconductor Ge with self-consistent exteDFT-computed bulk semiconductor GaAs with self-consistent exDFT-computed bulk semiconductor GaSb with self-consistent exDFT-computed bulk semiconductor CdSe with self-consistent exDFT-computed bulk semiconductor PdO with self-consistent ext | — | ||
| Topological Classification | HgTe | topologically nontrivial | — | |||
| Topological Classification | CuTlS₂ | topologically nontrivial | — | |||
| Topological Classification | CuTlSe₂ | topologically nontrivial | — | |||
| Surface State Thickness Dependence | Bi₂Se₃ and Bi₂Te₃ slab states | topological surface states evolve with thickness up to eight quintuple layers | — | |||
| Xrd Lattice Constant A | lattice constant a | 4.3Å | — | — | — | — |
| Xrd Lattice Constant C | lattice constant c | 6.99Å | — | — | — | — |
| Optical Band Gap | band gap | 0.25eV | — | — | — | — |
Implementation and application of a DFT+U+V approach within the all-electron FLAPW method