Research paper
Experimental CharacterizationComputational DFT| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Displacement Cross Section | edge atoms (60 kV) | 0.4barn | — | |||
| Displacement Cross Section | edge atoms (80 kV) | 1.1barn | — | |||
| Pore Growth Rate Slope | removed edge atoms per O₂ molecule | 0.52edgeatomspero2molecule | — | |||
| Adsorption Energy | O radical on pristine hBN | -1.89eV | — | |||
| Adsorption Energy | O radical on N-vacancy | -9.3eV | — | |||
| Adsorption Energy | O radical on B-vacancy | -4.54eV | — | |||
| Relative Stability Energy | B-O-B more favorable than N-O-N in double vacancy | 3.7eV | — | |||
| Relative Stability Energy | rotation of N-O bond to lower-energy configuration | 0.46eV | — | |||
| Adsorption Energy | O radical adsorption on vacancy-edge sites | -9.5eV | — | |||
| Adsorption Energy | O radical adsorption on vacancy-edge sites | -4.5eV | — |
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Displacement Cross Section | edge atoms (60 kV) | 0.4barn | — | |||
| Displacement Cross Section | edge atoms (80 kV) | 1.1barn | — | |||
| Pore Growth Rate Slope | removed edge atoms per O₂ molecule | 0.52edgeatomspero2molecule | — | |||
| Adsorption Energy | O radical on pristine hBN | -1.89eV | — | |||
| Adsorption Energy | O radical on N-vacancy | -9.3eV | — | |||
| Adsorption Energy | O radical on B-vacancy | -4.54eV | — | |||
| Relative Stability Energy | B-O-B more favorable than N-O-N in double vacancy | 3.7eV | — | |||
| Relative Stability Energy | rotation of N-O bond to lower-energy configuration | 0.46eV | — | |||
| Adsorption Energy | O radical adsorption on vacancy-edge sites | -9.5eV | — | |||
| Adsorption Energy | O radical adsorption on vacancy-edge sites | -4.5eV | — |
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Displacement Cross Section | edge atoms (60 kV) | 0.4barn | — | |||
| Displacement Cross Section | edge atoms (80 kV) | 1.1barn | — | |||
| Pore Growth Rate Slope | removed edge atoms per O₂ molecule | 0.52edgeatomspero2molecule | — | |||
| Adsorption Energy | O radical on pristine hBN | -1.89eV | — | |||
| Adsorption Energy | O radical on N-vacancy | -9.3eV | — | |||
| Adsorption Energy | O radical on B-vacancy | -4.54eV | — | |||
| Relative Stability Energy | B-O-B more favorable than N-O-N in double vacancy | 3.7eV | — | |||
| Relative Stability Energy | rotation of N-O bond to lower-energy configuration | 0.46eV | — | |||
| Adsorption Energy | O radical adsorption on vacancy-edge sites | -9.5eV | — | |||
| Adsorption Energy | O radical adsorption on vacancy-edge sites | -4.5eV | — |
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Displacement Cross Section | edge atoms (60 kV) | 0.4barn | — | |||
| Displacement Cross Section | edge atoms (80 kV) | 1.1barn | — | |||
| Pore Growth Rate Slope | removed edge atoms per O₂ molecule | 0.52edgeatomspero2molecule | — | |||
| Adsorption Energy | O radical on pristine hBN | -1.89eV | — | |||
| Adsorption Energy | O radical on N-vacancy | -9.3eV | — | |||
| Adsorption Energy | O radical on B-vacancy | -4.54eV | — | |||
| Relative Stability Energy | B-O-B more favorable than N-O-N in double vacancy | 3.7eV | — | |||
| Relative Stability Energy | rotation of N-O bond to lower-energy configuration | 0.46eV | — | |||
| Adsorption Energy | O radical adsorption on vacancy-edge sites | -9.5eV | — | |||
| Adsorption Energy | O radical adsorption on vacancy-edge sites | -4.5eV | — |