Each sample groups how it was prepared, characterized, and measured. Click a card to expand.
Large-area exfoliated monolayer WS₂ directly deposited on sapphire and patterned by electron-beam lithography and reactive-ion etching into a 500 μm-diameter zone plate lens with nominal 1 mm focal length.
Each sample groups how it was prepared, characterized, and measured. Click a card to expand.
Large-area exfoliated monolayer WS₂ directly deposited on sapphire and patterned by electron-beam lithography and reactive-ion etching into a 500 μm-diameter zone plate lens with nominal 1 mm focal length.
Each sample groups how it was prepared, characterized, and measured. Click a card to expand.
Large-area exfoliated monolayer WS₂ directly deposited on sapphire and patterned by electron-beam lithography and reactive-ion etching into a 500 μm-diameter zone plate lens with nominal 1 mm focal length.
Each sample groups how it was prepared, characterized, and measured. Click a card to expand.
Large-area exfoliated monolayer WS₂ directly deposited on sapphire and patterned by electron-beam lithography and reactive-ion etching into a 500 μm-diameter zone plate lens with nominal 1 mm focal length.
