Canceled

The fabrication method of a composite planar p H sensor modified by graphene film according to claim 8, wherein, the depositing of the Sb layer is as follows: the magnetron sputtering method of depositing the Sb layer is RF magnetron sputtering, a target material is antimony, and a shielding gas used is argon; the magnetron sputtering method of depositing the Sb layer is completed at room temperature, an RF magnetron sputtering time is 40 ~ 50 m in, an argon flow is 39 s cc m, a vacuum is 3 x 10 Pa, a power is 65 W, and a process pressure is 1 Pa. Previously presented

The fabrication method of a composite planar p H sensor modified by graphene film according to claim 8, wherein, the depositing of the Sb 2 0 3 layer is as follows: a target material is antimony, and a shielding gas is argon, and oxygen gas is added, the concentration ratio of argon and oxygen is 8:2, and a deposition time is 50 m in. Previously presented

The fabrication method of a composite planar p H sensor modified by graphene film according to claim 8, wherein, the depositing of the Ag layer is as follows: the magnetron sputtering method of depositing the Ag layer is R F magnetron sputtering, a target material is silver, and a shielding gas is argon; the RF magnetron sputtering is completed at room temperature, a time is 20 ~ 30 m in, an argon flow is 30 s cc m, a vacuum is 3x1 0 4 Pa, a power is 18 W, and a process pressure is 1 Pa. Previously presented

The fabrication method of a composite planar p H sensor modified by graphene film according to claim 8, wherein, a concentration of a used ferric chloride solution is 0.1 mol/L, and a soak time is 30 s. Previously presented

The fabrication method of a composite planar pH sensor modified by graphene film according to claim 8, wherein, a thickness of the Sb layer is 230 ~ 250 n m, the Sb 2 O 3 layer 40 ~ 60 ri m, and the TM membrane layer 1.5 ~1.9 pm. Currently amended

The fabrication method of a composite planar p H sensor modified by graphene film according to claim 8, wherein, a thickness of the Ag layer is 140 ~1 60 n m, the AgC l layer 1 5~ 25 n m, and the Ag layer is not covered with AgC l layer completely. Previously presented

A fabrication method of a composite planar pH sensor modified by graphene film including the steps of: preparing a substrate including forming a slot on each of two sides of the substrate, setting a first copper foil and a second copper foil on a bottom of the slots respectively; and preparing leads on the first copper foil and the second copper foil by a printing process respectively in the substrate; preparing a pH working electrode including coating with a first graphene film on the first copper foil using a micro mechanical stripping method; depositing a Sb layer on the first graphene film by a magnetron sputtering method; depositing a Sb 2 0 3 layer on a surface of the Sb layer by a magnetron sputtering method; coating with a TM membrane layer on a surface of the Sb 2 O 3 layer by a spin-coating method; wherein the pH working electrode comprises: the first graphene film, the Sb layer, the Sb 2 0 3 layer, and the TM membrane layer, wherein the first graphene film and the first copper foil are electrically connected to each other, preparing a reference electrode including coating foil using a micro mechanical stripping method; film by a magnetron sputtering method; dipping with a thir d graphene film on the AgC l layer using wherein the second graphene film, the Ag layer, together comprise the reference electrode. Currently with a second graphene film on a second copper depositing a Ag layer on the second graphene in a FeCl₃ solution to form a AgC l layer; coating a micro mechanical stripping method; the AgC l layer, and the third graphene film amended

Canceled

The fabrication method of a composite planar p H sensor modified by graphene film according to claim 8, wherein, the depositing of the Sb layer is as follows: the magnetron sputtering method of depositing the Sb layer is RF magnetron sputtering, a target material is antimony, and a shielding gas used is argon; the magnetron sputtering method of depositing the Sb layer is completed at room temperature, an RF magnetron sputtering time is 40 ~ 50 m in, an argon flow is 39 s cc m, a vacuum is 3 x 10 Pa, a power is 65 W, and a process pressure is 1 Pa. Previously presented

The fabrication method of a composite planar p H sensor modified by graphene film according to claim 8, wherein, the depositing of the Sb 2 0 3 layer is as follows: a target material is antimony, and a shielding gas is argon, and oxygen gas is added, the concentration ratio of argon and oxygen is 8:2, and a deposition time is 50 m in. Previously presented

The fabrication method of a composite planar p H sensor modified by graphene film according to claim 8, wherein, the depositing of the Ag layer is as follows: the magnetron sputtering method of depositing the Ag layer is R F magnetron sputtering, a target material is silver, and a shielding gas is argon; the RF magnetron sputtering is completed at room temperature, a time is 20 ~ 30 m in, an argon flow is 30 s cc m, a vacuum is 3x1 0 4 Pa, a power is 18 W, and a process pressure is 1 Pa. Previously presented

The fabrication method of a composite planar p H sensor modified by graphene film according to claim 8, wherein, a concentration of a used ferric chloride solution is 0.1 mol/L, and a soak time is 30 s. Previously presented

The fabrication method of a composite planar pH sensor modified by graphene film according to claim 8, wherein, a thickness of the Sb layer is 230 ~ 250 n m, the Sb 2 O 3 layer 40 ~ 60 ri m, and the TM membrane layer 1.5 ~1.9 pm. Currently amended

The fabrication method of a composite planar p H sensor modified by graphene film according to claim 8, wherein, a thickness of the Ag layer is 140 ~1 60 n m, the AgC l layer 1 5~ 25 n m, and the Ag layer is not covered with AgC l layer completely. Previously presented

A fabrication method of a composite planar pH sensor modified by graphene film including the steps of: preparing a substrate including forming a slot on each of two sides of the substrate, setting a first copper foil and a second copper foil on a bottom of the slots respectively; and preparing leads on the first copper foil and the second copper foil by a printing process respectively in the substrate; preparing a pH working electrode including coating with a first graphene film on the first copper foil using a micro mechanical stripping method; depositing a Sb layer on the first graphene film by a magnetron sputtering method; depositing a Sb 2 0 3 layer on a surface of the Sb layer by a magnetron sputtering method; coating with a TM membrane layer on a surface of the Sb 2 O 3 layer by a spin-coating method; wherein the pH working electrode comprises: the first graphene film, the Sb layer, the Sb 2 0 3 layer, and the TM membrane layer, wherein the first graphene film and the first copper foil are electrically connected to each other, preparing a reference electrode including coating foil using a micro mechanical stripping method; film by a magnetron sputtering method; dipping with a thir d graphene film on the AgC l layer using wherein the second graphene film, the Ag layer, together comprise the reference electrode. Currently with a second graphene film on a second copper depositing a Ag layer on the second graphene in a FeCl₃ solution to form a AgC l layer; coating a micro mechanical stripping method; the AgC l layer, and the third graphene film amended

Canceled

The fabrication method of a composite planar p H sensor modified by graphene film according to claim 8, wherein, the depositing of the Sb layer is as follows: the magnetron sputtering method of depositing the Sb layer is RF magnetron sputtering, a target material is antimony, and a shielding gas used is argon; the magnetron sputtering method of depositing the Sb layer is completed at room temperature, an RF magnetron sputtering time is 40 ~ 50 m in, an argon flow is 39 s cc m, a vacuum is 3 x 10 Pa, a power is 65 W, and a process pressure is 1 Pa. Previously presented

The fabrication method of a composite planar p H sensor modified by graphene film according to claim 8, wherein, the depositing of the Sb 2 0 3 layer is as follows: a target material is antimony, and a shielding gas is argon, and oxygen gas is added, the concentration ratio of argon and oxygen is 8:2, and a deposition time is 50 m in. Previously presented

The fabrication method of a composite planar p H sensor modified by graphene film according to claim 8, wherein, the depositing of the Ag layer is as follows: the magnetron sputtering method of depositing the Ag layer is R F magnetron sputtering, a target material is silver, and a shielding gas is argon; the RF magnetron sputtering is completed at room temperature, a time is 20 ~ 30 m in, an argon flow is 30 s cc m, a vacuum is 3x1 0 4 Pa, a power is 18 W, and a process pressure is 1 Pa. Previously presented

The fabrication method of a composite planar p H sensor modified by graphene film according to claim 8, wherein, a concentration of a used ferric chloride solution is 0.1 mol/L, and a soak time is 30 s. Previously presented

The fabrication method of a composite planar pH sensor modified by graphene film according to claim 8, wherein, a thickness of the Sb layer is 230 ~ 250 n m, the Sb 2 O 3 layer 40 ~ 60 ri m, and the TM membrane layer 1.5 ~1.9 pm. Currently amended

The fabrication method of a composite planar p H sensor modified by graphene film according to claim 8, wherein, a thickness of the Ag layer is 140 ~1 60 n m, the AgC l layer 1 5~ 25 n m, and the Ag layer is not covered with AgC l layer completely. Previously presented

A fabrication method of a composite planar pH sensor modified by graphene film including the steps of: preparing a substrate including forming a slot on each of two sides of the substrate, setting a first copper foil and a second copper foil on a bottom of the slots respectively; and preparing leads on the first copper foil and the second copper foil by a printing process respectively in the substrate; preparing a pH working electrode including coating with a first graphene film on the first copper foil using a micro mechanical stripping method; depositing a Sb layer on the first graphene film by a magnetron sputtering method; depositing a Sb 2 0 3 layer on a surface of the Sb layer by a magnetron sputtering method; coating with a TM membrane layer on a surface of the Sb 2 O 3 layer by a spin-coating method; wherein the pH working electrode comprises: the first graphene film, the Sb layer, the Sb 2 0 3 layer, and the TM membrane layer, wherein the first graphene film and the first copper foil are electrically connected to each other, preparing a reference electrode including coating foil using a micro mechanical stripping method; film by a magnetron sputtering method; dipping with a thir d graphene film on the AgC l layer using wherein the second graphene film, the Ag layer, together comprise the reference electrode. Currently with a second graphene film on a second copper depositing a Ag layer on the second graphene in a FeCl₃ solution to form a AgC l layer; coating a micro mechanical stripping method; the AgC l layer, and the third graphene film amended

Canceled

The fabrication method of a composite planar p H sensor modified by graphene film according to claim 8, wherein, the depositing of the Sb layer is as follows: the magnetron sputtering method of depositing the Sb layer is RF magnetron sputtering, a target material is antimony, and a shielding gas used is argon; the magnetron sputtering method of depositing the Sb layer is completed at room temperature, an RF magnetron sputtering time is 40 ~ 50 m in, an argon flow is 39 s cc m, a vacuum is 3 x 10 Pa, a power is 65 W, and a process pressure is 1 Pa. Previously presented

The fabrication method of a composite planar p H sensor modified by graphene film according to claim 8, wherein, the depositing of the Sb 2 0 3 layer is as follows: a target material is antimony, and a shielding gas is argon, and oxygen gas is added, the concentration ratio of argon and oxygen is 8:2, and a deposition time is 50 m in. Previously presented

The fabrication method of a composite planar p H sensor modified by graphene film according to claim 8, wherein, the depositing of the Ag layer is as follows: the magnetron sputtering method of depositing the Ag layer is R F magnetron sputtering, a target material is silver, and a shielding gas is argon; the RF magnetron sputtering is completed at room temperature, a time is 20 ~ 30 m in, an argon flow is 30 s cc m, a vacuum is 3x1 0 4 Pa, a power is 18 W, and a process pressure is 1 Pa. Previously presented

The fabrication method of a composite planar p H sensor modified by graphene film according to claim 8, wherein, a concentration of a used ferric chloride solution is 0.1 mol/L, and a soak time is 30 s. Previously presented

The fabrication method of a composite planar pH sensor modified by graphene film according to claim 8, wherein, a thickness of the Sb layer is 230 ~ 250 n m, the Sb 2 O 3 layer 40 ~ 60 ri m, and the TM membrane layer 1.5 ~1.9 pm. Currently amended

The fabrication method of a composite planar p H sensor modified by graphene film according to claim 8, wherein, a thickness of the Ag layer is 140 ~1 60 n m, the AgC l layer 1 5~ 25 n m, and the Ag layer is not covered with AgC l layer completely. Previously presented

A fabrication method of a composite planar pH sensor modified by graphene film including the steps of: preparing a substrate including forming a slot on each of two sides of the substrate, setting a first copper foil and a second copper foil on a bottom of the slots respectively; and preparing leads on the first copper foil and the second copper foil by a printing process respectively in the substrate; preparing a pH working electrode including coating with a first graphene film on the first copper foil using a micro mechanical stripping method; depositing a Sb layer on the first graphene film by a magnetron sputtering method; depositing a Sb 2 0 3 layer on a surface of the Sb layer by a magnetron sputtering method; coating with a TM membrane layer on a surface of the Sb 2 O 3 layer by a spin-coating method; wherein the pH working electrode comprises: the first graphene film, the Sb layer, the Sb 2 0 3 layer, and the TM membrane layer, wherein the first graphene film and the first copper foil are electrically connected to each other, preparing a reference electrode including coating foil using a micro mechanical stripping method; film by a magnetron sputtering method; dipping with a thir d graphene film on the AgC l layer using wherein the second graphene film, the Ag layer, together comprise the reference electrode. Currently with a second graphene film on a second copper depositing a Ag layer on the second graphene in a FeCl₃ solution to form a AgC l layer; coating a micro mechanical stripping method; the AgC l layer, and the third graphene film amended