Patent
US 10,850,986FLUORINATED GRAPHENE AND PREPARATION METHOD THEREOF
Jin YAN
US
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Patent drawings and their descriptions. Click a drawing to enlarge it.
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
1. A preparation method of fluorinated graphene, comprising: Si), under the protection of an inert gas, performing a first fluorination reaction between a graphene and a first fluorinating agent, wherein a reaction temperature is 150- 550 0 C, a reaction time is 2-20 h, and a fluorinated graphene crude product is obtained; and wherein the graphene is graphene powder, or a graphene film; and the first fluorinating agent comprises a fluorine gas; and next S 2), under the protection of an inert gas, performing a second fluorination reaction between the fluorinated graphene crude product and a second fluorinating agent, wherein the reaction temperature is 150-400 ' C, the reaction time is 2-10 h, and a fluorinated g raphene is obtained; and wherein the second fluorinatin g agent is a gas-phase fluoride. Currently amended
The preparation method according to claim 1, wherein the step S i) is specifically as follows: under the protection of the inert gas, mixed gas of the fluorine gas and the inert gas is introduced into a surface of the graphene continuously to perform the first fluorination reaction; and a volume ratio of the fluorine gas to the mixed gas is (1-30): 100. Previously presented
Previously presented
Materials described outside the worked examples.
graphene
fluorine gas
F₂
fluorinated graphene crude product
gas-phase fluoride
fluorinated graphene
phosphorus trifluoride
PF₃
bromine trifluoride
BrF₃
iodine trifluoride
IF₃
sulfur tetrafluoride
SF₄
anhydrous hydrogen fluoride
HF
boron trifluoride
BF₃
nitrogen trifluoride
NF₃
sulfuryl fluoride
SO₂F₂
thionyl fluoride
SOF₂
antimony pentafluoride
SbF₅
phosphorus trichloride
PCl₃
Additional fabrication and treatment steps described in the patent.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
fluorine content of fluorinated graphene product | 50–80 % | fluorinated graphene |
Temperature | 200–300 °C | — |
Temperature | 150–400 °C | — |
Temperature | 150–550 °C | — |
Pressure | ≥ 0.2 MPa | — |
Related documents with shared materials, methods, properties, or citations.
Patent drawings and their descriptions. Click a drawing to enlarge it.
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
1. A preparation method of fluorinated graphene, comprising: Si), under the protection of an inert gas, performing a first fluorination reaction between a graphene and a first fluorinating agent, wherein a reaction temperature is 150- 550 0 C, a reaction time is 2-20 h, and a fluorinated graphene crude product is obtained; and wherein the graphene is graphene powder, or a graphene film; and the first fluorinating agent comprises a fluorine gas; and next S 2), under the protection of an inert gas, performing a second fluorination reaction between the fluorinated graphene crude product and a second fluorinating agent, wherein the reaction temperature is 150-400 ' C, the reaction time is 2-10 h, and a fluorinated g raphene is obtained; and wherein the second fluorinatin g agent is a gas-phase fluoride. Currently amended
The preparation method according to claim 1, wherein the step S i) is specifically as follows: under the protection of the inert gas, mixed gas of the fluorine gas and the inert gas is introduced into a surface of the graphene continuously to perform the first fluorination reaction; and a volume ratio of the fluorine gas to the mixed gas is (1-30): 100. Previously presented
Previously presented
Materials described outside the worked examples.
graphene
fluorine gas
F₂
fluorinated graphene crude product
gas-phase fluoride
fluorinated graphene
phosphorus trifluoride
PF₃
bromine trifluoride
BrF₃
iodine trifluoride
IF₃
sulfur tetrafluoride
SF₄
anhydrous hydrogen fluoride
HF
boron trifluoride
BF₃
nitrogen trifluoride
NF₃
sulfuryl fluoride
SO₂F₂
thionyl fluoride
SOF₂
antimony pentafluoride
SbF₅
phosphorus trichloride
PCl₃
Additional fabrication and treatment steps described in the patent.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
fluorine content of fluorinated graphene product | 50–80 % | fluorinated graphene |
Temperature | 200–300 °C | — |
Temperature | 150–400 °C | — |
Temperature | 150–550 °C | — |
Pressure | ≥ 0.2 MPa | — |
Related documents with shared materials, methods, properties, or citations.
Patent drawings and their descriptions. Click a drawing to enlarge it.
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
1. A preparation method of fluorinated graphene, comprising: Si), under the protection of an inert gas, performing a first fluorination reaction between a graphene and a first fluorinating agent, wherein a reaction temperature is 150- 550 0 C, a reaction time is 2-20 h, and a fluorinated graphene crude product is obtained; and wherein the graphene is graphene powder, or a graphene film; and the first fluorinating agent comprises a fluorine gas; and next S 2), under the protection of an inert gas, performing a second fluorination reaction between the fluorinated graphene crude product and a second fluorinating agent, wherein the reaction temperature is 150-400 ' C, the reaction time is 2-10 h, and a fluorinated g raphene is obtained; and wherein the second fluorinatin g agent is a gas-phase fluoride. Currently amended
The preparation method according to claim 1, wherein the step S i) is specifically as follows: under the protection of the inert gas, mixed gas of the fluorine gas and the inert gas is introduced into a surface of the graphene continuously to perform the first fluorination reaction; and a volume ratio of the fluorine gas to the mixed gas is (1-30): 100. Previously presented
Previously presented
Materials described outside the worked examples.
graphene
fluorine gas
F₂
fluorinated graphene crude product
gas-phase fluoride
fluorinated graphene
phosphorus trifluoride
PF₃
bromine trifluoride
BrF₃
iodine trifluoride
IF₃
sulfur tetrafluoride
SF₄
anhydrous hydrogen fluoride
HF
boron trifluoride
BF₃
nitrogen trifluoride
NF₃
sulfuryl fluoride
SO₂F₂
thionyl fluoride
SOF₂
antimony pentafluoride
SbF₅
phosphorus trichloride
PCl₃
Additional fabrication and treatment steps described in the patent.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
fluorine content of fluorinated graphene product | 50–80 % | fluorinated graphene |
Temperature | 200–300 °C | — |
Temperature | 150–400 °C | — |
Temperature | 150–550 °C | — |
Pressure | ≥ 0.2 MPa | — |
Related documents with shared materials, methods, properties, or citations.
Patent drawings and their descriptions. Click a drawing to enlarge it.
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
1. A preparation method of fluorinated graphene, comprising: Si), under the protection of an inert gas, performing a first fluorination reaction between a graphene and a first fluorinating agent, wherein a reaction temperature is 150- 550 0 C, a reaction time is 2-20 h, and a fluorinated graphene crude product is obtained; and wherein the graphene is graphene powder, or a graphene film; and the first fluorinating agent comprises a fluorine gas; and next S 2), under the protection of an inert gas, performing a second fluorination reaction between the fluorinated graphene crude product and a second fluorinating agent, wherein the reaction temperature is 150-400 ' C, the reaction time is 2-10 h, and a fluorinated g raphene is obtained; and wherein the second fluorinatin g agent is a gas-phase fluoride. Currently amended
The preparation method according to claim 1, wherein the step S i) is specifically as follows: under the protection of the inert gas, mixed gas of the fluorine gas and the inert gas is introduced into a surface of the graphene continuously to perform the first fluorination reaction; and a volume ratio of the fluorine gas to the mixed gas is (1-30): 100. Previously presented
Previously presented
Materials described outside the worked examples.
graphene
fluorine gas
F₂
fluorinated graphene crude product
gas-phase fluoride
fluorinated graphene
phosphorus trifluoride
PF₃
bromine trifluoride
BrF₃
iodine trifluoride
IF₃
sulfur tetrafluoride
SF₄
anhydrous hydrogen fluoride
HF
boron trifluoride
BF₃
nitrogen trifluoride
NF₃
sulfuryl fluoride
SO₂F₂
thionyl fluoride
SOF₂
antimony pentafluoride
SbF₅
phosphorus trichloride
PCl₃
Additional fabrication and treatment steps described in the patent.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
fluorine content of fluorinated graphene product | 50–80 % | fluorinated graphene |
Temperature | 200–300 °C | — |
Temperature | 150–400 °C | — |
Temperature | 150–550 °C | — |
Pressure | ≥ 0.2 MPa | — |
Related documents with shared materials, methods, properties, or citations.