Patent
US 9,017,474polytetrafluoroethylene
copolymer of tetrafluoroethylene and hexafluoropropylene
copolymer of tetrafluoroethylene and perfluorinated vinyl ether
copolymer of ethylene and tetrafluoroethylene
copolymer of ethylene and chlorotrifluoroethylene
poly(vinylidene fluoride)
copolymer of vinylidene fluoride and hexafluoropropylene
copolymer of tetrafluoroethylene and perfluoromethylvinylether
terpolymer of tetrafluoroethylene, hexafluoropropylene, and vinylidene fluoride
| 1.06 dimensionless |
CF |
C:F ratio (XPS, sample FGP016) | 1.65 dimensionless | CF |
C:F ratio (XPS, sample FGP017) | 1.72 dimensionless | CF |
C:F ratio (XPS, sample FGP019) | 1.45 dimensionless | CF |
C:F ratio (XPS, sample FGP020) | 1.44 dimensionless | CF |
C:F ratio (XPS, sample FGM8) | 1.48 dimensionless | CF |
C:F ratio (XPS, sample FGM9) | 1.28 dimensionless | CF |
C:F ratio (XPS, sample FGM14) | 1.31 dimensionless | CF |
Thickness | 0.1–1 cm | — |
Thickness | ≤ 2 nm | — |
Temperature | ≤ 50 K | — |
Temperature | ≥ 4 K | — |
Pressure | 5–150 bar | — |
Pressure | 1–10 bar | — |
Temperature | 215–270 °C | — |
Duration | 1–168 hours | — |
Duration | 8–48 hours | — |
Duration | 12–36 hours | — |
Duration | 12–24 hours | — |
Duration | 12–18 hours | — |
Duration | 1–12 hours | — |
Duration | 8–168 hours | — |
Temperature | 0–450 °C | — |
Temperature | 0–200 °C | — |
Temperature | 0–70 °C | — |
Pressure | 10–100 bar | — |
Pressure | 50–100 bar | — |
Thickness | 1–5 nm | — |
Temperature | 70–200 °C | — |
Temperature | 200–450 °C | — |
Temperature | 200–400 °C | — |
Duration | 20–24 hours | — |
Temperature | 190–240 °C | — |
— | ≤ 3 eV | — |
— | ≤ 2.5 eV | — |
Duration | ≥ 24 hours | — |
Duration | ≥ 168 hours | — |
Duration | ≥ 720 hours | — |
Duration | ≥ 9000 hours | — |
Duration | ≥ 100000 hours | — |
Temperature | ≥ 1 °C | — |
Temperature | ≥ 150 °C | — |
Temperature | ≥ 200 °C | — |
Temperature | ≥ 260 °C | — |
Thickness | 3–5 nm | — |
METHOD OF PREPARING GRAPHENE QUANTUM DOT, HARDMASK COMPOSITION INCLUDING THE GRAPHENE QUANTUM DOT OBTAINED BY THE METHOD, METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION, AND HARDMASK FORMED FROM THE HARDMASK COMPOSITION
polytetrafluoroethylene
copolymer of tetrafluoroethylene and hexafluoropropylene
copolymer of tetrafluoroethylene and perfluorinated vinyl ether
copolymer of ethylene and tetrafluoroethylene
copolymer of ethylene and chlorotrifluoroethylene
poly(vinylidene fluoride)
copolymer of vinylidene fluoride and hexafluoropropylene
copolymer of tetrafluoroethylene and perfluoromethylvinylether
terpolymer of tetrafluoroethylene, hexafluoropropylene, and vinylidene fluoride
| 1.06 dimensionless |
CF |
C:F ratio (XPS, sample FGP016) | 1.65 dimensionless | CF |
C:F ratio (XPS, sample FGP017) | 1.72 dimensionless | CF |
C:F ratio (XPS, sample FGP019) | 1.45 dimensionless | CF |
C:F ratio (XPS, sample FGP020) | 1.44 dimensionless | CF |
C:F ratio (XPS, sample FGM8) | 1.48 dimensionless | CF |
C:F ratio (XPS, sample FGM9) | 1.28 dimensionless | CF |
C:F ratio (XPS, sample FGM14) | 1.31 dimensionless | CF |
Thickness | 0.1–1 cm | — |
Thickness | ≤ 2 nm | — |
Temperature | ≤ 50 K | — |
Temperature | ≥ 4 K | — |
Pressure | 5–150 bar | — |
Pressure | 1–10 bar | — |
Temperature | 215–270 °C | — |
Duration | 1–168 hours | — |
Duration | 8–48 hours | — |
Duration | 12–36 hours | — |
Duration | 12–24 hours | — |
Duration | 12–18 hours | — |
Duration | 1–12 hours | — |
Duration | 8–168 hours | — |
Temperature | 0–450 °C | — |
Temperature | 0–200 °C | — |
Temperature | 0–70 °C | — |
Pressure | 10–100 bar | — |
Pressure | 50–100 bar | — |
Thickness | 1–5 nm | — |
Temperature | 70–200 °C | — |
Temperature | 200–450 °C | — |
Temperature | 200–400 °C | — |
Duration | 20–24 hours | — |
Temperature | 190–240 °C | — |
— | ≤ 3 eV | — |
— | ≤ 2.5 eV | — |
Duration | ≥ 24 hours | — |
Duration | ≥ 168 hours | — |
Duration | ≥ 720 hours | — |
Duration | ≥ 9000 hours | — |
Duration | ≥ 100000 hours | — |
Temperature | ≥ 1 °C | — |
Temperature | ≥ 150 °C | — |
Temperature | ≥ 200 °C | — |
Temperature | ≥ 260 °C | — |
Thickness | 3–5 nm | — |
METHOD OF PREPARING GRAPHENE QUANTUM DOT, HARDMASK COMPOSITION INCLUDING THE GRAPHENE QUANTUM DOT OBTAINED BY THE METHOD, METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION, AND HARDMASK FORMED FROM THE HARDMASK COMPOSITION
polytetrafluoroethylene
copolymer of tetrafluoroethylene and hexafluoropropylene
copolymer of tetrafluoroethylene and perfluorinated vinyl ether
copolymer of ethylene and tetrafluoroethylene
copolymer of ethylene and chlorotrifluoroethylene
poly(vinylidene fluoride)
copolymer of vinylidene fluoride and hexafluoropropylene
copolymer of tetrafluoroethylene and perfluoromethylvinylether
terpolymer of tetrafluoroethylene, hexafluoropropylene, and vinylidene fluoride
| 1.06 dimensionless |
CF |
C:F ratio (XPS, sample FGP016) | 1.65 dimensionless | CF |
C:F ratio (XPS, sample FGP017) | 1.72 dimensionless | CF |
C:F ratio (XPS, sample FGP019) | 1.45 dimensionless | CF |
C:F ratio (XPS, sample FGP020) | 1.44 dimensionless | CF |
C:F ratio (XPS, sample FGM8) | 1.48 dimensionless | CF |
C:F ratio (XPS, sample FGM9) | 1.28 dimensionless | CF |
C:F ratio (XPS, sample FGM14) | 1.31 dimensionless | CF |
Thickness | 0.1–1 cm | — |
Thickness | ≤ 2 nm | — |
Temperature | ≤ 50 K | — |
Temperature | ≥ 4 K | — |
Pressure | 5–150 bar | — |
Pressure | 1–10 bar | — |
Temperature | 215–270 °C | — |
Duration | 1–168 hours | — |
Duration | 8–48 hours | — |
Duration | 12–36 hours | — |
Duration | 12–24 hours | — |
Duration | 12–18 hours | — |
Duration | 1–12 hours | — |
Duration | 8–168 hours | — |
Temperature | 0–450 °C | — |
Temperature | 0–200 °C | — |
Temperature | 0–70 °C | — |
Pressure | 10–100 bar | — |
Pressure | 50–100 bar | — |
Thickness | 1–5 nm | — |
Temperature | 70–200 °C | — |
Temperature | 200–450 °C | — |
Temperature | 200–400 °C | — |
Duration | 20–24 hours | — |
Temperature | 190–240 °C | — |
— | ≤ 3 eV | — |
— | ≤ 2.5 eV | — |
Duration | ≥ 24 hours | — |
Duration | ≥ 168 hours | — |
Duration | ≥ 720 hours | — |
Duration | ≥ 9000 hours | — |
Duration | ≥ 100000 hours | — |
Temperature | ≥ 1 °C | — |
Temperature | ≥ 150 °C | — |
Temperature | ≥ 200 °C | — |
Temperature | ≥ 260 °C | — |
Thickness | 3–5 nm | — |
METHOD OF PREPARING GRAPHENE QUANTUM DOT, HARDMASK COMPOSITION INCLUDING THE GRAPHENE QUANTUM DOT OBTAINED BY THE METHOD, METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION, AND HARDMASK FORMED FROM THE HARDMASK COMPOSITION
polytetrafluoroethylene
copolymer of tetrafluoroethylene and hexafluoropropylene
copolymer of tetrafluoroethylene and perfluorinated vinyl ether
copolymer of ethylene and tetrafluoroethylene
copolymer of ethylene and chlorotrifluoroethylene
poly(vinylidene fluoride)
copolymer of vinylidene fluoride and hexafluoropropylene
copolymer of tetrafluoroethylene and perfluoromethylvinylether
terpolymer of tetrafluoroethylene, hexafluoropropylene, and vinylidene fluoride
| 1.06 dimensionless |
CF |
C:F ratio (XPS, sample FGP016) | 1.65 dimensionless | CF |
C:F ratio (XPS, sample FGP017) | 1.72 dimensionless | CF |
C:F ratio (XPS, sample FGP019) | 1.45 dimensionless | CF |
C:F ratio (XPS, sample FGP020) | 1.44 dimensionless | CF |
C:F ratio (XPS, sample FGM8) | 1.48 dimensionless | CF |
C:F ratio (XPS, sample FGM9) | 1.28 dimensionless | CF |
C:F ratio (XPS, sample FGM14) | 1.31 dimensionless | CF |
Thickness | 0.1–1 cm | — |
Thickness | ≤ 2 nm | — |
Temperature | ≤ 50 K | — |
Temperature | ≥ 4 K | — |
Pressure | 5–150 bar | — |
Pressure | 1–10 bar | — |
Temperature | 215–270 °C | — |
Duration | 1–168 hours | — |
Duration | 8–48 hours | — |
Duration | 12–36 hours | — |
Duration | 12–24 hours | — |
Duration | 12–18 hours | — |
Duration | 1–12 hours | — |
Duration | 8–168 hours | — |
Temperature | 0–450 °C | — |
Temperature | 0–200 °C | — |
Temperature | 0–70 °C | — |
Pressure | 10–100 bar | — |
Pressure | 50–100 bar | — |
Thickness | 1–5 nm | — |
Temperature | 70–200 °C | — |
Temperature | 200–450 °C | — |
Temperature | 200–400 °C | — |
Duration | 20–24 hours | — |
Temperature | 190–240 °C | — |
— | ≤ 3 eV | — |
— | ≤ 2.5 eV | — |
Duration | ≥ 24 hours | — |
Duration | ≥ 168 hours | — |
Duration | ≥ 720 hours | — |
Duration | ≥ 9000 hours | — |
Duration | ≥ 100000 hours | — |
Temperature | ≥ 1 °C | — |
Temperature | ≥ 150 °C | — |
Temperature | ≥ 200 °C | — |
Temperature | ≥ 260 °C | — |
Thickness | 3–5 nm | — |
METHOD OF PREPARING GRAPHENE QUANTUM DOT, HARDMASK COMPOSITION INCLUDING THE GRAPHENE QUANTUM DOT OBTAINED BY THE METHOD, METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION, AND HARDMASK FORMED FROM THE HARDMASK COMPOSITION