Patent
US 11,370,662Hexagonal boron nitride structures
Luigi COLOMBO
US
Copyright © 2026 Matter42. All rights reserved.
Patent
Atlas literature
Patent
US 11,370,662Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1 A is a schematic drawing of a fabrication process for a metal- based microlattice template in accordance with an example. [0019]
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A microstructure comprising: interconnected units including a first unit formed of first two-dimensional hexagonal boron nitride (2 D h-BN) tubes coated with SiO2; and a second unit formed of second 2 D h-BN) tubes coated with SiO2, wherein at least one f the second (2D h-BN) tubes is connected to at least one f the first 2 D h-BN) tubes. Currently amended
The microstructure of claim 1. wherein the 2D h-BN tubes are arranged in an ordered structure and form symmetric patterns that repeat along the principal directions of three-dimensional space. Currently amended
The microstructure of claim 1. wherein the interconnected units of 2D h-BN tubes form a ri gid structure. Currently amended
The microstructure of claim 1. wherein the 2D h-BN tubes are hollow. Currently amended
(Withdrawn-Currently Amended) The 2D h-BN microstructure of claim 1 1, wherein photoinitiating the polymerization of the monomer comprises passing collimated light through a photomask. Currently amended
(Withdrawn-Currently Amended) The 2D h-BN microstructure of claim 1 1, wherein photoinitiating the polymerization of the monomer comprises multi-photon lithography. Currently amended
(Withdrawn-Currently Amended) The microstructure of claim 1 8, wherein the parallel tubes are hollow. Currently amended
The microstructure of laim 1, wherein the interconnected units form a microlattice. Currently amended
(Withdrawn-Currently Amended) A method of forming a 2D h-BN microstructure comprising: photo-initiating the polymerization of a monomer in a pattern of interconnected units to form a polymer microlattice; removing unpolymerized monomer; coating the polymer microlattice with a metal; removing the polymer microlattice to leave a metal microlattice; depositing 2D h-BN precursor on the metal microlattice; converting the 2D h-BN precursor to 2D h-BN; and removing the metal microlattice. Currently amended
(Withdrawn-Currently Amended) The method o f claim 6, wherein photo-initiating the polyme ri zation of the monomer comprises passing collimated light through a photomask. Currently amended
(Withdrawn-Currently Amended) The method of claim 6, wherein photo-initiating the polymerization of the monomer comprises multi-photon lithography. Currently amended
(Withdrawn-Currently Amended) The method of laim 6. wherein coating the polymer microlattice with a metal comp ri ses the electroless deposition of nickel. Currently amended
(Withdrawn-Currently Amended) The method of laim 6, wherein the polymer microlattice comprises polystyrene or poly(methyl methacrylate). Currently amended
(Withdrawn-Currently Amended) A two-dimensional hexagonal boron nitride (2 D h- BN microstructure prepared by a process comprising the steps of: photo-initiating the polymerization of a monomer in a pattern of interconnected units to form a polymer microlattice; removing unpolymerized monomer; coating the polymer microlattice with a metal; removing the polymer microlattice to leave a metal microlattice; depositing a 2D h-BN precursor on the metal microlattice; converting the 2D h-BN precursor to 2D h-BN; and removing the metal microlattice. Currently amended
(Withdrawn-Currently Amended) The 2D h-BN microstructure of claim 11, wherein coating the polymer microlattice with a metal comprises the electroless deposition of nickel. Currently amended
1 5. (Withdrawn-Currently Amended) The 2D h-BN microstructure of claim 11 a wherein the polymer microlattice comprises polystyrene. Currently amended
(Withdrawn-Currently Amended) The 2D h-BN microstructure of claim 11, wherein the polymer microlattice comprises poly(methyl methacrylate). Currently amended
(Withdrawn-Currently Amended) A microstructure comprising: interconnected units including at least a first unit formed of first two- dimensional hexagonal boron nitride (2D h-BN) tubes coated with SiO2; and a second unit formed of second 2 D h-BN) tubes coated with SiO 2, wherein one or more of the second tubes formed of 2D h-BN) tubes coated with S iO 2 are connected to one or more of the first tubes formed of 2 D h-BN) tubes coated with S iO2. Currently amended
(Withdrawn-Currently Amended) The microstructure of claim 17, wherein the interconnected units consist essentially of parallel tubes. Currently amended
(Withdrawn-Currently Amended) A method of forming a metal/two-dimensional hexagonal boron nitride (2D h-BN) microstructure comprising: photo-initiating the polymerization of a monomer in a pattern of interconnected units to form a polymer microlattice; removing unpolymerized monomer; coating the polymer microlattice with a metal; removing the polymer microlattice to leave a metal microlattice; depositing 2D h-BN precursor on the metal microlattice; and converting the 2D h-BN precursor to 2D h-BN. Currently amended
Layer stacks claimed or described, ordered top of device to substrate.
2D h-BN microstructure with SiO₂-coated interconnected tubes
2D h-BN microlattice
Materials described outside the worked examples.
two-dimensional hexagonal boron nitride
h-BN
silicon dioxide coating
SiO₂
Additional fabrication and treatment steps described in the patent.
Related documents with shared materials, methods, properties, or citations.
Patent
Atlas literature
Patent
US 11,370,662Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1 A is a schematic drawing of a fabrication process for a metal- based microlattice template in accordance with an example. [0019]
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A microstructure comprising: interconnected units including a first unit formed of first two-dimensional hexagonal boron nitride (2 D h-BN) tubes coated with SiO2; and a second unit formed of second 2 D h-BN) tubes coated with SiO2, wherein at least one f the second (2D h-BN) tubes is connected to at least one f the first 2 D h-BN) tubes. Currently amended
The microstructure of claim 1. wherein the 2D h-BN tubes are arranged in an ordered structure and form symmetric patterns that repeat along the principal directions of three-dimensional space. Currently amended
The microstructure of claim 1. wherein the interconnected units of 2D h-BN tubes form a ri gid structure. Currently amended
The microstructure of claim 1. wherein the 2D h-BN tubes are hollow. Currently amended
(Withdrawn-Currently Amended) The 2D h-BN microstructure of claim 1 1, wherein photoinitiating the polymerization of the monomer comprises passing collimated light through a photomask. Currently amended
(Withdrawn-Currently Amended) The 2D h-BN microstructure of claim 1 1, wherein photoinitiating the polymerization of the monomer comprises multi-photon lithography. Currently amended
(Withdrawn-Currently Amended) The microstructure of claim 1 8, wherein the parallel tubes are hollow. Currently amended
The microstructure of laim 1, wherein the interconnected units form a microlattice. Currently amended
(Withdrawn-Currently Amended) A method of forming a 2D h-BN microstructure comprising: photo-initiating the polymerization of a monomer in a pattern of interconnected units to form a polymer microlattice; removing unpolymerized monomer; coating the polymer microlattice with a metal; removing the polymer microlattice to leave a metal microlattice; depositing 2D h-BN precursor on the metal microlattice; converting the 2D h-BN precursor to 2D h-BN; and removing the metal microlattice. Currently amended
(Withdrawn-Currently Amended) The method o f claim 6, wherein photo-initiating the polyme ri zation of the monomer comprises passing collimated light through a photomask. Currently amended
(Withdrawn-Currently Amended) The method of claim 6, wherein photo-initiating the polymerization of the monomer comprises multi-photon lithography. Currently amended
(Withdrawn-Currently Amended) The method of laim 6. wherein coating the polymer microlattice with a metal comp ri ses the electroless deposition of nickel. Currently amended
(Withdrawn-Currently Amended) The method of laim 6, wherein the polymer microlattice comprises polystyrene or poly(methyl methacrylate). Currently amended
(Withdrawn-Currently Amended) A two-dimensional hexagonal boron nitride (2 D h- BN microstructure prepared by a process comprising the steps of: photo-initiating the polymerization of a monomer in a pattern of interconnected units to form a polymer microlattice; removing unpolymerized monomer; coating the polymer microlattice with a metal; removing the polymer microlattice to leave a metal microlattice; depositing a 2D h-BN precursor on the metal microlattice; converting the 2D h-BN precursor to 2D h-BN; and removing the metal microlattice. Currently amended
(Withdrawn-Currently Amended) The 2D h-BN microstructure of claim 11, wherein coating the polymer microlattice with a metal comprises the electroless deposition of nickel. Currently amended
1 5. (Withdrawn-Currently Amended) The 2D h-BN microstructure of claim 11 a wherein the polymer microlattice comprises polystyrene. Currently amended
(Withdrawn-Currently Amended) The 2D h-BN microstructure of claim 11, wherein the polymer microlattice comprises poly(methyl methacrylate). Currently amended
(Withdrawn-Currently Amended) A microstructure comprising: interconnected units including at least a first unit formed of first two- dimensional hexagonal boron nitride (2D h-BN) tubes coated with SiO2; and a second unit formed of second 2 D h-BN) tubes coated with SiO 2, wherein one or more of the second tubes formed of 2D h-BN) tubes coated with S iO 2 are connected to one or more of the first tubes formed of 2 D h-BN) tubes coated with S iO2. Currently amended
(Withdrawn-Currently Amended) The microstructure of claim 17, wherein the interconnected units consist essentially of parallel tubes. Currently amended
(Withdrawn-Currently Amended) A method of forming a metal/two-dimensional hexagonal boron nitride (2D h-BN) microstructure comprising: photo-initiating the polymerization of a monomer in a pattern of interconnected units to form a polymer microlattice; removing unpolymerized monomer; coating the polymer microlattice with a metal; removing the polymer microlattice to leave a metal microlattice; depositing 2D h-BN precursor on the metal microlattice; and converting the 2D h-BN precursor to 2D h-BN. Currently amended
Layer stacks claimed or described, ordered top of device to substrate.
2D h-BN microstructure with SiO₂-coated interconnected tubes
2D h-BN microlattice
Materials described outside the worked examples.
two-dimensional hexagonal boron nitride
h-BN
silicon dioxide coating
SiO₂
Additional fabrication and treatment steps described in the patent.
Related documents with shared materials, methods, properties, or citations.
Patent
Atlas literature
Patent
US 11,370,662Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1 A is a schematic drawing of a fabrication process for a metal- based microlattice template in accordance with an example. [0019]
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A microstructure comprising: interconnected units including a first unit formed of first two-dimensional hexagonal boron nitride (2 D h-BN) tubes coated with SiO2; and a second unit formed of second 2 D h-BN) tubes coated with SiO2, wherein at least one f the second (2D h-BN) tubes is connected to at least one f the first 2 D h-BN) tubes. Currently amended
The microstructure of claim 1. wherein the 2D h-BN tubes are arranged in an ordered structure and form symmetric patterns that repeat along the principal directions of three-dimensional space. Currently amended
The microstructure of claim 1. wherein the interconnected units of 2D h-BN tubes form a ri gid structure. Currently amended
The microstructure of claim 1. wherein the 2D h-BN tubes are hollow. Currently amended
(Withdrawn-Currently Amended) The 2D h-BN microstructure of claim 1 1, wherein photoinitiating the polymerization of the monomer comprises passing collimated light through a photomask. Currently amended
(Withdrawn-Currently Amended) The 2D h-BN microstructure of claim 1 1, wherein photoinitiating the polymerization of the monomer comprises multi-photon lithography. Currently amended
(Withdrawn-Currently Amended) The microstructure of claim 1 8, wherein the parallel tubes are hollow. Currently amended
The microstructure of laim 1, wherein the interconnected units form a microlattice. Currently amended
(Withdrawn-Currently Amended) A method of forming a 2D h-BN microstructure comprising: photo-initiating the polymerization of a monomer in a pattern of interconnected units to form a polymer microlattice; removing unpolymerized monomer; coating the polymer microlattice with a metal; removing the polymer microlattice to leave a metal microlattice; depositing 2D h-BN precursor on the metal microlattice; converting the 2D h-BN precursor to 2D h-BN; and removing the metal microlattice. Currently amended
(Withdrawn-Currently Amended) The method o f claim 6, wherein photo-initiating the polyme ri zation of the monomer comprises passing collimated light through a photomask. Currently amended
(Withdrawn-Currently Amended) The method of claim 6, wherein photo-initiating the polymerization of the monomer comprises multi-photon lithography. Currently amended
(Withdrawn-Currently Amended) The method of laim 6. wherein coating the polymer microlattice with a metal comp ri ses the electroless deposition of nickel. Currently amended
(Withdrawn-Currently Amended) The method of laim 6, wherein the polymer microlattice comprises polystyrene or poly(methyl methacrylate). Currently amended
(Withdrawn-Currently Amended) A two-dimensional hexagonal boron nitride (2 D h- BN microstructure prepared by a process comprising the steps of: photo-initiating the polymerization of a monomer in a pattern of interconnected units to form a polymer microlattice; removing unpolymerized monomer; coating the polymer microlattice with a metal; removing the polymer microlattice to leave a metal microlattice; depositing a 2D h-BN precursor on the metal microlattice; converting the 2D h-BN precursor to 2D h-BN; and removing the metal microlattice. Currently amended
(Withdrawn-Currently Amended) The 2D h-BN microstructure of claim 11, wherein coating the polymer microlattice with a metal comprises the electroless deposition of nickel. Currently amended
1 5. (Withdrawn-Currently Amended) The 2D h-BN microstructure of claim 11 a wherein the polymer microlattice comprises polystyrene. Currently amended
(Withdrawn-Currently Amended) The 2D h-BN microstructure of claim 11, wherein the polymer microlattice comprises poly(methyl methacrylate). Currently amended
(Withdrawn-Currently Amended) A microstructure comprising: interconnected units including at least a first unit formed of first two- dimensional hexagonal boron nitride (2D h-BN) tubes coated with SiO2; and a second unit formed of second 2 D h-BN) tubes coated with SiO 2, wherein one or more of the second tubes formed of 2D h-BN) tubes coated with S iO 2 are connected to one or more of the first tubes formed of 2 D h-BN) tubes coated with S iO2. Currently amended
(Withdrawn-Currently Amended) The microstructure of claim 17, wherein the interconnected units consist essentially of parallel tubes. Currently amended
(Withdrawn-Currently Amended) A method of forming a metal/two-dimensional hexagonal boron nitride (2D h-BN) microstructure comprising: photo-initiating the polymerization of a monomer in a pattern of interconnected units to form a polymer microlattice; removing unpolymerized monomer; coating the polymer microlattice with a metal; removing the polymer microlattice to leave a metal microlattice; depositing 2D h-BN precursor on the metal microlattice; and converting the 2D h-BN precursor to 2D h-BN. Currently amended
Layer stacks claimed or described, ordered top of device to substrate.
2D h-BN microstructure with SiO₂-coated interconnected tubes
2D h-BN microlattice
Materials described outside the worked examples.
two-dimensional hexagonal boron nitride
h-BN
silicon dioxide coating
SiO₂
Additional fabrication and treatment steps described in the patent.
Related documents with shared materials, methods, properties, or citations.
Patent
Atlas literature
Patent
US 11,370,662Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1 A is a schematic drawing of a fabrication process for a metal- based microlattice template in accordance with an example. [0019]
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A microstructure comprising: interconnected units including a first unit formed of first two-dimensional hexagonal boron nitride (2 D h-BN) tubes coated with SiO2; and a second unit formed of second 2 D h-BN) tubes coated with SiO2, wherein at least one f the second (2D h-BN) tubes is connected to at least one f the first 2 D h-BN) tubes. Currently amended
The microstructure of claim 1. wherein the 2D h-BN tubes are arranged in an ordered structure and form symmetric patterns that repeat along the principal directions of three-dimensional space. Currently amended
The microstructure of claim 1. wherein the interconnected units of 2D h-BN tubes form a ri gid structure. Currently amended
The microstructure of claim 1. wherein the 2D h-BN tubes are hollow. Currently amended
(Withdrawn-Currently Amended) The 2D h-BN microstructure of claim 1 1, wherein photoinitiating the polymerization of the monomer comprises passing collimated light through a photomask. Currently amended
(Withdrawn-Currently Amended) The 2D h-BN microstructure of claim 1 1, wherein photoinitiating the polymerization of the monomer comprises multi-photon lithography. Currently amended
(Withdrawn-Currently Amended) The microstructure of claim 1 8, wherein the parallel tubes are hollow. Currently amended
The microstructure of laim 1, wherein the interconnected units form a microlattice. Currently amended
(Withdrawn-Currently Amended) A method of forming a 2D h-BN microstructure comprising: photo-initiating the polymerization of a monomer in a pattern of interconnected units to form a polymer microlattice; removing unpolymerized monomer; coating the polymer microlattice with a metal; removing the polymer microlattice to leave a metal microlattice; depositing 2D h-BN precursor on the metal microlattice; converting the 2D h-BN precursor to 2D h-BN; and removing the metal microlattice. Currently amended
(Withdrawn-Currently Amended) The method o f claim 6, wherein photo-initiating the polyme ri zation of the monomer comprises passing collimated light through a photomask. Currently amended
(Withdrawn-Currently Amended) The method of claim 6, wherein photo-initiating the polymerization of the monomer comprises multi-photon lithography. Currently amended
(Withdrawn-Currently Amended) The method of laim 6. wherein coating the polymer microlattice with a metal comp ri ses the electroless deposition of nickel. Currently amended
(Withdrawn-Currently Amended) The method of laim 6, wherein the polymer microlattice comprises polystyrene or poly(methyl methacrylate). Currently amended
(Withdrawn-Currently Amended) A two-dimensional hexagonal boron nitride (2 D h- BN microstructure prepared by a process comprising the steps of: photo-initiating the polymerization of a monomer in a pattern of interconnected units to form a polymer microlattice; removing unpolymerized monomer; coating the polymer microlattice with a metal; removing the polymer microlattice to leave a metal microlattice; depositing a 2D h-BN precursor on the metal microlattice; converting the 2D h-BN precursor to 2D h-BN; and removing the metal microlattice. Currently amended
(Withdrawn-Currently Amended) The 2D h-BN microstructure of claim 11, wherein coating the polymer microlattice with a metal comprises the electroless deposition of nickel. Currently amended
1 5. (Withdrawn-Currently Amended) The 2D h-BN microstructure of claim 11 a wherein the polymer microlattice comprises polystyrene. Currently amended
(Withdrawn-Currently Amended) The 2D h-BN microstructure of claim 11, wherein the polymer microlattice comprises poly(methyl methacrylate). Currently amended
(Withdrawn-Currently Amended) A microstructure comprising: interconnected units including at least a first unit formed of first two- dimensional hexagonal boron nitride (2D h-BN) tubes coated with SiO2; and a second unit formed of second 2 D h-BN) tubes coated with SiO 2, wherein one or more of the second tubes formed of 2D h-BN) tubes coated with S iO 2 are connected to one or more of the first tubes formed of 2 D h-BN) tubes coated with S iO2. Currently amended
(Withdrawn-Currently Amended) The microstructure of claim 17, wherein the interconnected units consist essentially of parallel tubes. Currently amended
(Withdrawn-Currently Amended) A method of forming a metal/two-dimensional hexagonal boron nitride (2D h-BN) microstructure comprising: photo-initiating the polymerization of a monomer in a pattern of interconnected units to form a polymer microlattice; removing unpolymerized monomer; coating the polymer microlattice with a metal; removing the polymer microlattice to leave a metal microlattice; depositing 2D h-BN precursor on the metal microlattice; and converting the 2D h-BN precursor to 2D h-BN. Currently amended
Layer stacks claimed or described, ordered top of device to substrate.
2D h-BN microstructure with SiO₂-coated interconnected tubes
2D h-BN microlattice
Materials described outside the worked examples.
two-dimensional hexagonal boron nitride
h-BN
silicon dioxide coating
SiO₂
Additional fabrication and treatment steps described in the patent.
Related documents with shared materials, methods, properties, or citations.
h-BN precursor
nickel
Ni
polystyrene
poly(methyl methacrylate)
PMMA
borazine
(BH)3(NH)3
copper
Cu
cobalt
Co
gold
Au
silver
Ag
platinum
Pt
iridium
Ir
ruthenium
Ru
h-BN precursor
nickel
Ni
polystyrene
poly(methyl methacrylate)
PMMA
borazine
(BH)3(NH)3
copper
Cu
cobalt
Co
gold
Au
silver
Ag
platinum
Pt
iridium
Ir
ruthenium
Ru
h-BN precursor
nickel
Ni
polystyrene
poly(methyl methacrylate)
PMMA
borazine
(BH)3(NH)3
copper
Cu
cobalt
Co
gold
Au
silver
Ag
platinum
Pt
iridium
Ir
ruthenium
Ru
h-BN precursor
nickel
Ni
polystyrene
poly(methyl methacrylate)
PMMA
borazine
(BH)3(NH)3
copper
Cu
cobalt
Co
gold
Au
silver
Ag
platinum
Pt
iridium
Ir
ruthenium
Ru