Patent
US 10,745,641diamond-like carbon
nano-onions (scrolled nanodiamond conversion product)
graphene (chemically exfoliated from HOPG)
highly oriented pyrolytic graphite
ethanol
C₂H₅OH
h-BN 2D material
BN
graphene
| — |
Thickness | 3–5 nm | — |
Thickness | 3–50 nm | — |
Duration | 10–30 min | — |
Pressure | 1011–1013 pa | — |
Thickness | 7–10 nm | — |
Thickness | 3–100 nm | — |
Duration | 20–30 minutes | — |
Duration | 20–30 mins | — |
Thickness | 5–7 nm | — |
Thickness | 20–30 nm | — |
Thickness | 0.6–9 cm | — |
Thickness | 8–10 nm | — |
Thickness | ≤ 10 nm | — |
Temperature | ≥ 900 K | — |
Thickness | ≥ 1 nm | — |
diamond-like carbon
nano-onions (scrolled nanodiamond conversion product)
graphene (chemically exfoliated from HOPG)
highly oriented pyrolytic graphite
ethanol
C₂H₅OH
h-BN 2D material
BN
graphene
| — |
Thickness | 3–5 nm | — |
Thickness | 3–50 nm | — |
Duration | 10–30 min | — |
Pressure | 1011–1013 pa | — |
Thickness | 7–10 nm | — |
Thickness | 3–100 nm | — |
Duration | 20–30 minutes | — |
Duration | 20–30 mins | — |
Thickness | 5–7 nm | — |
Thickness | 20–30 nm | — |
Thickness | 0.6–9 cm | — |
Thickness | 8–10 nm | — |
Thickness | ≤ 10 nm | — |
Temperature | ≥ 900 K | — |
Thickness | ≥ 1 nm | — |
diamond-like carbon
nano-onions (scrolled nanodiamond conversion product)
graphene (chemically exfoliated from HOPG)
highly oriented pyrolytic graphite
ethanol
C₂H₅OH
h-BN 2D material
BN
graphene
| — |
Thickness | 3–5 nm | — |
Thickness | 3–50 nm | — |
Duration | 10–30 min | — |
Pressure | 1011–1013 pa | — |
Thickness | 7–10 nm | — |
Thickness | 3–100 nm | — |
Duration | 20–30 minutes | — |
Duration | 20–30 mins | — |
Thickness | 5–7 nm | — |
Thickness | 20–30 nm | — |
Thickness | 0.6–9 cm | — |
Thickness | 8–10 nm | — |
Thickness | ≤ 10 nm | — |
Temperature | ≥ 900 K | — |
Thickness | ≥ 1 nm | — |
diamond-like carbon
nano-onions (scrolled nanodiamond conversion product)
graphene (chemically exfoliated from HOPG)
highly oriented pyrolytic graphite
ethanol
C₂H₅OH
h-BN 2D material
BN
graphene
| — |
Thickness | 3–5 nm | — |
Thickness | 3–50 nm | — |
Duration | 10–30 min | — |
Pressure | 1011–1013 pa | — |
Thickness | 7–10 nm | — |
Thickness | 3–100 nm | — |
Duration | 20–30 minutes | — |
Duration | 20–30 mins | — |
Thickness | 5–7 nm | — |
Thickness | 20–30 nm | — |
Thickness | 0.6–9 cm | — |
Thickness | 8–10 nm | — |
Thickness | ≤ 10 nm | — |
Temperature | ≥ 900 K | — |
Thickness | ≥ 1 nm | — |