Patent
US 11,512,000POROUS GRAPHENE FILM, ITS MANUFACTURING METHOD AND ELECTRONIC PRODUCT
Wenqin DAI
US
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Patent
Atlas literature
Patent
US 11,512,000Patent drawings and their descriptions. Click a drawing to enlarge it.
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method of manufacturing a porous graphene film, comprising: mixing a dispersion liquid of graphene with a dispersion liquid of particles to form a mixed liquid; adjusting pH value of the mixed liquid by adding NH 3 -H 2 O to about 9 to about 11; performing a film-forming process to form a mixed film of graphene and particles; and removing the particles in the mixed film of graphene and particles to form the porous graphene film. Previously presented
The method of manufacturing the porous graphene film according to claim 1, wherein the graphene is a reduced graphene oxide. Original
The method of manufacturing the porous graphene film according to claim 1, wherein the particles have a particle size of from about 0.3 micron to about 3.0 microns. Previously presented
The method of manufacturing the porous graphene film according to claim 1, wherein the particles are organic polymer particles or inorganic particles. Previously presented
The method of manufacturing the porous graphene film according to claim 1, wherein the mixed film of graphene and particles is formed by a suction filtration process. Previously presented
The method of manufacturing the porous graphene film according to claim 1, wherein the pH value of the mixed liquid is adjusted to about 10. Previously presented
The method of manufacturing the porous graphene film according to claim 1, wherein the particles in the mixed film of graphene and particles are removed by a solution immersion process or a high temperature calcination process. Previously presented
The method of manufacturing the porous graphene film according to claim 1, wherein after adjusting the pH value of the mixed liquid, ultrasonic treatment is carried out to make the mixed liquid uniform. Previously presented
. Canceled
15-16.. Canceled
Canceled
. Canceled
Embodiments described in the patent, grouped by the materials and process steps they use.
4 materials1 process step
Method of manufacturing a porous graphene film using reduced graphene oxide (RGO) and polystyrene (PS) microspheres (~1.5 micron diameter). Dispersion liquids of RGO (0.1–1 g/L) and PS microspheres (0.1–1 g/L) are prepared in distilled water, mixed, pH adjusted to alkaline (9–11) with NH₃-H₂O, followed by ultrasonic treatment, suction filtration film-forming, and removal of PS particles by dissolution in tetrahydrofuran or toluene or by high-temperature calcination to leave a porous graphene film.
Layer stacks claimed or described, ordered top of device to substrate.
electronic product with porous graphene conductive layer
Materials described outside the worked examples.
graphene
particles (generic, 0.3–3.0 microns)
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Thickness | 0.3–3 µm | — |
Duration | 10–15 minutes |
Patent
Atlas literature
Patent
US 11,512,000Patent drawings and their descriptions. Click a drawing to enlarge it.
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method of manufacturing a porous graphene film, comprising: mixing a dispersion liquid of graphene with a dispersion liquid of particles to form a mixed liquid; adjusting pH value of the mixed liquid by adding NH 3 -H 2 O to about 9 to about 11; performing a film-forming process to form a mixed film of graphene and particles; and removing the particles in the mixed film of graphene and particles to form the porous graphene film. Previously presented
The method of manufacturing the porous graphene film according to claim 1, wherein the graphene is a reduced graphene oxide. Original
The method of manufacturing the porous graphene film according to claim 1, wherein the particles have a particle size of from about 0.3 micron to about 3.0 microns. Previously presented
The method of manufacturing the porous graphene film according to claim 1, wherein the particles are organic polymer particles or inorganic particles. Previously presented
The method of manufacturing the porous graphene film according to claim 1, wherein the mixed film of graphene and particles is formed by a suction filtration process. Previously presented
The method of manufacturing the porous graphene film according to claim 1, wherein the pH value of the mixed liquid is adjusted to about 10. Previously presented
The method of manufacturing the porous graphene film according to claim 1, wherein the particles in the mixed film of graphene and particles are removed by a solution immersion process or a high temperature calcination process. Previously presented
The method of manufacturing the porous graphene film according to claim 1, wherein after adjusting the pH value of the mixed liquid, ultrasonic treatment is carried out to make the mixed liquid uniform. Previously presented
. Canceled
15-16.. Canceled
Canceled
. Canceled
Embodiments described in the patent, grouped by the materials and process steps they use.
4 materials1 process step
Method of manufacturing a porous graphene film using reduced graphene oxide (RGO) and polystyrene (PS) microspheres (~1.5 micron diameter). Dispersion liquids of RGO (0.1–1 g/L) and PS microspheres (0.1–1 g/L) are prepared in distilled water, mixed, pH adjusted to alkaline (9–11) with NH₃-H₂O, followed by ultrasonic treatment, suction filtration film-forming, and removal of PS particles by dissolution in tetrahydrofuran or toluene or by high-temperature calcination to leave a porous graphene film.
Layer stacks claimed or described, ordered top of device to substrate.
electronic product with porous graphene conductive layer
Materials described outside the worked examples.
graphene
particles (generic, 0.3–3.0 microns)
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Thickness | 0.3–3 µm | — |
Duration | 10–15 minutes |
Patent
Atlas literature
Patent
US 11,512,000Patent drawings and their descriptions. Click a drawing to enlarge it.
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method of manufacturing a porous graphene film, comprising: mixing a dispersion liquid of graphene with a dispersion liquid of particles to form a mixed liquid; adjusting pH value of the mixed liquid by adding NH 3 -H 2 O to about 9 to about 11; performing a film-forming process to form a mixed film of graphene and particles; and removing the particles in the mixed film of graphene and particles to form the porous graphene film. Previously presented
The method of manufacturing the porous graphene film according to claim 1, wherein the graphene is a reduced graphene oxide. Original
The method of manufacturing the porous graphene film according to claim 1, wherein the particles have a particle size of from about 0.3 micron to about 3.0 microns. Previously presented
The method of manufacturing the porous graphene film according to claim 1, wherein the particles are organic polymer particles or inorganic particles. Previously presented
The method of manufacturing the porous graphene film according to claim 1, wherein the mixed film of graphene and particles is formed by a suction filtration process. Previously presented
The method of manufacturing the porous graphene film according to claim 1, wherein the pH value of the mixed liquid is adjusted to about 10. Previously presented
The method of manufacturing the porous graphene film according to claim 1, wherein the particles in the mixed film of graphene and particles are removed by a solution immersion process or a high temperature calcination process. Previously presented
The method of manufacturing the porous graphene film according to claim 1, wherein after adjusting the pH value of the mixed liquid, ultrasonic treatment is carried out to make the mixed liquid uniform. Previously presented
. Canceled
15-16.. Canceled
Canceled
. Canceled
Embodiments described in the patent, grouped by the materials and process steps they use.
4 materials1 process step
Method of manufacturing a porous graphene film using reduced graphene oxide (RGO) and polystyrene (PS) microspheres (~1.5 micron diameter). Dispersion liquids of RGO (0.1–1 g/L) and PS microspheres (0.1–1 g/L) are prepared in distilled water, mixed, pH adjusted to alkaline (9–11) with NH₃-H₂O, followed by ultrasonic treatment, suction filtration film-forming, and removal of PS particles by dissolution in tetrahydrofuran or toluene or by high-temperature calcination to leave a porous graphene film.
Layer stacks claimed or described, ordered top of device to substrate.
electronic product with porous graphene conductive layer
Materials described outside the worked examples.
graphene
particles (generic, 0.3–3.0 microns)
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Thickness | 0.3–3 µm | — |
Duration | 10–15 minutes |
Patent
Atlas literature
Patent
US 11,512,000Patent drawings and their descriptions. Click a drawing to enlarge it.
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method of manufacturing a porous graphene film, comprising: mixing a dispersion liquid of graphene with a dispersion liquid of particles to form a mixed liquid; adjusting pH value of the mixed liquid by adding NH 3 -H 2 O to about 9 to about 11; performing a film-forming process to form a mixed film of graphene and particles; and removing the particles in the mixed film of graphene and particles to form the porous graphene film. Previously presented
The method of manufacturing the porous graphene film according to claim 1, wherein the graphene is a reduced graphene oxide. Original
The method of manufacturing the porous graphene film according to claim 1, wherein the particles have a particle size of from about 0.3 micron to about 3.0 microns. Previously presented
The method of manufacturing the porous graphene film according to claim 1, wherein the particles are organic polymer particles or inorganic particles. Previously presented
The method of manufacturing the porous graphene film according to claim 1, wherein the mixed film of graphene and particles is formed by a suction filtration process. Previously presented
The method of manufacturing the porous graphene film according to claim 1, wherein the pH value of the mixed liquid is adjusted to about 10. Previously presented
The method of manufacturing the porous graphene film according to claim 1, wherein the particles in the mixed film of graphene and particles are removed by a solution immersion process or a high temperature calcination process. Previously presented
The method of manufacturing the porous graphene film according to claim 1, wherein after adjusting the pH value of the mixed liquid, ultrasonic treatment is carried out to make the mixed liquid uniform. Previously presented
. Canceled
15-16.. Canceled
Canceled
. Canceled
Embodiments described in the patent, grouped by the materials and process steps they use.
4 materials1 process step
Method of manufacturing a porous graphene film using reduced graphene oxide (RGO) and polystyrene (PS) microspheres (~1.5 micron diameter). Dispersion liquids of RGO (0.1–1 g/L) and PS microspheres (0.1–1 g/L) are prepared in distilled water, mixed, pH adjusted to alkaline (9–11) with NH₃-H₂O, followed by ultrasonic treatment, suction filtration film-forming, and removal of PS particles by dissolution in tetrahydrofuran or toluene or by high-temperature calcination to leave a porous graphene film.
Layer stacks claimed or described, ordered top of device to substrate.
electronic product with porous graphene conductive layer
Materials described outside the worked examples.
graphene
particles (generic, 0.3–3.0 microns)
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Thickness | 0.3–3 µm | — |
Duration | 10–15 minutes |
NH₃-H₂O
NH3·H₂O
graphene oxide
organic polymer particles
inorganic particles
polypyrrole particles
polyaniline particles
silica particles
SiO₂
titanium dioxide particles
TiO₂
manganese dioxide particles
MnO₂
styrene
C₈H₈
azobisisobutyronitrile
C₈H₁₂N₄
dichloromethane
CH₂Cl₂
porous graphene film
| — |
Duration | 20–25 minutes | — |
Temperature | 98–100 °C | — |
NH₃-H₂O
NH3·H₂O
graphene oxide
organic polymer particles
inorganic particles
polypyrrole particles
polyaniline particles
silica particles
SiO₂
titanium dioxide particles
TiO₂
manganese dioxide particles
MnO₂
styrene
C₈H₈
azobisisobutyronitrile
C₈H₁₂N₄
dichloromethane
CH₂Cl₂
porous graphene film
| — |
Duration | 20–25 minutes | — |
Temperature | 98–100 °C | — |
NH₃-H₂O
NH3·H₂O
graphene oxide
organic polymer particles
inorganic particles
polypyrrole particles
polyaniline particles
silica particles
SiO₂
titanium dioxide particles
TiO₂
manganese dioxide particles
MnO₂
styrene
C₈H₈
azobisisobutyronitrile
C₈H₁₂N₄
dichloromethane
CH₂Cl₂
porous graphene film
| — |
Duration | 20–25 minutes | — |
Temperature | 98–100 °C | — |
NH₃-H₂O
NH3·H₂O
graphene oxide
organic polymer particles
inorganic particles
polypyrrole particles
polyaniline particles
silica particles
SiO₂
titanium dioxide particles
TiO₂
manganese dioxide particles
MnO₂
styrene
C₈H₈
azobisisobutyronitrile
C₈H₁₂N₄
dichloromethane
CH₂Cl₂
porous graphene film
| — |
Duration | 20–25 minutes | — |
Temperature | 98–100 °C | — |