Research paper
Experimental CharacterizationComputational Multiscale| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Fet Mobility | mobility | 24000000cm²/Vs | — | |||
| Fet Mobility | mobility | 20000000cm²/Vs | — | |||
| Fet Carrier Concentration | transport density | 292000000000cm⁻² | — | |||
| Fet Carrier Concentration | transport density | 320000000000cm⁻² | — | |||
| Fet Carrier Concentration | PL-derived density | 320000000000cm⁻² | — | |||
| Fet Carrier Concentration | PL-derived density | 420000000000cm⁻² | — | |||
| Raman Peak Fwhm | CDE linewidth | < 80µeV | — | |||
| Raman Peak Fwhm | CDE linewidth | 170µeV | — | |||
| Raman Peak Fwhm | SW resonance profile FWHM | < 80µeV | — | |||
| Raman Peak Fwhm | SW resonance profile FWHM | > 110µeV | — | |||
| Property | intersubband spacing E01 | 18.7meV | — | |||
| Property | Fermi energy EF | 16meV | — | |||
| Property | intersubband spacing E01 | 18.7meV | — | |||
| Property | Fermi energy EF | 16meV | — |
Surface Passivation of III-V GaAs Nanopillars by Low Frequency Plasma Deposition of Silicon Nitride for Active Nanophotonic Devices
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Fet Mobility | mobility | 24000000cm²/Vs | — | |||
| Fet Mobility | mobility | 20000000cm²/Vs | — | |||
| Fet Carrier Concentration | transport density | 292000000000cm⁻² | — | |||
| Fet Carrier Concentration | transport density | 320000000000cm⁻² | — | |||
| Fet Carrier Concentration | PL-derived density | 320000000000cm⁻² | — | |||
| Fet Carrier Concentration | PL-derived density | 420000000000cm⁻² | — | |||
| Raman Peak Fwhm | CDE linewidth | < 80µeV | — | |||
| Raman Peak Fwhm | CDE linewidth | 170µeV | — | |||
| Raman Peak Fwhm | SW resonance profile FWHM | < 80µeV | — | |||
| Raman Peak Fwhm | SW resonance profile FWHM | > 110µeV | — | |||
| Property | intersubband spacing E01 | 18.7meV | — | |||
| Property | Fermi energy EF | 16meV | — | |||
| Property | intersubband spacing E01 | 18.7meV | — | |||
| Property | Fermi energy EF | 16meV | — |
Surface Passivation of III-V GaAs Nanopillars by Low Frequency Plasma Deposition of Silicon Nitride for Active Nanophotonic Devices
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Fet Mobility | mobility | 24000000cm²/Vs | — | |||
| Fet Mobility | mobility | 20000000cm²/Vs | — | |||
| Fet Carrier Concentration | transport density | 292000000000cm⁻² | — | |||
| Fet Carrier Concentration | transport density | 320000000000cm⁻² | — | |||
| Fet Carrier Concentration | PL-derived density | 320000000000cm⁻² | — | |||
| Fet Carrier Concentration | PL-derived density | 420000000000cm⁻² | — | |||
| Raman Peak Fwhm | CDE linewidth | < 80µeV | — | |||
| Raman Peak Fwhm | CDE linewidth | 170µeV | — | |||
| Raman Peak Fwhm | SW resonance profile FWHM | < 80µeV | — | |||
| Raman Peak Fwhm | SW resonance profile FWHM | > 110µeV | — | |||
| Property | intersubband spacing E01 | 18.7meV | — | |||
| Property | Fermi energy EF | 16meV | — | |||
| Property | intersubband spacing E01 | 18.7meV | — | |||
| Property | Fermi energy EF | 16meV | — |
Surface Passivation of III-V GaAs Nanopillars by Low Frequency Plasma Deposition of Silicon Nitride for Active Nanophotonic Devices
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Fet Mobility | mobility | 24000000cm²/Vs | — | |||
| Fet Mobility | mobility | 20000000cm²/Vs | — | |||
| Fet Carrier Concentration | transport density | 292000000000cm⁻² | — | |||
| Fet Carrier Concentration | transport density | 320000000000cm⁻² | — | |||
| Fet Carrier Concentration | PL-derived density | 320000000000cm⁻² | — | |||
| Fet Carrier Concentration | PL-derived density | 420000000000cm⁻² | — | |||
| Raman Peak Fwhm | CDE linewidth | < 80µeV | — | |||
| Raman Peak Fwhm | CDE linewidth | 170µeV | — | |||
| Raman Peak Fwhm | SW resonance profile FWHM | < 80µeV | — | |||
| Raman Peak Fwhm | SW resonance profile FWHM | > 110µeV | — | |||
| Property | intersubband spacing E01 | 18.7meV | — | |||
| Property | Fermi energy EF | 16meV | — | |||
| Property | intersubband spacing E01 | 18.7meV | — | |||
| Property | Fermi energy EF | 16meV | — |
Surface Passivation of III-V GaAs Nanopillars by Low Frequency Plasma Deposition of Silicon Nitride for Active Nanophotonic Devices