Abstract

The characterization of the electronic structure and chemical states of gases, solids, and liquids can be effectively performed using ambient pressure X-ray photoelectron spectroscopy (AP-XPS). However, the acquisition of electronic and chemical information under plasma conditions poses significant challenges. In this study, we have developed an advanced experimental system capable of garnering electronic information amidst plasma environments, alongside providing detailed surface chemical states of samples subjected to plasma conditions. By designing a customized plasma generation apparatus, we successfully integrated it with a traditional AP-XPS system. This novel plasma-AP-XPS system confined plasma proximal to the sample area, with adjustable intensity parameters controlled by either modifying the distance between the plasma source and the sample surface or adjusting the voltage applied. This configuration permitted the direct detection of electrons in the plasma via the XPS electron detector. To substantiate the efficacy and versatility of this setup, it was applied to two distinct studies: the plasma etching of graphene and plasma oxidation of platinum (Pt). The investigations confirmed that argon (Ar) plasma facilitates the etching of graphene, a phenomenon clearly evidenced by the XPS spectra. Similarly, the exposure of the Pt surface to oxygen plasma was found to induce effective oxidation. This developed system significantly extends the utility of AP-XPS, enhancing its application for in-depth studies of plasma-enhanced reactions under operando conditions, thereby holding promise for the advancement in material science and chemical engineering fields.

Abstract

The characterization of the electronic structure and chemical states of gases, solids, and liquids can be effectively performed using ambient pressure X-ray photoelectron spectroscopy (AP-XPS). However, the acquisition of electronic and chemical information under plasma conditions poses significant challenges. In this study, we have developed an advanced experimental system capable of garnering electronic information amidst plasma environments, alongside providing detailed surface chemical states of samples subjected to plasma conditions. By designing a customized plasma generation apparatus, we successfully integrated it with a traditional AP-XPS system. This novel plasma-AP-XPS system confined plasma proximal to the sample area, with adjustable intensity parameters controlled by either modifying the distance between the plasma source and the sample surface or adjusting the voltage applied. This configuration permitted the direct detection of electrons in the plasma via the XPS electron detector. To substantiate the efficacy and versatility of this setup, it was applied to two distinct studies: the plasma etching of graphene and plasma oxidation of platinum (Pt). The investigations confirmed that argon (Ar) plasma facilitates the etching of graphene, a phenomenon clearly evidenced by the XPS spectra. Similarly, the exposure of the Pt surface to oxygen plasma was found to induce effective oxidation. This developed system significantly extends the utility of AP-XPS, enhancing its application for in-depth studies of plasma-enhanced reactions under operando conditions, thereby holding promise for the advancement in material science and chemical engineering fields.

Abstract

The characterization of the electronic structure and chemical states of gases, solids, and liquids can be effectively performed using ambient pressure X-ray photoelectron spectroscopy (AP-XPS). However, the acquisition of electronic and chemical information under plasma conditions poses significant challenges. In this study, we have developed an advanced experimental system capable of garnering electronic information amidst plasma environments, alongside providing detailed surface chemical states of samples subjected to plasma conditions. By designing a customized plasma generation apparatus, we successfully integrated it with a traditional AP-XPS system. This novel plasma-AP-XPS system confined plasma proximal to the sample area, with adjustable intensity parameters controlled by either modifying the distance between the plasma source and the sample surface or adjusting the voltage applied. This configuration permitted the direct detection of electrons in the plasma via the XPS electron detector. To substantiate the efficacy and versatility of this setup, it was applied to two distinct studies: the plasma etching of graphene and plasma oxidation of platinum (Pt). The investigations confirmed that argon (Ar) plasma facilitates the etching of graphene, a phenomenon clearly evidenced by the XPS spectra. Similarly, the exposure of the Pt surface to oxygen plasma was found to induce effective oxidation. This developed system significantly extends the utility of AP-XPS, enhancing its application for in-depth studies of plasma-enhanced reactions under operando conditions, thereby holding promise for the advancement in material science and chemical engineering fields.

Abstract

The characterization of the electronic structure and chemical states of gases, solids, and liquids can be effectively performed using ambient pressure X-ray photoelectron spectroscopy (AP-XPS). However, the acquisition of electronic and chemical information under plasma conditions poses significant challenges. In this study, we have developed an advanced experimental system capable of garnering electronic information amidst plasma environments, alongside providing detailed surface chemical states of samples subjected to plasma conditions. By designing a customized plasma generation apparatus, we successfully integrated it with a traditional AP-XPS system. This novel plasma-AP-XPS system confined plasma proximal to the sample area, with adjustable intensity parameters controlled by either modifying the distance between the plasma source and the sample surface or adjusting the voltage applied. This configuration permitted the direct detection of electrons in the plasma via the XPS electron detector. To substantiate the efficacy and versatility of this setup, it was applied to two distinct studies: the plasma etching of graphene and plasma oxidation of platinum (Pt). The investigations confirmed that argon (Ar) plasma facilitates the etching of graphene, a phenomenon clearly evidenced by the XPS spectra. Similarly, the exposure of the Pt surface to oxygen plasma was found to induce effective oxidation. This developed system significantly extends the utility of AP-XPS, enhancing its application for in-depth studies of plasma-enhanced reactions under operando conditions, thereby holding promise for the advancement in material science and chemical engineering fields.