Abstract

In this study, we demonstrate an improved version of the roll-to-roll mechanical exfoliation method, incorporating a controlled sliding motion into the exfoliation process to achieve uniform nanosheet films of two-dimensional materials at wafer-scale. This scalable technique enables the fabrication of high-quality films suitable for electronic and optoelectronic applications. We validate the process by fabricating WSe₂ phototransistors directly on the exfoliated films, achieving performance metrics comparable to the best reported devices based on electrochemically exfoliated material. The all-dry transfer method employed ensures minimal contamination and preserves the intrinsic properties of the material. This work highlights the potential of high-throughput mechanical exfoliation as a cost-effective and reliable route for large-scale production of 2D material-based devices.

Abstract

In this study, we demonstrate an improved version of the roll-to-roll mechanical exfoliation method, incorporating a controlled sliding motion into the exfoliation process to achieve uniform nanosheet films of two-dimensional materials at wafer-scale. This scalable technique enables the fabrication of high-quality films suitable for electronic and optoelectronic applications. We validate the process by fabricating WSe₂ phototransistors directly on the exfoliated films, achieving performance metrics comparable to the best reported devices based on electrochemically exfoliated material. The all-dry transfer method employed ensures minimal contamination and preserves the intrinsic properties of the material. This work highlights the potential of high-throughput mechanical exfoliation as a cost-effective and reliable route for large-scale production of 2D material-based devices.

Abstract

In this study, we demonstrate an improved version of the roll-to-roll mechanical exfoliation method, incorporating a controlled sliding motion into the exfoliation process to achieve uniform nanosheet films of two-dimensional materials at wafer-scale. This scalable technique enables the fabrication of high-quality films suitable for electronic and optoelectronic applications. We validate the process by fabricating WSe₂ phototransistors directly on the exfoliated films, achieving performance metrics comparable to the best reported devices based on electrochemically exfoliated material. The all-dry transfer method employed ensures minimal contamination and preserves the intrinsic properties of the material. This work highlights the potential of high-throughput mechanical exfoliation as a cost-effective and reliable route for large-scale production of 2D material-based devices.

Abstract

In this study, we demonstrate an improved version of the roll-to-roll mechanical exfoliation method, incorporating a controlled sliding motion into the exfoliation process to achieve uniform nanosheet films of two-dimensional materials at wafer-scale. This scalable technique enables the fabrication of high-quality films suitable for electronic and optoelectronic applications. We validate the process by fabricating WSe₂ phototransistors directly on the exfoliated films, achieving performance metrics comparable to the best reported devices based on electrochemically exfoliated material. The all-dry transfer method employed ensures minimal contamination and preserves the intrinsic properties of the material. This work highlights the potential of high-throughput mechanical exfoliation as a cost-effective and reliable route for large-scale production of 2D material-based devices.