Patent
US 10,875,339High Resolution Graphene Films for Electrochemical Sensing via Inkjet Maskless Lithography
Jonathan Claussen
US
Copyright © 2026 Matter42. All rights reserved.
Patent drawings and their descriptions. Click a drawing to enlarge it.
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
: A method of manufacturing high resolution patterns on a substrate from a solution comprising: a. creating a sacrificial layer comprising a negative of a pattern on the substrate, wherein the sacrificial layer is created by direct printing and adhering of the negative of the pattern on the substrate; b. depositing or coating a solution including nano-material-based particles over the printed and adhered negative of the pattern formed by the sacrificial layer and at least the substrate at and around the printed and adhered negative pattern; c. stabilizing, drying, and/or reducing the deposited or coated solution on the substrate; and d. removing the sacrificial layer and dried solution over the sacrificial layer to leave a positive of the printed and adhered negative pattern comprising stabilized, dried, and/or reduced solution in the form of a positive pattern adhered to the substrate with resolution on the order of the resolution of the negative pattern. Currently amended
: The method of claim 1 wherein the direct printing and adhering of the sacrificial layer is created by jet printing of jet printable ink which: a. comprises a polymer that falls within viscosity, surface tension, specific gravity, and density values, and/or Reynolds number, Weber number, and z-values of jet printable inks; and b. adheres to the substrate. Previously presented
: The method of claim 1 wherein the substrate comprises a sheet or plate with at least a substantially planar surface having a selectable width and length from micro- scale to meter-scale or more wherein the substrate comprises one of: a. rigid; b. flexible; c. thermally sensitive; d. semi-rigid; e. semi-flexible; f. silicon; g. heat rated polyethylene terephthalate (PET); h. clear PET; i. polyamide tape; er and j. nanocellulose. Currently amended
: The method of claim 1 wherein the deposition or coating of the solution comprises: a. one layer of height; or b. plural layers of height; and wherein the deposition or coating comprises: ea i. spin coating; dbii. dip coating; eei ii. drop casting; or f div. spray coating. Currently amended
: The method of claim 1 wherein the solution comprises particles capable of electrical conductivity. Previously presented
: The method of claim 1 wherein the solution comprises: a. carbon-based content along with a surfactant binder and solvents; and b. a viscous/dense solution-phase with higher concentration of graphene-based content than inkjet printable inks. Previously presented
: The method of claim 1 wherein after depositing or coating the solution over the negative pattern: a. annealing the negative pattern and the deposited solution for at least one of: i. increasing adhesion of the solution to the substrate; ii. removing surfactants, solvents, or nonconductive binders; and iii. tuning electroactive parameters. Previously presented
: The method of claim 1 wherein the removing comprises: a. exposing the sacrificial layer to a solvent; b. lifting off the dried solution layer over the sacrificial layer; and c. leaving the dried solution layer positive pattern on the substrate. Currently amended
: The method of claim 1 wherein the positive pattern is used with or for: a. one or more electrochemical sensors; b. one or more energy harvesters; c. one or more batteries; d. one or more capacitor/supercapacitors; e. one or more triboelectric nanogenerators; f. one or more strain sensors; or g. one or more chemical/biological sensors. Currently amended
-30. Canceled
Canceled
Canceled
: The method of claim X 0 further comprising: a. additional exposure to a solvent after removing and lift off to remove excess dried solution at the positive pattern on the substrate. Currently amended
: A method of manufacturing high resolution patterns on a substrate from a solution comprising: a. creating a sacrificial layer comprising a negative of a pattern on the substrate; b. depositing or coating a solution including nano-material-based particles over the negative of the pattern formed by the sacrificial layer and at least the substrate at and around the negative pattern; c. stabilizing, drying, and/or reducing the deposited or coated solution; d. removing the sacrificial layer and dried solution over the sacrificial layer to leave a positive of the negative pattern comprising stabilized, dried, and/or reduced solution in the form of a positive pattern adhered to the substrate with resolution on the order of the resolution of the negative pattern, wherein the removing comprises: (i). exposing the sacrificial layer to a solvent, and to mechanical agitation; (ii). lifting off the dried solution layer over the sacrificial layer; and (iii). leaving the dried solution layer positive pattern on the substrate wherein the solvent is an organic solvent comprising: e-11) acetone; b-(2 ethanol; e(3 cyclohexanone; or 4-f4) methanol. Currently amended
: A method of manufacturing high resolution patterns on a substrate from a solution comprising: a. creating a sacrificial la y er comprising a negative of a pattern on the substrate; b. depositing or coating a solution including nano-material-based particles over the negative of the pattern formed by the sacrificial layer and at least the substrate at and around the negative pattern; c. stabilizing, drying, and/or reducing the deposited or coated solution; d. removing the sacrificial layer and dried solution over the sacrificial layer to leave a positive of the negative pattern comprising stabilized, dried, and/or reduced solution in the form of a positive pattern adhered to the substrate with resolution on the order of the resolution of the negative pattern, wherein the removing comprises: (i). exposing the sacrificial layer to a solvent, and to mechanical agitation; (ii). lifting off the dried solution layer over the sacrificial layer; and (iii). leaving the dried solution layer positive pattern on the substrate wherein the mechanical agitation comprises one or more of: (1) sonicating in an acetone bath; and (2) direct acetone impingement. Currently amended
: The method of claim 41 further comprising: a. additional exposure to a solvent after removing and lift off to remove excess dried solution at the positive pattern on the substrate. New
: A method of manufacturing high resolution patterns on a substrate from a solution comprising: a. creating a sacrificial layer comprising a negative of a pattern on the substrate, wherein the sacrificial layer is created by jet printing and jet printable ink which: (i) comprises a polymer that falls within viscosity, surface tension, specific gravity, and density values, and/or Reynolds number, Weber number, and z-values of jet printable inks; and (ii) adheres to the substrate; b. depositing or coating a solution including nano-material-based particles over the negative of the pattern formed by the sacrificial layer and at least the substrate at and around the negative pattern; c. stabilizing, drying, and/or reducing the deposited or coated solution; and d. removing the sacrificial layer and dried solution over the sacrificial layer to leave a positive of the negative pattern comprising stabilized, dried, and/or reduced solution in the form of a positive pattern adhered to the substrate with resolution on the order of the resolution of the ne g ative pattern. Currently amended
: The method of claim 42 wherein the jet printable ink comprises: a. inkjet printable ink; or b. aerosol jet printable ink. Previously presented
: The method of claim 42 wherein the stabilizing, drying, and/or reducing of the deposited or coated solution comprises: a. annealing, or b. heating. Previously presented
: The method of claim 42 wherein the removing comprises: a. exposing the sacrificial layer to a solvent; b. lifting off the dried solution layer over the sacrificial layer; and c. leaving the d ri ed solution layer positive pattern on the substrate. Currently amended
Layer stacks claimed or described, ordered top of device to substrate.
electrochemical sensor
energy harvester
battery
capacitor/supercapacitor
triboelectric nanogenerator
strain sensor
chemical/biological sensor
H₂O₂ electrochemical sensor (graphene + Pt nanoparticles on PET)
interdigitated electrode (IDE) array for EIS
Materials described outside the worked examples.
nano-material-based particles solution
sacrificial layer/negative pattern material
jet printable ink (polymer-based)
silicon
Si
heat rated polyethylene terephthalate (PET)
polyamide tape
nanocellulose
graphene
graphene oxide
silver
Ag
MoS₂ (Molybdenum disulfide)
MoS₂
noble metals
thermoelectric materials
quantum dots
carbon nanomaterials
acetone
C₃H₆O
platinum
Pt
palladium
Pd
gold
Au
carbon nanotubes
carbon dots
bismuth telluride
Bi₂Te₃
reduced graphene oxide
ethyl cellulose
nitrocellulose
terpineol
ethanol
C₂H₅OH
cyclohexanone
C₆H₁₀O
methanol
CH₃OH
acrylic lacquer (polymer sacrificial ink)
Additional fabrication and treatment steps described in the patent.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
inkjet printable ink viscosity range | 2–20 cP | jet printable ink (polymer-based) |
inkjet printable ink surface tension range | 30–40 mN/m | jet printable ink (polymer-based) |
inkjet printable ink specific gravity range | 1–1.5 | jet printable ink (polymer-based) |
inkjet printable ink z-value range | 1–10 | jet printable ink (polymer-based) |
graphene film line width (IML) | 20 µm | graphene |
H2O2 sensor linear sensing range | 0.1–550 µM | graphene |
H2O2 sensor sensitivity | 0.21 µA/µM | graphene |
H2O2 sensor detection limit | 0.21 µM | graphene |
IDE EIS magnitude response in KCl (50 µm finger width/spacing) | 21000 Ω | graphene |
Related documents with shared materials, methods, properties, or citations.
A Method of forming a Graphene Oxide-Reduced Graphene Oxide Junction
Graphene-Based Indicator
Capacitive-Based Graphene Sensor
GRAPHENE GAS SENSOR FOR MEASURING THE CONCENTRATION OF CARBON DIOXIDE IN GAS ENVIRONMENTS
GRAPHENE NANOELECTRONIC HETERODYNE SENSOR FOR RAPID AND SENSITIVE VAPOR DETECTION
Patent drawings and their descriptions. Click a drawing to enlarge it.
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
: A method of manufacturing high resolution patterns on a substrate from a solution comprising: a. creating a sacrificial layer comprising a negative of a pattern on the substrate, wherein the sacrificial layer is created by direct printing and adhering of the negative of the pattern on the substrate; b. depositing or coating a solution including nano-material-based particles over the printed and adhered negative of the pattern formed by the sacrificial layer and at least the substrate at and around the printed and adhered negative pattern; c. stabilizing, drying, and/or reducing the deposited or coated solution on the substrate; and d. removing the sacrificial layer and dried solution over the sacrificial layer to leave a positive of the printed and adhered negative pattern comprising stabilized, dried, and/or reduced solution in the form of a positive pattern adhered to the substrate with resolution on the order of the resolution of the negative pattern. Currently amended
: The method of claim 1 wherein the direct printing and adhering of the sacrificial layer is created by jet printing of jet printable ink which: a. comprises a polymer that falls within viscosity, surface tension, specific gravity, and density values, and/or Reynolds number, Weber number, and z-values of jet printable inks; and b. adheres to the substrate. Previously presented
: The method of claim 1 wherein the substrate comprises a sheet or plate with at least a substantially planar surface having a selectable width and length from micro- scale to meter-scale or more wherein the substrate comprises one of: a. rigid; b. flexible; c. thermally sensitive; d. semi-rigid; e. semi-flexible; f. silicon; g. heat rated polyethylene terephthalate (PET); h. clear PET; i. polyamide tape; er and j. nanocellulose. Currently amended
: The method of claim 1 wherein the deposition or coating of the solution comprises: a. one layer of height; or b. plural layers of height; and wherein the deposition or coating comprises: ea i. spin coating; dbii. dip coating; eei ii. drop casting; or f div. spray coating. Currently amended
: The method of claim 1 wherein the solution comprises particles capable of electrical conductivity. Previously presented
: The method of claim 1 wherein the solution comprises: a. carbon-based content along with a surfactant binder and solvents; and b. a viscous/dense solution-phase with higher concentration of graphene-based content than inkjet printable inks. Previously presented
: The method of claim 1 wherein after depositing or coating the solution over the negative pattern: a. annealing the negative pattern and the deposited solution for at least one of: i. increasing adhesion of the solution to the substrate; ii. removing surfactants, solvents, or nonconductive binders; and iii. tuning electroactive parameters. Previously presented
: The method of claim 1 wherein the removing comprises: a. exposing the sacrificial layer to a solvent; b. lifting off the dried solution layer over the sacrificial layer; and c. leaving the dried solution layer positive pattern on the substrate. Currently amended
: The method of claim 1 wherein the positive pattern is used with or for: a. one or more electrochemical sensors; b. one or more energy harvesters; c. one or more batteries; d. one or more capacitor/supercapacitors; e. one or more triboelectric nanogenerators; f. one or more strain sensors; or g. one or more chemical/biological sensors. Currently amended
-30. Canceled
Canceled
Canceled
: The method of claim X 0 further comprising: a. additional exposure to a solvent after removing and lift off to remove excess dried solution at the positive pattern on the substrate. Currently amended
: A method of manufacturing high resolution patterns on a substrate from a solution comprising: a. creating a sacrificial layer comprising a negative of a pattern on the substrate; b. depositing or coating a solution including nano-material-based particles over the negative of the pattern formed by the sacrificial layer and at least the substrate at and around the negative pattern; c. stabilizing, drying, and/or reducing the deposited or coated solution; d. removing the sacrificial layer and dried solution over the sacrificial layer to leave a positive of the negative pattern comprising stabilized, dried, and/or reduced solution in the form of a positive pattern adhered to the substrate with resolution on the order of the resolution of the negative pattern, wherein the removing comprises: (i). exposing the sacrificial layer to a solvent, and to mechanical agitation; (ii). lifting off the dried solution layer over the sacrificial layer; and (iii). leaving the dried solution layer positive pattern on the substrate wherein the solvent is an organic solvent comprising: e-11) acetone; b-(2 ethanol; e(3 cyclohexanone; or 4-f4) methanol. Currently amended
: A method of manufacturing high resolution patterns on a substrate from a solution comprising: a. creating a sacrificial la y er comprising a negative of a pattern on the substrate; b. depositing or coating a solution including nano-material-based particles over the negative of the pattern formed by the sacrificial layer and at least the substrate at and around the negative pattern; c. stabilizing, drying, and/or reducing the deposited or coated solution; d. removing the sacrificial layer and dried solution over the sacrificial layer to leave a positive of the negative pattern comprising stabilized, dried, and/or reduced solution in the form of a positive pattern adhered to the substrate with resolution on the order of the resolution of the negative pattern, wherein the removing comprises: (i). exposing the sacrificial layer to a solvent, and to mechanical agitation; (ii). lifting off the dried solution layer over the sacrificial layer; and (iii). leaving the dried solution layer positive pattern on the substrate wherein the mechanical agitation comprises one or more of: (1) sonicating in an acetone bath; and (2) direct acetone impingement. Currently amended
: The method of claim 41 further comprising: a. additional exposure to a solvent after removing and lift off to remove excess dried solution at the positive pattern on the substrate. New
: A method of manufacturing high resolution patterns on a substrate from a solution comprising: a. creating a sacrificial layer comprising a negative of a pattern on the substrate, wherein the sacrificial layer is created by jet printing and jet printable ink which: (i) comprises a polymer that falls within viscosity, surface tension, specific gravity, and density values, and/or Reynolds number, Weber number, and z-values of jet printable inks; and (ii) adheres to the substrate; b. depositing or coating a solution including nano-material-based particles over the negative of the pattern formed by the sacrificial layer and at least the substrate at and around the negative pattern; c. stabilizing, drying, and/or reducing the deposited or coated solution; and d. removing the sacrificial layer and dried solution over the sacrificial layer to leave a positive of the negative pattern comprising stabilized, dried, and/or reduced solution in the form of a positive pattern adhered to the substrate with resolution on the order of the resolution of the ne g ative pattern. Currently amended
: The method of claim 42 wherein the jet printable ink comprises: a. inkjet printable ink; or b. aerosol jet printable ink. Previously presented
: The method of claim 42 wherein the stabilizing, drying, and/or reducing of the deposited or coated solution comprises: a. annealing, or b. heating. Previously presented
: The method of claim 42 wherein the removing comprises: a. exposing the sacrificial layer to a solvent; b. lifting off the dried solution layer over the sacrificial layer; and c. leaving the d ri ed solution layer positive pattern on the substrate. Currently amended
Layer stacks claimed or described, ordered top of device to substrate.
electrochemical sensor
energy harvester
battery
capacitor/supercapacitor
triboelectric nanogenerator
strain sensor
chemical/biological sensor
H₂O₂ electrochemical sensor (graphene + Pt nanoparticles on PET)
interdigitated electrode (IDE) array for EIS
Materials described outside the worked examples.
nano-material-based particles solution
sacrificial layer/negative pattern material
jet printable ink (polymer-based)
silicon
Si
heat rated polyethylene terephthalate (PET)
polyamide tape
nanocellulose
graphene
graphene oxide
silver
Ag
MoS₂ (Molybdenum disulfide)
MoS₂
noble metals
thermoelectric materials
quantum dots
carbon nanomaterials
acetone
C₃H₆O
platinum
Pt
palladium
Pd
gold
Au
carbon nanotubes
carbon dots
bismuth telluride
Bi₂Te₃
reduced graphene oxide
ethyl cellulose
nitrocellulose
terpineol
ethanol
C₂H₅OH
cyclohexanone
C₆H₁₀O
methanol
CH₃OH
acrylic lacquer (polymer sacrificial ink)
Additional fabrication and treatment steps described in the patent.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
inkjet printable ink viscosity range | 2–20 cP | jet printable ink (polymer-based) |
inkjet printable ink surface tension range | 30–40 mN/m | jet printable ink (polymer-based) |
inkjet printable ink specific gravity range | 1–1.5 | jet printable ink (polymer-based) |
inkjet printable ink z-value range | 1–10 | jet printable ink (polymer-based) |
graphene film line width (IML) | 20 µm | graphene |
H2O2 sensor linear sensing range | 0.1–550 µM | graphene |
H2O2 sensor sensitivity | 0.21 µA/µM | graphene |
H2O2 sensor detection limit | 0.21 µM | graphene |
IDE EIS magnitude response in KCl (50 µm finger width/spacing) | 21000 Ω | graphene |
Related documents with shared materials, methods, properties, or citations.
A Method of forming a Graphene Oxide-Reduced Graphene Oxide Junction
Graphene-Based Indicator
Capacitive-Based Graphene Sensor
GRAPHENE GAS SENSOR FOR MEASURING THE CONCENTRATION OF CARBON DIOXIDE IN GAS ENVIRONMENTS
GRAPHENE NANOELECTRONIC HETERODYNE SENSOR FOR RAPID AND SENSITIVE VAPOR DETECTION
Patent drawings and their descriptions. Click a drawing to enlarge it.
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
: A method of manufacturing high resolution patterns on a substrate from a solution comprising: a. creating a sacrificial layer comprising a negative of a pattern on the substrate, wherein the sacrificial layer is created by direct printing and adhering of the negative of the pattern on the substrate; b. depositing or coating a solution including nano-material-based particles over the printed and adhered negative of the pattern formed by the sacrificial layer and at least the substrate at and around the printed and adhered negative pattern; c. stabilizing, drying, and/or reducing the deposited or coated solution on the substrate; and d. removing the sacrificial layer and dried solution over the sacrificial layer to leave a positive of the printed and adhered negative pattern comprising stabilized, dried, and/or reduced solution in the form of a positive pattern adhered to the substrate with resolution on the order of the resolution of the negative pattern. Currently amended
: The method of claim 1 wherein the direct printing and adhering of the sacrificial layer is created by jet printing of jet printable ink which: a. comprises a polymer that falls within viscosity, surface tension, specific gravity, and density values, and/or Reynolds number, Weber number, and z-values of jet printable inks; and b. adheres to the substrate. Previously presented
: The method of claim 1 wherein the substrate comprises a sheet or plate with at least a substantially planar surface having a selectable width and length from micro- scale to meter-scale or more wherein the substrate comprises one of: a. rigid; b. flexible; c. thermally sensitive; d. semi-rigid; e. semi-flexible; f. silicon; g. heat rated polyethylene terephthalate (PET); h. clear PET; i. polyamide tape; er and j. nanocellulose. Currently amended
: The method of claim 1 wherein the deposition or coating of the solution comprises: a. one layer of height; or b. plural layers of height; and wherein the deposition or coating comprises: ea i. spin coating; dbii. dip coating; eei ii. drop casting; or f div. spray coating. Currently amended
: The method of claim 1 wherein the solution comprises particles capable of electrical conductivity. Previously presented
: The method of claim 1 wherein the solution comprises: a. carbon-based content along with a surfactant binder and solvents; and b. a viscous/dense solution-phase with higher concentration of graphene-based content than inkjet printable inks. Previously presented
: The method of claim 1 wherein after depositing or coating the solution over the negative pattern: a. annealing the negative pattern and the deposited solution for at least one of: i. increasing adhesion of the solution to the substrate; ii. removing surfactants, solvents, or nonconductive binders; and iii. tuning electroactive parameters. Previously presented
: The method of claim 1 wherein the removing comprises: a. exposing the sacrificial layer to a solvent; b. lifting off the dried solution layer over the sacrificial layer; and c. leaving the dried solution layer positive pattern on the substrate. Currently amended
: The method of claim 1 wherein the positive pattern is used with or for: a. one or more electrochemical sensors; b. one or more energy harvesters; c. one or more batteries; d. one or more capacitor/supercapacitors; e. one or more triboelectric nanogenerators; f. one or more strain sensors; or g. one or more chemical/biological sensors. Currently amended
-30. Canceled
Canceled
Canceled
: The method of claim X 0 further comprising: a. additional exposure to a solvent after removing and lift off to remove excess dried solution at the positive pattern on the substrate. Currently amended
: A method of manufacturing high resolution patterns on a substrate from a solution comprising: a. creating a sacrificial layer comprising a negative of a pattern on the substrate; b. depositing or coating a solution including nano-material-based particles over the negative of the pattern formed by the sacrificial layer and at least the substrate at and around the negative pattern; c. stabilizing, drying, and/or reducing the deposited or coated solution; d. removing the sacrificial layer and dried solution over the sacrificial layer to leave a positive of the negative pattern comprising stabilized, dried, and/or reduced solution in the form of a positive pattern adhered to the substrate with resolution on the order of the resolution of the negative pattern, wherein the removing comprises: (i). exposing the sacrificial layer to a solvent, and to mechanical agitation; (ii). lifting off the dried solution layer over the sacrificial layer; and (iii). leaving the dried solution layer positive pattern on the substrate wherein the solvent is an organic solvent comprising: e-11) acetone; b-(2 ethanol; e(3 cyclohexanone; or 4-f4) methanol. Currently amended
: A method of manufacturing high resolution patterns on a substrate from a solution comprising: a. creating a sacrificial la y er comprising a negative of a pattern on the substrate; b. depositing or coating a solution including nano-material-based particles over the negative of the pattern formed by the sacrificial layer and at least the substrate at and around the negative pattern; c. stabilizing, drying, and/or reducing the deposited or coated solution; d. removing the sacrificial layer and dried solution over the sacrificial layer to leave a positive of the negative pattern comprising stabilized, dried, and/or reduced solution in the form of a positive pattern adhered to the substrate with resolution on the order of the resolution of the negative pattern, wherein the removing comprises: (i). exposing the sacrificial layer to a solvent, and to mechanical agitation; (ii). lifting off the dried solution layer over the sacrificial layer; and (iii). leaving the dried solution layer positive pattern on the substrate wherein the mechanical agitation comprises one or more of: (1) sonicating in an acetone bath; and (2) direct acetone impingement. Currently amended
: The method of claim 41 further comprising: a. additional exposure to a solvent after removing and lift off to remove excess dried solution at the positive pattern on the substrate. New
: A method of manufacturing high resolution patterns on a substrate from a solution comprising: a. creating a sacrificial layer comprising a negative of a pattern on the substrate, wherein the sacrificial layer is created by jet printing and jet printable ink which: (i) comprises a polymer that falls within viscosity, surface tension, specific gravity, and density values, and/or Reynolds number, Weber number, and z-values of jet printable inks; and (ii) adheres to the substrate; b. depositing or coating a solution including nano-material-based particles over the negative of the pattern formed by the sacrificial layer and at least the substrate at and around the negative pattern; c. stabilizing, drying, and/or reducing the deposited or coated solution; and d. removing the sacrificial layer and dried solution over the sacrificial layer to leave a positive of the negative pattern comprising stabilized, dried, and/or reduced solution in the form of a positive pattern adhered to the substrate with resolution on the order of the resolution of the ne g ative pattern. Currently amended
: The method of claim 42 wherein the jet printable ink comprises: a. inkjet printable ink; or b. aerosol jet printable ink. Previously presented
: The method of claim 42 wherein the stabilizing, drying, and/or reducing of the deposited or coated solution comprises: a. annealing, or b. heating. Previously presented
: The method of claim 42 wherein the removing comprises: a. exposing the sacrificial layer to a solvent; b. lifting off the dried solution layer over the sacrificial layer; and c. leaving the d ri ed solution layer positive pattern on the substrate. Currently amended
Layer stacks claimed or described, ordered top of device to substrate.
electrochemical sensor
energy harvester
battery
capacitor/supercapacitor
triboelectric nanogenerator
strain sensor
chemical/biological sensor
H₂O₂ electrochemical sensor (graphene + Pt nanoparticles on PET)
interdigitated electrode (IDE) array for EIS
Materials described outside the worked examples.
nano-material-based particles solution
sacrificial layer/negative pattern material
jet printable ink (polymer-based)
silicon
Si
heat rated polyethylene terephthalate (PET)
polyamide tape
nanocellulose
graphene
graphene oxide
silver
Ag
MoS₂ (Molybdenum disulfide)
MoS₂
noble metals
thermoelectric materials
quantum dots
carbon nanomaterials
acetone
C₃H₆O
platinum
Pt
palladium
Pd
gold
Au
carbon nanotubes
carbon dots
bismuth telluride
Bi₂Te₃
reduced graphene oxide
ethyl cellulose
nitrocellulose
terpineol
ethanol
C₂H₅OH
cyclohexanone
C₆H₁₀O
methanol
CH₃OH
acrylic lacquer (polymer sacrificial ink)
Additional fabrication and treatment steps described in the patent.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
inkjet printable ink viscosity range | 2–20 cP | jet printable ink (polymer-based) |
inkjet printable ink surface tension range | 30–40 mN/m | jet printable ink (polymer-based) |
inkjet printable ink specific gravity range | 1–1.5 | jet printable ink (polymer-based) |
inkjet printable ink z-value range | 1–10 | jet printable ink (polymer-based) |
graphene film line width (IML) | 20 µm | graphene |
H2O2 sensor linear sensing range | 0.1–550 µM | graphene |
H2O2 sensor sensitivity | 0.21 µA/µM | graphene |
H2O2 sensor detection limit | 0.21 µM | graphene |
IDE EIS magnitude response in KCl (50 µm finger width/spacing) | 21000 Ω | graphene |
Related documents with shared materials, methods, properties, or citations.
A Method of forming a Graphene Oxide-Reduced Graphene Oxide Junction
Graphene-Based Indicator
Capacitive-Based Graphene Sensor
GRAPHENE GAS SENSOR FOR MEASURING THE CONCENTRATION OF CARBON DIOXIDE IN GAS ENVIRONMENTS
GRAPHENE NANOELECTRONIC HETERODYNE SENSOR FOR RAPID AND SENSITIVE VAPOR DETECTION
Patent drawings and their descriptions. Click a drawing to enlarge it.
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
: A method of manufacturing high resolution patterns on a substrate from a solution comprising: a. creating a sacrificial layer comprising a negative of a pattern on the substrate, wherein the sacrificial layer is created by direct printing and adhering of the negative of the pattern on the substrate; b. depositing or coating a solution including nano-material-based particles over the printed and adhered negative of the pattern formed by the sacrificial layer and at least the substrate at and around the printed and adhered negative pattern; c. stabilizing, drying, and/or reducing the deposited or coated solution on the substrate; and d. removing the sacrificial layer and dried solution over the sacrificial layer to leave a positive of the printed and adhered negative pattern comprising stabilized, dried, and/or reduced solution in the form of a positive pattern adhered to the substrate with resolution on the order of the resolution of the negative pattern. Currently amended
: The method of claim 1 wherein the direct printing and adhering of the sacrificial layer is created by jet printing of jet printable ink which: a. comprises a polymer that falls within viscosity, surface tension, specific gravity, and density values, and/or Reynolds number, Weber number, and z-values of jet printable inks; and b. adheres to the substrate. Previously presented
: The method of claim 1 wherein the substrate comprises a sheet or plate with at least a substantially planar surface having a selectable width and length from micro- scale to meter-scale or more wherein the substrate comprises one of: a. rigid; b. flexible; c. thermally sensitive; d. semi-rigid; e. semi-flexible; f. silicon; g. heat rated polyethylene terephthalate (PET); h. clear PET; i. polyamide tape; er and j. nanocellulose. Currently amended
: The method of claim 1 wherein the deposition or coating of the solution comprises: a. one layer of height; or b. plural layers of height; and wherein the deposition or coating comprises: ea i. spin coating; dbii. dip coating; eei ii. drop casting; or f div. spray coating. Currently amended
: The method of claim 1 wherein the solution comprises particles capable of electrical conductivity. Previously presented
: The method of claim 1 wherein the solution comprises: a. carbon-based content along with a surfactant binder and solvents; and b. a viscous/dense solution-phase with higher concentration of graphene-based content than inkjet printable inks. Previously presented
: The method of claim 1 wherein after depositing or coating the solution over the negative pattern: a. annealing the negative pattern and the deposited solution for at least one of: i. increasing adhesion of the solution to the substrate; ii. removing surfactants, solvents, or nonconductive binders; and iii. tuning electroactive parameters. Previously presented
: The method of claim 1 wherein the removing comprises: a. exposing the sacrificial layer to a solvent; b. lifting off the dried solution layer over the sacrificial layer; and c. leaving the dried solution layer positive pattern on the substrate. Currently amended
: The method of claim 1 wherein the positive pattern is used with or for: a. one or more electrochemical sensors; b. one or more energy harvesters; c. one or more batteries; d. one or more capacitor/supercapacitors; e. one or more triboelectric nanogenerators; f. one or more strain sensors; or g. one or more chemical/biological sensors. Currently amended
-30. Canceled
Canceled
Canceled
: The method of claim X 0 further comprising: a. additional exposure to a solvent after removing and lift off to remove excess dried solution at the positive pattern on the substrate. Currently amended
: A method of manufacturing high resolution patterns on a substrate from a solution comprising: a. creating a sacrificial layer comprising a negative of a pattern on the substrate; b. depositing or coating a solution including nano-material-based particles over the negative of the pattern formed by the sacrificial layer and at least the substrate at and around the negative pattern; c. stabilizing, drying, and/or reducing the deposited or coated solution; d. removing the sacrificial layer and dried solution over the sacrificial layer to leave a positive of the negative pattern comprising stabilized, dried, and/or reduced solution in the form of a positive pattern adhered to the substrate with resolution on the order of the resolution of the negative pattern, wherein the removing comprises: (i). exposing the sacrificial layer to a solvent, and to mechanical agitation; (ii). lifting off the dried solution layer over the sacrificial layer; and (iii). leaving the dried solution layer positive pattern on the substrate wherein the solvent is an organic solvent comprising: e-11) acetone; b-(2 ethanol; e(3 cyclohexanone; or 4-f4) methanol. Currently amended
: A method of manufacturing high resolution patterns on a substrate from a solution comprising: a. creating a sacrificial la y er comprising a negative of a pattern on the substrate; b. depositing or coating a solution including nano-material-based particles over the negative of the pattern formed by the sacrificial layer and at least the substrate at and around the negative pattern; c. stabilizing, drying, and/or reducing the deposited or coated solution; d. removing the sacrificial layer and dried solution over the sacrificial layer to leave a positive of the negative pattern comprising stabilized, dried, and/or reduced solution in the form of a positive pattern adhered to the substrate with resolution on the order of the resolution of the negative pattern, wherein the removing comprises: (i). exposing the sacrificial layer to a solvent, and to mechanical agitation; (ii). lifting off the dried solution layer over the sacrificial layer; and (iii). leaving the dried solution layer positive pattern on the substrate wherein the mechanical agitation comprises one or more of: (1) sonicating in an acetone bath; and (2) direct acetone impingement. Currently amended
: The method of claim 41 further comprising: a. additional exposure to a solvent after removing and lift off to remove excess dried solution at the positive pattern on the substrate. New
: A method of manufacturing high resolution patterns on a substrate from a solution comprising: a. creating a sacrificial layer comprising a negative of a pattern on the substrate, wherein the sacrificial layer is created by jet printing and jet printable ink which: (i) comprises a polymer that falls within viscosity, surface tension, specific gravity, and density values, and/or Reynolds number, Weber number, and z-values of jet printable inks; and (ii) adheres to the substrate; b. depositing or coating a solution including nano-material-based particles over the negative of the pattern formed by the sacrificial layer and at least the substrate at and around the negative pattern; c. stabilizing, drying, and/or reducing the deposited or coated solution; and d. removing the sacrificial layer and dried solution over the sacrificial layer to leave a positive of the negative pattern comprising stabilized, dried, and/or reduced solution in the form of a positive pattern adhered to the substrate with resolution on the order of the resolution of the ne g ative pattern. Currently amended
: The method of claim 42 wherein the jet printable ink comprises: a. inkjet printable ink; or b. aerosol jet printable ink. Previously presented
: The method of claim 42 wherein the stabilizing, drying, and/or reducing of the deposited or coated solution comprises: a. annealing, or b. heating. Previously presented
: The method of claim 42 wherein the removing comprises: a. exposing the sacrificial layer to a solvent; b. lifting off the dried solution layer over the sacrificial layer; and c. leaving the d ri ed solution layer positive pattern on the substrate. Currently amended
Layer stacks claimed or described, ordered top of device to substrate.
electrochemical sensor
energy harvester
battery
capacitor/supercapacitor
triboelectric nanogenerator
strain sensor
chemical/biological sensor
H₂O₂ electrochemical sensor (graphene + Pt nanoparticles on PET)
interdigitated electrode (IDE) array for EIS
Materials described outside the worked examples.
nano-material-based particles solution
sacrificial layer/negative pattern material
jet printable ink (polymer-based)
silicon
Si
heat rated polyethylene terephthalate (PET)
polyamide tape
nanocellulose
graphene
graphene oxide
silver
Ag
MoS₂ (Molybdenum disulfide)
MoS₂
noble metals
thermoelectric materials
quantum dots
carbon nanomaterials
acetone
C₃H₆O
platinum
Pt
palladium
Pd
gold
Au
carbon nanotubes
carbon dots
bismuth telluride
Bi₂Te₃
reduced graphene oxide
ethyl cellulose
nitrocellulose
terpineol
ethanol
C₂H₅OH
cyclohexanone
C₆H₁₀O
methanol
CH₃OH
acrylic lacquer (polymer sacrificial ink)
Additional fabrication and treatment steps described in the patent.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
inkjet printable ink viscosity range | 2–20 cP | jet printable ink (polymer-based) |
inkjet printable ink surface tension range | 30–40 mN/m | jet printable ink (polymer-based) |
inkjet printable ink specific gravity range | 1–1.5 | jet printable ink (polymer-based) |
inkjet printable ink z-value range | 1–10 | jet printable ink (polymer-based) |
graphene film line width (IML) | 20 µm | graphene |
H2O2 sensor linear sensing range | 0.1–550 µM | graphene |
H2O2 sensor sensitivity | 0.21 µA/µM | graphene |
H2O2 sensor detection limit | 0.21 µM | graphene |
IDE EIS magnitude response in KCl (50 µm finger width/spacing) | 21000 Ω | graphene |
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