Patent
US 10,634,962MANUFACTURING METHOD OF GRAPHENE ELECTRODE AND LIQUID CRYSTAL DISPLAY PANEL
Haijun WANG
US
Copyright © 2026 Matter42. All rights reserved.
Patent
Atlas literature
Patent
US 10,634,962Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1 is a flowchart of a manufacturing method of a graphene electrode provided by the first embodiment of the present invention. [0036]
FIG. 2(h) are process diagrams of respective steps as manufacturing the graphene electrode by the manufacturing method shown in
FIG. 3 is a flowchart of a manufacturing method of a graphene electrode provided by the second embodiment of the present invention. [0038]
FIG. 4(h) are process diagrams of respective steps as manufacturing the graphene electrode by the manufacturing method shown in
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A manufacturing method of a graphene electrode, comprising steps of: providing a metal substrate, and removing oxide on a surface of the metal substrate in a solution of acetone, ethyl lactate or ethanol for ultrasonic cleaning, and then forming a photoresist layer on the surface of the metal substrate; providing a mask, and exposing the photoresist layer with the mask; developing the photoresist layer after exposure to form the photoresist layer which is patterned on the metal substrate; forming a carbon source on the metal substrate covered with the photoresist layer which is patterned, and a portion of the carbon source covering on the photoresist layer which is patterned, and the other portion directly covering on the metal substrate not covered by the photoresist layer which is patterned, wherein the carbon source is a non-gaseous material that is formed as a film on the metal substrate covered with the photoresist layer which is patterned so as to form an intermediate substrate, in which the portion of the carbon source covering on the photoresist layer and the other portion directly covering and in direct contact with the metal substrate have a level difference therebetween and are not connected to each other; placing the intermediate substrate on which said other portion of the carbon source that covers the metal substrate is carried in a vacuum-tight chamber and filling an inactive gas, and then heating the metal substrate under protection of the inactive gas to catalyze the carbon source directly covering and in direct contact with the metal substrate by the metal substrate to form graphene, while heating is not transferred to the portion of the carbon source covering the photoresist layer by the level difference; stripping the photoresist layer which is patterned and the carbon source covering on the photoresist layer which is patterned from the metal substrate, and the graphene directly covering on the metal substrate forming the graphene which is patterned; providing a target substrate, and transferring the graphene which is patterned on the target substrate to form the graphene electrode which is patterned on the target substrate. Previously presented
The manufacturing method of the graphene electrode according to claim 1, wherein a pattern of the mask is matched with a pattern required for correspondingly manufacturing the graphene electrode; the target substrate is a flexible substrate manufactured by polyethylene terephthalate or polyimide; the metal substrate is manufactured by platinum, ruthenium, iridium, copper or nickel. Original
The manufacturing method of the graphene electrode according to claim 1, wherein the carbon source comprises at least one of: amorphous carbon, polymethylmethacrylate, polycyclic aromatic hydrocarbon, flake graphite powder, C₆₀ and graphite-like; a method of forming the carbon source on the metal substrate covered with the photoresist layer which is patterned comprises at least one of: magnetron sputtering, chemical vapor deposition, direct coating of graphite powder and coating of carbon atoms containing solution. Original
The manufacturing method of the graphene electrode according to claim 1, wherein the step of providing a target substrate, and transferring the graphene which is patterned on the target substrate to form the graphene electrode which is patterned on the target substrate comprises: providing the target substrate to adhere the target substrate on the graphene which is patterned, and heating and pressing to adhere the target substrate to the graphene which is patterned; removing the target substrate, and maintaining the graphene which is patterned to be adhered on the target substrate to form the graphene electrode which is patterned. Original
Canceled
The manufacturing method of the graphene electrode according to claim [[2]] 1, wherein the step of providing a target substrate, and transferring the graphene which is patterned on the target substrate to form the graphene electrode which is patterned on the target substrate comprises: providing the target substrate to adhere the target substrate on the graphene which is patterned, and heating and pressing to adhere the target substrate to the graphene which is patterned; removing the target substrate, and maintaining the graphene which is patterned to be adhered on the target substrate to form the graphene electrode which is patterned. Currently amended
Claims 9-20 Canceled
Canceled
Layer stacks claimed or described, ordered top of device to substrate.
patterned graphene electrode on flexible substrate
liquid crystal display panel with graphene electrode
Materials described outside the worked examples.
graphene
C
carbon source (non-gaseous film)
Additional fabrication and treatment steps described in the patent.
Related documents with shared materials, methods, properties, or citations.
Patent
Atlas literature
Patent
US 10,634,962Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1 is a flowchart of a manufacturing method of a graphene electrode provided by the first embodiment of the present invention. [0036]
FIG. 2(h) are process diagrams of respective steps as manufacturing the graphene electrode by the manufacturing method shown in
FIG. 3 is a flowchart of a manufacturing method of a graphene electrode provided by the second embodiment of the present invention. [0038]
FIG. 4(h) are process diagrams of respective steps as manufacturing the graphene electrode by the manufacturing method shown in
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A manufacturing method of a graphene electrode, comprising steps of: providing a metal substrate, and removing oxide on a surface of the metal substrate in a solution of acetone, ethyl lactate or ethanol for ultrasonic cleaning, and then forming a photoresist layer on the surface of the metal substrate; providing a mask, and exposing the photoresist layer with the mask; developing the photoresist layer after exposure to form the photoresist layer which is patterned on the metal substrate; forming a carbon source on the metal substrate covered with the photoresist layer which is patterned, and a portion of the carbon source covering on the photoresist layer which is patterned, and the other portion directly covering on the metal substrate not covered by the photoresist layer which is patterned, wherein the carbon source is a non-gaseous material that is formed as a film on the metal substrate covered with the photoresist layer which is patterned so as to form an intermediate substrate, in which the portion of the carbon source covering on the photoresist layer and the other portion directly covering and in direct contact with the metal substrate have a level difference therebetween and are not connected to each other; placing the intermediate substrate on which said other portion of the carbon source that covers the metal substrate is carried in a vacuum-tight chamber and filling an inactive gas, and then heating the metal substrate under protection of the inactive gas to catalyze the carbon source directly covering and in direct contact with the metal substrate by the metal substrate to form graphene, while heating is not transferred to the portion of the carbon source covering the photoresist layer by the level difference; stripping the photoresist layer which is patterned and the carbon source covering on the photoresist layer which is patterned from the metal substrate, and the graphene directly covering on the metal substrate forming the graphene which is patterned; providing a target substrate, and transferring the graphene which is patterned on the target substrate to form the graphene electrode which is patterned on the target substrate. Previously presented
The manufacturing method of the graphene electrode according to claim 1, wherein a pattern of the mask is matched with a pattern required for correspondingly manufacturing the graphene electrode; the target substrate is a flexible substrate manufactured by polyethylene terephthalate or polyimide; the metal substrate is manufactured by platinum, ruthenium, iridium, copper or nickel. Original
The manufacturing method of the graphene electrode according to claim 1, wherein the carbon source comprises at least one of: amorphous carbon, polymethylmethacrylate, polycyclic aromatic hydrocarbon, flake graphite powder, C₆₀ and graphite-like; a method of forming the carbon source on the metal substrate covered with the photoresist layer which is patterned comprises at least one of: magnetron sputtering, chemical vapor deposition, direct coating of graphite powder and coating of carbon atoms containing solution. Original
The manufacturing method of the graphene electrode according to claim 1, wherein the step of providing a target substrate, and transferring the graphene which is patterned on the target substrate to form the graphene electrode which is patterned on the target substrate comprises: providing the target substrate to adhere the target substrate on the graphene which is patterned, and heating and pressing to adhere the target substrate to the graphene which is patterned; removing the target substrate, and maintaining the graphene which is patterned to be adhered on the target substrate to form the graphene electrode which is patterned. Original
Canceled
The manufacturing method of the graphene electrode according to claim [[2]] 1, wherein the step of providing a target substrate, and transferring the graphene which is patterned on the target substrate to form the graphene electrode which is patterned on the target substrate comprises: providing the target substrate to adhere the target substrate on the graphene which is patterned, and heating and pressing to adhere the target substrate to the graphene which is patterned; removing the target substrate, and maintaining the graphene which is patterned to be adhered on the target substrate to form the graphene electrode which is patterned. Currently amended
Claims 9-20 Canceled
Canceled
Layer stacks claimed or described, ordered top of device to substrate.
patterned graphene electrode on flexible substrate
liquid crystal display panel with graphene electrode
Materials described outside the worked examples.
graphene
C
carbon source (non-gaseous film)
Additional fabrication and treatment steps described in the patent.
Related documents with shared materials, methods, properties, or citations.
Patent
Atlas literature
Patent
US 10,634,962Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1 is a flowchart of a manufacturing method of a graphene electrode provided by the first embodiment of the present invention. [0036]
FIG. 2(h) are process diagrams of respective steps as manufacturing the graphene electrode by the manufacturing method shown in
FIG. 3 is a flowchart of a manufacturing method of a graphene electrode provided by the second embodiment of the present invention. [0038]
FIG. 4(h) are process diagrams of respective steps as manufacturing the graphene electrode by the manufacturing method shown in
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A manufacturing method of a graphene electrode, comprising steps of: providing a metal substrate, and removing oxide on a surface of the metal substrate in a solution of acetone, ethyl lactate or ethanol for ultrasonic cleaning, and then forming a photoresist layer on the surface of the metal substrate; providing a mask, and exposing the photoresist layer with the mask; developing the photoresist layer after exposure to form the photoresist layer which is patterned on the metal substrate; forming a carbon source on the metal substrate covered with the photoresist layer which is patterned, and a portion of the carbon source covering on the photoresist layer which is patterned, and the other portion directly covering on the metal substrate not covered by the photoresist layer which is patterned, wherein the carbon source is a non-gaseous material that is formed as a film on the metal substrate covered with the photoresist layer which is patterned so as to form an intermediate substrate, in which the portion of the carbon source covering on the photoresist layer and the other portion directly covering and in direct contact with the metal substrate have a level difference therebetween and are not connected to each other; placing the intermediate substrate on which said other portion of the carbon source that covers the metal substrate is carried in a vacuum-tight chamber and filling an inactive gas, and then heating the metal substrate under protection of the inactive gas to catalyze the carbon source directly covering and in direct contact with the metal substrate by the metal substrate to form graphene, while heating is not transferred to the portion of the carbon source covering the photoresist layer by the level difference; stripping the photoresist layer which is patterned and the carbon source covering on the photoresist layer which is patterned from the metal substrate, and the graphene directly covering on the metal substrate forming the graphene which is patterned; providing a target substrate, and transferring the graphene which is patterned on the target substrate to form the graphene electrode which is patterned on the target substrate. Previously presented
The manufacturing method of the graphene electrode according to claim 1, wherein a pattern of the mask is matched with a pattern required for correspondingly manufacturing the graphene electrode; the target substrate is a flexible substrate manufactured by polyethylene terephthalate or polyimide; the metal substrate is manufactured by platinum, ruthenium, iridium, copper or nickel. Original
The manufacturing method of the graphene electrode according to claim 1, wherein the carbon source comprises at least one of: amorphous carbon, polymethylmethacrylate, polycyclic aromatic hydrocarbon, flake graphite powder, C₆₀ and graphite-like; a method of forming the carbon source on the metal substrate covered with the photoresist layer which is patterned comprises at least one of: magnetron sputtering, chemical vapor deposition, direct coating of graphite powder and coating of carbon atoms containing solution. Original
The manufacturing method of the graphene electrode according to claim 1, wherein the step of providing a target substrate, and transferring the graphene which is patterned on the target substrate to form the graphene electrode which is patterned on the target substrate comprises: providing the target substrate to adhere the target substrate on the graphene which is patterned, and heating and pressing to adhere the target substrate to the graphene which is patterned; removing the target substrate, and maintaining the graphene which is patterned to be adhered on the target substrate to form the graphene electrode which is patterned. Original
Canceled
The manufacturing method of the graphene electrode according to claim [[2]] 1, wherein the step of providing a target substrate, and transferring the graphene which is patterned on the target substrate to form the graphene electrode which is patterned on the target substrate comprises: providing the target substrate to adhere the target substrate on the graphene which is patterned, and heating and pressing to adhere the target substrate to the graphene which is patterned; removing the target substrate, and maintaining the graphene which is patterned to be adhered on the target substrate to form the graphene electrode which is patterned. Currently amended
Claims 9-20 Canceled
Canceled
Layer stacks claimed or described, ordered top of device to substrate.
patterned graphene electrode on flexible substrate
liquid crystal display panel with graphene electrode
Materials described outside the worked examples.
graphene
C
carbon source (non-gaseous film)
Additional fabrication and treatment steps described in the patent.
Related documents with shared materials, methods, properties, or citations.
Patent
Atlas literature
Patent
US 10,634,962Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1 is a flowchart of a manufacturing method of a graphene electrode provided by the first embodiment of the present invention. [0036]
FIG. 2(h) are process diagrams of respective steps as manufacturing the graphene electrode by the manufacturing method shown in
FIG. 3 is a flowchart of a manufacturing method of a graphene electrode provided by the second embodiment of the present invention. [0038]
FIG. 4(h) are process diagrams of respective steps as manufacturing the graphene electrode by the manufacturing method shown in
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A manufacturing method of a graphene electrode, comprising steps of: providing a metal substrate, and removing oxide on a surface of the metal substrate in a solution of acetone, ethyl lactate or ethanol for ultrasonic cleaning, and then forming a photoresist layer on the surface of the metal substrate; providing a mask, and exposing the photoresist layer with the mask; developing the photoresist layer after exposure to form the photoresist layer which is patterned on the metal substrate; forming a carbon source on the metal substrate covered with the photoresist layer which is patterned, and a portion of the carbon source covering on the photoresist layer which is patterned, and the other portion directly covering on the metal substrate not covered by the photoresist layer which is patterned, wherein the carbon source is a non-gaseous material that is formed as a film on the metal substrate covered with the photoresist layer which is patterned so as to form an intermediate substrate, in which the portion of the carbon source covering on the photoresist layer and the other portion directly covering and in direct contact with the metal substrate have a level difference therebetween and are not connected to each other; placing the intermediate substrate on which said other portion of the carbon source that covers the metal substrate is carried in a vacuum-tight chamber and filling an inactive gas, and then heating the metal substrate under protection of the inactive gas to catalyze the carbon source directly covering and in direct contact with the metal substrate by the metal substrate to form graphene, while heating is not transferred to the portion of the carbon source covering the photoresist layer by the level difference; stripping the photoresist layer which is patterned and the carbon source covering on the photoresist layer which is patterned from the metal substrate, and the graphene directly covering on the metal substrate forming the graphene which is patterned; providing a target substrate, and transferring the graphene which is patterned on the target substrate to form the graphene electrode which is patterned on the target substrate. Previously presented
The manufacturing method of the graphene electrode according to claim 1, wherein a pattern of the mask is matched with a pattern required for correspondingly manufacturing the graphene electrode; the target substrate is a flexible substrate manufactured by polyethylene terephthalate or polyimide; the metal substrate is manufactured by platinum, ruthenium, iridium, copper or nickel. Original
The manufacturing method of the graphene electrode according to claim 1, wherein the carbon source comprises at least one of: amorphous carbon, polymethylmethacrylate, polycyclic aromatic hydrocarbon, flake graphite powder, C₆₀ and graphite-like; a method of forming the carbon source on the metal substrate covered with the photoresist layer which is patterned comprises at least one of: magnetron sputtering, chemical vapor deposition, direct coating of graphite powder and coating of carbon atoms containing solution. Original
The manufacturing method of the graphene electrode according to claim 1, wherein the step of providing a target substrate, and transferring the graphene which is patterned on the target substrate to form the graphene electrode which is patterned on the target substrate comprises: providing the target substrate to adhere the target substrate on the graphene which is patterned, and heating and pressing to adhere the target substrate to the graphene which is patterned; removing the target substrate, and maintaining the graphene which is patterned to be adhered on the target substrate to form the graphene electrode which is patterned. Original
Canceled
The manufacturing method of the graphene electrode according to claim [[2]] 1, wherein the step of providing a target substrate, and transferring the graphene which is patterned on the target substrate to form the graphene electrode which is patterned on the target substrate comprises: providing the target substrate to adhere the target substrate on the graphene which is patterned, and heating and pressing to adhere the target substrate to the graphene which is patterned; removing the target substrate, and maintaining the graphene which is patterned to be adhered on the target substrate to form the graphene electrode which is patterned. Currently amended
Claims 9-20 Canceled
Canceled
Layer stacks claimed or described, ordered top of device to substrate.
patterned graphene electrode on flexible substrate
liquid crystal display panel with graphene electrode
Materials described outside the worked examples.
graphene
C
carbon source (non-gaseous film)
Additional fabrication and treatment steps described in the patent.
Related documents with shared materials, methods, properties, or citations.
photoresist
metal substrate
inactive gas
polyethylene terephthalate
polyimide
platinum
Pt
ruthenium
Ru
iridium
Ir
copper
Cu
nickel
Ni
amorphous carbon
polymethylmethacrylate
polycyclic aromatic hydrocarbon
flake graphite powder
C₆₀
graphite-like
acetone
ethyl lactate
ethanol
photoresist
metal substrate
inactive gas
polyethylene terephthalate
polyimide
platinum
Pt
ruthenium
Ru
iridium
Ir
copper
Cu
nickel
Ni
amorphous carbon
polymethylmethacrylate
polycyclic aromatic hydrocarbon
flake graphite powder
C₆₀
graphite-like
acetone
ethyl lactate
ethanol
photoresist
metal substrate
inactive gas
polyethylene terephthalate
polyimide
platinum
Pt
ruthenium
Ru
iridium
Ir
copper
Cu
nickel
Ni
amorphous carbon
polymethylmethacrylate
polycyclic aromatic hydrocarbon
flake graphite powder
C₆₀
graphite-like
acetone
ethyl lactate
ethanol
photoresist
metal substrate
inactive gas
polyethylene terephthalate
polyimide
platinum
Pt
ruthenium
Ru
iridium
Ir
copper
Cu
nickel
Ni
amorphous carbon
polymethylmethacrylate
polycyclic aromatic hydrocarbon
flake graphite powder
C₆₀
graphite-like
acetone
ethyl lactate
ethanol