(Previously Presented): The process of claim 1. wherein: the solvent having a nonzero dipole moment is selected from the group consisting of water. pyrrolidin one. a C -C 12 alkylpyrrolidin o ne, octylpyrr o lidi n one, dimethylf orm amide (DM F), di m ethylacetamide, dimethyl sulfoxide (D M SO), acetonitrile, tetrahydrof u ran (T HF), and hexamethylphosphora m ide (H M PA); the m ineral acid is selected from the group consisting of hydrochloric acid, sulfuric acid, nitric acid, and perchl o ric acid; and the o rganic acid is selected from the group consisting of formic acid, lactic acid, benzoic acid, m ethanesulfonic acid, para-to lu enesulfonic acid (PTSA), trifluoroacetic acid, tric hl oroacetic acid, a -naphthol, and pi c ric acid. A pplica tion N o. 14/364,9 70 Reply to Office A ction of Feb ruary 19, 2016

(Previously Presented): The process of claim 1, wherein the solvent in a) is water.

(Previously Presented): The process of claim 1, wherein a graphene oxide (GO) concentration in the dispersion is between 1x 1{04 and I x 1 0' g/L, limits inclusive.

The process of claim 1. wherein the tin c o mpound is at least o ne member selected from the group consisting of: tin metal; and a tin(II) salt selected f r om the group consisting of tin chloride, tin sulfate, tin nitrate. tin perchlorate, tin tetraphenylborate, tin phosphate, tin acetate, and tin oxalate.

The process of claim 1, wherein an amount of tin comp oun d is from 0.1 to 5 equivalents, limits inclusive, relative to an amount of oxygen to be removed from the graphene oxide.

The process of claim 1, w herein the acidic compound is used pure or diluted as an aqueous solution to a concentration of at least 0.1 mol.L4.

(Previously Presented): The process of claim 1, w herein the pH of the dispersion in a) is less than 5.

The process of claim 1, wherein the washing in b) is perfor m ed at a pH < 3.

(Previously Presented): The process of claim 1, wherein in a), the reaction occurs at a temperature between 0 ° C and a refl u x temperature of the solvent.

(Previously Presente d): The process of claim 1, wherein a reaction time in a) is f r om I minute to 72 hours, limits inclusive.

The process of claim 1, wherein the reacting in a) is performed chemically or electrochemically.

The process of claim 1, wherein the acidic w ashing in b) is performed with a mineral acid selected from the group consisting of hydrochloric acid, sulfuric acid, nitric acid, perchloric acid, and phosphoric acid. 4 Application N o. 14/364,9 70 Reply to Office A ction of Feb ruary 19,

The process of claim 1, w herein the degree of contamination of the graphene with metallic, magnetic. organic and mineral impurities is not more than 0.001 % by mass, relative to the total mass of the graphene.

(Previously Presented): The process of claim 1, wherein the degree of contamination of the graphene with metallic, magne t ic. organ i c and mineral impuri t ies is not more than 0.0001 % by mass, relative to the total mass of the graphene.

(Previously Presented): The process of claim 1, wherein the graphene obta ined by the process is in the form of a powder having a density < 100 mg.mL '.

(Previously Presented): The process of claim 1. wherein: the solvent having a nonzero dipole moment is selected from the group consisting of water. pyrrolidin one. a C -C 12 alkylpyrrolidin o ne, octylpyrr o lidi n one, dimethylf orm amide (DM F), di m ethylacetamide, dimethyl sulfoxide (D M SO), acetonitrile, tetrahydrof u ran (T HF), and hexamethylphosphora m ide (H M PA); the m ineral acid is selected from the group consisting of hydrochloric acid, sulfuric acid, nitric acid, and perchl o ric acid; and the o rganic acid is selected from the group consisting of formic acid, lactic acid, benzoic acid, m ethanesulfonic acid, para-to lu enesulfonic acid (PTSA), trifluoroacetic acid, tric hl oroacetic acid, a -naphthol, and pi c ric acid. A pplica tion N o. 14/364,9 70 Reply to Office A ction of Feb ruary 19, 2016

(Previously Presented): The process of claim 1, wherein the solvent in a) is water.

(Previously Presented): The process of claim 1, wherein a graphene oxide (GO) concentration in the dispersion is between 1x 1{04 and I x 1 0' g/L, limits inclusive.

The process of claim 1. wherein the tin c o mpound is at least o ne member selected from the group consisting of: tin metal; and a tin(II) salt selected f r om the group consisting of tin chloride, tin sulfate, tin nitrate. tin perchlorate, tin tetraphenylborate, tin phosphate, tin acetate, and tin oxalate.

The process of claim 1, wherein an amount of tin comp oun d is from 0.1 to 5 equivalents, limits inclusive, relative to an amount of oxygen to be removed from the graphene oxide.

The process of claim 1, w herein the acidic compound is used pure or diluted as an aqueous solution to a concentration of at least 0.1 mol.L4.

(Previously Presented): The process of claim 1, w herein the pH of the dispersion in a) is less than 5.

The process of claim 1, wherein the washing in b) is perfor m ed at a pH < 3.

(Previously Presented): The process of claim 1, wherein in a), the reaction occurs at a temperature between 0 ° C and a refl u x temperature of the solvent.

(Previously Presente d): The process of claim 1, wherein a reaction time in a) is f r om I minute to 72 hours, limits inclusive.

The process of claim 1, wherein the reacting in a) is performed chemically or electrochemically.

The process of claim 1, wherein the acidic w ashing in b) is performed with a mineral acid selected from the group consisting of hydrochloric acid, sulfuric acid, nitric acid, perchloric acid, and phosphoric acid. 4 Application N o. 14/364,9 70 Reply to Office A ction of Feb ruary 19,

The process of claim 1, w herein the degree of contamination of the graphene with metallic, magnetic. organic and mineral impurities is not more than 0.001 % by mass, relative to the total mass of the graphene.

(Previously Presented): The process of claim 1, wherein the degree of contamination of the graphene with metallic, magne t ic. organ i c and mineral impuri t ies is not more than 0.0001 % by mass, relative to the total mass of the graphene.

(Previously Presented): The process of claim 1, wherein the graphene obta ined by the process is in the form of a powder having a density < 100 mg.mL '.

(Previously Presented): The process of claim 1. wherein: the solvent having a nonzero dipole moment is selected from the group consisting of water. pyrrolidin one. a C -C 12 alkylpyrrolidin o ne, octylpyrr o lidi n one, dimethylf orm amide (DM F), di m ethylacetamide, dimethyl sulfoxide (D M SO), acetonitrile, tetrahydrof u ran (T HF), and hexamethylphosphora m ide (H M PA); the m ineral acid is selected from the group consisting of hydrochloric acid, sulfuric acid, nitric acid, and perchl o ric acid; and the o rganic acid is selected from the group consisting of formic acid, lactic acid, benzoic acid, m ethanesulfonic acid, para-to lu enesulfonic acid (PTSA), trifluoroacetic acid, tric hl oroacetic acid, a -naphthol, and pi c ric acid. A pplica tion N o. 14/364,9 70 Reply to Office A ction of Feb ruary 19, 2016

(Previously Presented): The process of claim 1, wherein the solvent in a) is water.

(Previously Presented): The process of claim 1, wherein a graphene oxide (GO) concentration in the dispersion is between 1x 1{04 and I x 1 0' g/L, limits inclusive.

The process of claim 1. wherein the tin c o mpound is at least o ne member selected from the group consisting of: tin metal; and a tin(II) salt selected f r om the group consisting of tin chloride, tin sulfate, tin nitrate. tin perchlorate, tin tetraphenylborate, tin phosphate, tin acetate, and tin oxalate.

The process of claim 1, wherein an amount of tin comp oun d is from 0.1 to 5 equivalents, limits inclusive, relative to an amount of oxygen to be removed from the graphene oxide.

The process of claim 1, w herein the acidic compound is used pure or diluted as an aqueous solution to a concentration of at least 0.1 mol.L4.

(Previously Presented): The process of claim 1, w herein the pH of the dispersion in a) is less than 5.

The process of claim 1, wherein the washing in b) is perfor m ed at a pH < 3.

(Previously Presented): The process of claim 1, wherein in a), the reaction occurs at a temperature between 0 ° C and a refl u x temperature of the solvent.

(Previously Presente d): The process of claim 1, wherein a reaction time in a) is f r om I minute to 72 hours, limits inclusive.

The process of claim 1, wherein the reacting in a) is performed chemically or electrochemically.

The process of claim 1, wherein the acidic w ashing in b) is performed with a mineral acid selected from the group consisting of hydrochloric acid, sulfuric acid, nitric acid, perchloric acid, and phosphoric acid. 4 Application N o. 14/364,9 70 Reply to Office A ction of Feb ruary 19,

The process of claim 1, w herein the degree of contamination of the graphene with metallic, magnetic. organic and mineral impurities is not more than 0.001 % by mass, relative to the total mass of the graphene.

(Previously Presented): The process of claim 1, wherein the degree of contamination of the graphene with metallic, magne t ic. organ i c and mineral impuri t ies is not more than 0.0001 % by mass, relative to the total mass of the graphene.

(Previously Presented): The process of claim 1, wherein the graphene obta ined by the process is in the form of a powder having a density < 100 mg.mL '.

(Previously Presented): The process of claim 1. wherein: the solvent having a nonzero dipole moment is selected from the group consisting of water. pyrrolidin one. a C -C 12 alkylpyrrolidin o ne, octylpyrr o lidi n one, dimethylf orm amide (DM F), di m ethylacetamide, dimethyl sulfoxide (D M SO), acetonitrile, tetrahydrof u ran (T HF), and hexamethylphosphora m ide (H M PA); the m ineral acid is selected from the group consisting of hydrochloric acid, sulfuric acid, nitric acid, and perchl o ric acid; and the o rganic acid is selected from the group consisting of formic acid, lactic acid, benzoic acid, m ethanesulfonic acid, para-to lu enesulfonic acid (PTSA), trifluoroacetic acid, tric hl oroacetic acid, a -naphthol, and pi c ric acid. A pplica tion N o. 14/364,9 70 Reply to Office A ction of Feb ruary 19, 2016

(Previously Presented): The process of claim 1, wherein the solvent in a) is water.

(Previously Presented): The process of claim 1, wherein a graphene oxide (GO) concentration in the dispersion is between 1x 1{04 and I x 1 0' g/L, limits inclusive.

The process of claim 1. wherein the tin c o mpound is at least o ne member selected from the group consisting of: tin metal; and a tin(II) salt selected f r om the group consisting of tin chloride, tin sulfate, tin nitrate. tin perchlorate, tin tetraphenylborate, tin phosphate, tin acetate, and tin oxalate.

The process of claim 1, wherein an amount of tin comp oun d is from 0.1 to 5 equivalents, limits inclusive, relative to an amount of oxygen to be removed from the graphene oxide.

The process of claim 1, w herein the acidic compound is used pure or diluted as an aqueous solution to a concentration of at least 0.1 mol.L4.

(Previously Presented): The process of claim 1, w herein the pH of the dispersion in a) is less than 5.

The process of claim 1, wherein the washing in b) is perfor m ed at a pH < 3.

(Previously Presented): The process of claim 1, wherein in a), the reaction occurs at a temperature between 0 ° C and a refl u x temperature of the solvent.

(Previously Presente d): The process of claim 1, wherein a reaction time in a) is f r om I minute to 72 hours, limits inclusive.

The process of claim 1, wherein the reacting in a) is performed chemically or electrochemically.

The process of claim 1, wherein the acidic w ashing in b) is performed with a mineral acid selected from the group consisting of hydrochloric acid, sulfuric acid, nitric acid, perchloric acid, and phosphoric acid. 4 Application N o. 14/364,9 70 Reply to Office A ction of Feb ruary 19,

The process of claim 1, w herein the degree of contamination of the graphene with metallic, magnetic. organic and mineral impurities is not more than 0.001 % by mass, relative to the total mass of the graphene.

(Previously Presented): The process of claim 1, wherein the degree of contamination of the graphene with metallic, magne t ic. organ i c and mineral impuri t ies is not more than 0.0001 % by mass, relative to the total mass of the graphene.

(Previously Presented): The process of claim 1, wherein the graphene obta ined by the process is in the form of a powder having a density < 100 mg.mL '.