Patent
US 9,057,639REDUCED GRAPHENE OXIDE FILM
Jeremy T. Robinson
US
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Patent
Atlas literature
Patent
US 9,057,639Patent drawings and their descriptions. Click a drawing to enlarge it.
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method comprising: centrifuging a suspension of graphene oxide platelets and water to form a liquid and wet solids; removing the wet solids from the liquid; suspending the wet solids in pr, an organic solvent to form a mixture; spin coating the mixture by placing a drop of the mixture on a spinning substrate while blowing a drying gas onto the substrate and allowing the water and the organic solvent on the substrate to evaporate; and repeating the spin coating one or more times to form a graphene oxide film in contact with the substrate.
The method of claim 1, wherein the organic solvent is methanol.
The method of claim 1, wherein each spin coating produces a sub-monolayer of graphene oxide on the substrate.
The method of claim 1, wherein the spin coating is repeated up to 300 times.
The method of claim 1, wherein the substrate is spun from about 2000 to about 6000 RPM.
The method of claim 1, wherein the drop of the mixture is up to about 100 L in volume.
The method of claim 1, further comprising: at least partially reducing the graphene oxide film. 2 Serial No.: 13/455,563 PATENT APPLICATION Docket No.: 99142-US₃
A method comprising: providing a mixture of graphene oxide platelets, water, and an organic solvent; spin coating the mixture by placing a drop of the mixture on a spinning substrate while blowing a drying gas onto the substrate and allowing the water and the organic solvent on the substrate to evaporate; and repeating the spin coating one or more times to form a graphene oxide film in contact with the substrate; at least partially reducing the graphene oxide film; releasing the reduced graphene oxide film from the substrate; and placing the released film on a second contoured substrate such that portions of the film are suspended above the contoured substrate.
The method of claim 13, wherein the organic solvent is methanol.
The method of claim 13, wherein each spin coating produces a sub-monolayer of graphene oxide on the substrate. 3 Serial No.: 13/455,563 PATENT APPLICATION Docket No.: 99142-US₃
The method of claim 13, wherein the spin coating is repeated up to 300 times.
The method of claim 13, wherein the substrate is spun from about 2000 to about 6000 RPM.
The method of claim 13, wherein the drop of the mixture is up to about 100 L in volume.
(withdrawn-new) The method of claim 13, wherein the graphene oxide film is reduced with hydrazine hydrate vapor.
The method of claim 13, wherein the graphene oxide film is reduced by annealing in an inert gas or hydrogen.
The method of claim 13, wherein the reduced graphene oxide film is released with a sodium hydroxide solution or potassium hydroxide solution. 4
Layer stacks claimed or described, ordered top of device to substrate.
graphene oxide film on substrate
suspended reduced graphene oxide membrane on contoured substrate
Materials described outside the worked examples.
graphene oxide
water
H₂O
Additional fabrication and treatment steps described in the patent.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Film Thickness | 1–100 nm | reduced graphene oxide |
Electrical Conductivity | ≥ 1 S/cm |
Related documents with shared materials, methods, properties, or citations.
Patent
Atlas literature
Patent
US 9,057,639Patent drawings and their descriptions. Click a drawing to enlarge it.
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method comprising: centrifuging a suspension of graphene oxide platelets and water to form a liquid and wet solids; removing the wet solids from the liquid; suspending the wet solids in pr, an organic solvent to form a mixture; spin coating the mixture by placing a drop of the mixture on a spinning substrate while blowing a drying gas onto the substrate and allowing the water and the organic solvent on the substrate to evaporate; and repeating the spin coating one or more times to form a graphene oxide film in contact with the substrate.
The method of claim 1, wherein the organic solvent is methanol.
The method of claim 1, wherein each spin coating produces a sub-monolayer of graphene oxide on the substrate.
The method of claim 1, wherein the spin coating is repeated up to 300 times.
The method of claim 1, wherein the substrate is spun from about 2000 to about 6000 RPM.
The method of claim 1, wherein the drop of the mixture is up to about 100 L in volume.
The method of claim 1, further comprising: at least partially reducing the graphene oxide film. 2 Serial No.: 13/455,563 PATENT APPLICATION Docket No.: 99142-US₃
A method comprising: providing a mixture of graphene oxide platelets, water, and an organic solvent; spin coating the mixture by placing a drop of the mixture on a spinning substrate while blowing a drying gas onto the substrate and allowing the water and the organic solvent on the substrate to evaporate; and repeating the spin coating one or more times to form a graphene oxide film in contact with the substrate; at least partially reducing the graphene oxide film; releasing the reduced graphene oxide film from the substrate; and placing the released film on a second contoured substrate such that portions of the film are suspended above the contoured substrate.
The method of claim 13, wherein the organic solvent is methanol.
The method of claim 13, wherein each spin coating produces a sub-monolayer of graphene oxide on the substrate. 3 Serial No.: 13/455,563 PATENT APPLICATION Docket No.: 99142-US₃
The method of claim 13, wherein the spin coating is repeated up to 300 times.
The method of claim 13, wherein the substrate is spun from about 2000 to about 6000 RPM.
The method of claim 13, wherein the drop of the mixture is up to about 100 L in volume.
(withdrawn-new) The method of claim 13, wherein the graphene oxide film is reduced with hydrazine hydrate vapor.
The method of claim 13, wherein the graphene oxide film is reduced by annealing in an inert gas or hydrogen.
The method of claim 13, wherein the reduced graphene oxide film is released with a sodium hydroxide solution or potassium hydroxide solution. 4
Layer stacks claimed or described, ordered top of device to substrate.
graphene oxide film on substrate
suspended reduced graphene oxide membrane on contoured substrate
Materials described outside the worked examples.
graphene oxide
water
H₂O
Additional fabrication and treatment steps described in the patent.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Film Thickness | 1–100 nm | reduced graphene oxide |
Electrical Conductivity | ≥ 1 S/cm |
Related documents with shared materials, methods, properties, or citations.
Patent
Atlas literature
Patent
US 9,057,639Patent drawings and their descriptions. Click a drawing to enlarge it.
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method comprising: centrifuging a suspension of graphene oxide platelets and water to form a liquid and wet solids; removing the wet solids from the liquid; suspending the wet solids in pr, an organic solvent to form a mixture; spin coating the mixture by placing a drop of the mixture on a spinning substrate while blowing a drying gas onto the substrate and allowing the water and the organic solvent on the substrate to evaporate; and repeating the spin coating one or more times to form a graphene oxide film in contact with the substrate.
The method of claim 1, wherein the organic solvent is methanol.
The method of claim 1, wherein each spin coating produces a sub-monolayer of graphene oxide on the substrate.
The method of claim 1, wherein the spin coating is repeated up to 300 times.
The method of claim 1, wherein the substrate is spun from about 2000 to about 6000 RPM.
The method of claim 1, wherein the drop of the mixture is up to about 100 L in volume.
The method of claim 1, further comprising: at least partially reducing the graphene oxide film. 2 Serial No.: 13/455,563 PATENT APPLICATION Docket No.: 99142-US₃
A method comprising: providing a mixture of graphene oxide platelets, water, and an organic solvent; spin coating the mixture by placing a drop of the mixture on a spinning substrate while blowing a drying gas onto the substrate and allowing the water and the organic solvent on the substrate to evaporate; and repeating the spin coating one or more times to form a graphene oxide film in contact with the substrate; at least partially reducing the graphene oxide film; releasing the reduced graphene oxide film from the substrate; and placing the released film on a second contoured substrate such that portions of the film are suspended above the contoured substrate.
The method of claim 13, wherein the organic solvent is methanol.
The method of claim 13, wherein each spin coating produces a sub-monolayer of graphene oxide on the substrate. 3 Serial No.: 13/455,563 PATENT APPLICATION Docket No.: 99142-US₃
The method of claim 13, wherein the spin coating is repeated up to 300 times.
The method of claim 13, wherein the substrate is spun from about 2000 to about 6000 RPM.
The method of claim 13, wherein the drop of the mixture is up to about 100 L in volume.
(withdrawn-new) The method of claim 13, wherein the graphene oxide film is reduced with hydrazine hydrate vapor.
The method of claim 13, wherein the graphene oxide film is reduced by annealing in an inert gas or hydrogen.
The method of claim 13, wherein the reduced graphene oxide film is released with a sodium hydroxide solution or potassium hydroxide solution. 4
Layer stacks claimed or described, ordered top of device to substrate.
graphene oxide film on substrate
suspended reduced graphene oxide membrane on contoured substrate
Materials described outside the worked examples.
graphene oxide
water
H₂O
Additional fabrication and treatment steps described in the patent.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Film Thickness | 1–100 nm | reduced graphene oxide |
Electrical Conductivity | ≥ 1 S/cm |
Related documents with shared materials, methods, properties, or citations.
Patent
Atlas literature
Patent
US 9,057,639Patent drawings and their descriptions. Click a drawing to enlarge it.
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method comprising: centrifuging a suspension of graphene oxide platelets and water to form a liquid and wet solids; removing the wet solids from the liquid; suspending the wet solids in pr, an organic solvent to form a mixture; spin coating the mixture by placing a drop of the mixture on a spinning substrate while blowing a drying gas onto the substrate and allowing the water and the organic solvent on the substrate to evaporate; and repeating the spin coating one or more times to form a graphene oxide film in contact with the substrate.
The method of claim 1, wherein the organic solvent is methanol.
The method of claim 1, wherein each spin coating produces a sub-monolayer of graphene oxide on the substrate.
The method of claim 1, wherein the spin coating is repeated up to 300 times.
The method of claim 1, wherein the substrate is spun from about 2000 to about 6000 RPM.
The method of claim 1, wherein the drop of the mixture is up to about 100 L in volume.
The method of claim 1, further comprising: at least partially reducing the graphene oxide film. 2 Serial No.: 13/455,563 PATENT APPLICATION Docket No.: 99142-US₃
A method comprising: providing a mixture of graphene oxide platelets, water, and an organic solvent; spin coating the mixture by placing a drop of the mixture on a spinning substrate while blowing a drying gas onto the substrate and allowing the water and the organic solvent on the substrate to evaporate; and repeating the spin coating one or more times to form a graphene oxide film in contact with the substrate; at least partially reducing the graphene oxide film; releasing the reduced graphene oxide film from the substrate; and placing the released film on a second contoured substrate such that portions of the film are suspended above the contoured substrate.
The method of claim 13, wherein the organic solvent is methanol.
The method of claim 13, wherein each spin coating produces a sub-monolayer of graphene oxide on the substrate. 3 Serial No.: 13/455,563 PATENT APPLICATION Docket No.: 99142-US₃
The method of claim 13, wherein the spin coating is repeated up to 300 times.
The method of claim 13, wherein the substrate is spun from about 2000 to about 6000 RPM.
The method of claim 13, wherein the drop of the mixture is up to about 100 L in volume.
(withdrawn-new) The method of claim 13, wherein the graphene oxide film is reduced with hydrazine hydrate vapor.
The method of claim 13, wherein the graphene oxide film is reduced by annealing in an inert gas or hydrogen.
The method of claim 13, wherein the reduced graphene oxide film is released with a sodium hydroxide solution or potassium hydroxide solution. 4
Layer stacks claimed or described, ordered top of device to substrate.
graphene oxide film on substrate
suspended reduced graphene oxide membrane on contoured substrate
Materials described outside the worked examples.
graphene oxide
water
H₂O
Additional fabrication and treatment steps described in the patent.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Film Thickness | 1–100 nm | reduced graphene oxide |
Electrical Conductivity | ≥ 1 S/cm |
Related documents with shared materials, methods, properties, or citations.
organic solvent
methanol
CH₃OH
reduced graphene oxide
hydrazine hydrate
sodium hydroxide solution
NaOH
potassium hydroxide solution
KOH
acetone
C₃H₆O
SiO₂/Si substrate
Conductivity Increase Factor | 10000–100000 fold | reduced graphene oxide |
Youngs Modulus | ≥ 100 GPa | reduced graphene oxide |
Go Platelet Thickness | 1–1.5 nm | graphene oxide |
Go Platelet Area | ≤ 1 um2 | graphene oxide |
Temperature | 240–260 °C | — |
Thickness | 2–200 cm | — |
Thickness | 2–4 nm | — |
Pressure | 1e-7 Torr | — |
Thickness | ≤ 300 nm | — |
Pressure | ≤ 1e-7 Torr | — |
Thickness | ≥ 10 nm | — |
Duration | ≥ 30 minutes | — |
organic solvent
methanol
CH₃OH
reduced graphene oxide
hydrazine hydrate
sodium hydroxide solution
NaOH
potassium hydroxide solution
KOH
acetone
C₃H₆O
SiO₂/Si substrate
Conductivity Increase Factor | 10000–100000 fold | reduced graphene oxide |
Youngs Modulus | ≥ 100 GPa | reduced graphene oxide |
Go Platelet Thickness | 1–1.5 nm | graphene oxide |
Go Platelet Area | ≤ 1 um2 | graphene oxide |
Temperature | 240–260 °C | — |
Thickness | 2–200 cm | — |
Thickness | 2–4 nm | — |
Pressure | 1e-7 Torr | — |
Thickness | ≤ 300 nm | — |
Pressure | ≤ 1e-7 Torr | — |
Thickness | ≥ 10 nm | — |
Duration | ≥ 30 minutes | — |
organic solvent
methanol
CH₃OH
reduced graphene oxide
hydrazine hydrate
sodium hydroxide solution
NaOH
potassium hydroxide solution
KOH
acetone
C₃H₆O
SiO₂/Si substrate
Conductivity Increase Factor | 10000–100000 fold | reduced graphene oxide |
Youngs Modulus | ≥ 100 GPa | reduced graphene oxide |
Go Platelet Thickness | 1–1.5 nm | graphene oxide |
Go Platelet Area | ≤ 1 um2 | graphene oxide |
Temperature | 240–260 °C | — |
Thickness | 2–200 cm | — |
Thickness | 2–4 nm | — |
Pressure | 1e-7 Torr | — |
Thickness | ≤ 300 nm | — |
Pressure | ≤ 1e-7 Torr | — |
Thickness | ≥ 10 nm | — |
Duration | ≥ 30 minutes | — |
organic solvent
methanol
CH₃OH
reduced graphene oxide
hydrazine hydrate
sodium hydroxide solution
NaOH
potassium hydroxide solution
KOH
acetone
C₃H₆O
SiO₂/Si substrate
Conductivity Increase Factor | 10000–100000 fold | reduced graphene oxide |
Youngs Modulus | ≥ 100 GPa | reduced graphene oxide |
Go Platelet Thickness | 1–1.5 nm | graphene oxide |
Go Platelet Area | ≤ 1 um2 | graphene oxide |
Temperature | 240–260 °C | — |
Thickness | 2–200 cm | — |
Thickness | 2–4 nm | — |
Pressure | 1e-7 Torr | — |
Thickness | ≤ 300 nm | — |
Pressure | ≤ 1e-7 Torr | — |
Thickness | ≥ 10 nm | — |
Duration | ≥ 30 minutes | — |