Patent
US 8,488,641II-VI semiconductor
III-V semiconductor (N-containing)
Bragg reflector dielectrics
InP
SiO₂
Si₃N₄
TiO₂
Ta₂O₅
MgF₂
CaF₂
HfO₂
ZnSeTe
| — |
Thickness | ≤ 50 nm | — |
Thickness | ≤ 5 nm | — |
Thickness | ≤ 1 nm | — |
Thickness | ≥ 50 nm | — |
II-VI semiconductor
III-V semiconductor (N-containing)
Bragg reflector dielectrics
InP
SiO₂
Si₃N₄
TiO₂
Ta₂O₅
MgF₂
CaF₂
HfO₂
ZnSeTe
| — |
Thickness | ≤ 50 nm | — |
Thickness | ≤ 5 nm | — |
Thickness | ≤ 1 nm | — |
Thickness | ≥ 50 nm | — |
II-VI semiconductor
III-V semiconductor (N-containing)
Bragg reflector dielectrics
InP
SiO₂
Si₃N₄
TiO₂
Ta₂O₅
MgF₂
CaF₂
HfO₂
ZnSeTe
| — |
Thickness | ≤ 50 nm | — |
Thickness | ≤ 5 nm | — |
Thickness | ≤ 1 nm | — |
Thickness | ≥ 50 nm | — |
II-VI semiconductor
III-V semiconductor (N-containing)
Bragg reflector dielectrics
InP
SiO₂
Si₃N₄
TiO₂
Ta₂O₅
MgF₂
CaF₂
HfO₂
ZnSeTe
| — |
Thickness | ≤ 50 nm | — |
Thickness | ≤ 5 nm | — |
Thickness | ≤ 1 nm | — |
Thickness | ≥ 50 nm | — |