Patent
US 8,824,516conventional GaN-based laser device (prior art, Fig. 20)
Si-doped n-type Al0.1Ga0.9N lower clad layer
Al0.1Ga0.9N
multiple quantum well active layer
silicon oxide dielectric film
SiO₂
conventional GaN-based laser device (prior art, Fig. 20)
Si-doped n-type Al0.1Ga0.9N lower clad layer
Al0.1Ga0.9N
multiple quantum well active layer
silicon oxide dielectric film
SiO₂
conventional GaN-based laser device (prior art, Fig. 20)
Si-doped n-type Al0.1Ga0.9N lower clad layer
Al0.1Ga0.9N
multiple quantum well active layer
silicon oxide dielectric film
SiO₂
conventional GaN-based laser device (prior art, Fig. 20)
Si-doped n-type Al0.1Ga0.9N lower clad layer
Al0.1Ga0.9N
multiple quantum well active layer
silicon oxide dielectric film
SiO₂