Patent
US 11,854,977 B2Electronic device with insulating layer completely surrounding source metal bus (claim 18)
GaN-based lateral power device (described embodiment)
AlCu
silicon dioxide
SiO₂
silicon nitride
Si₃N₄
| ≥ 1100 µm |
| — |
Thickness | ≥ 16 µm | — |
Thickness | ≥ 1.3 µm | — |
Cited non-patent literature · 3
Electronic device with insulating layer completely surrounding source metal bus (claim 18)
GaN-based lateral power device (described embodiment)
AlCu
silicon dioxide
SiO₂
silicon nitride
Si₃N₄
| ≥ 1100 µm |
| — |
Thickness | ≥ 16 µm | — |
Thickness | ≥ 1.3 µm | — |
Cited non-patent literature · 3
Electronic device with insulating layer completely surrounding source metal bus (claim 18)
GaN-based lateral power device (described embodiment)
AlCu
silicon dioxide
SiO₂
silicon nitride
Si₃N₄
| ≥ 1100 µm |
| — |
Thickness | ≥ 16 µm | — |
Thickness | ≥ 1.3 µm | — |
Cited non-patent literature · 3
Electronic device with insulating layer completely surrounding source metal bus (claim 18)
GaN-based lateral power device (described embodiment)
AlCu
silicon dioxide
SiO₂
silicon nitride
Si₃N₄
| ≥ 1100 µm |
| — |
Thickness | ≥ 16 µm | — |
Thickness | ≥ 1.3 µm | — |
Cited non-patent literature · 3