Patent
US 9,620,634p-type FET with BC₂N barrier channel
hexagonal boron-carbon-nitride
h-BCN
boron nitride
BN
50% carbon concentration hexagonal boron-carbon-nitride
BC₂N
75% carbon concentration hexagonal boron-carbon-nitride
BC₆N
domain of vacancies of carbon atoms
dielectric material
Subthreshold slope 80 mV/decade for FET with BC2N channel and double-gate structure | 80 | — |
h-BCN domains can have a gap between 1 and 5 eV | 1–5 | h-BCN |
p-type FET with BC₂N barrier channel
hexagonal boron-carbon-nitride
h-BCN
boron nitride
BN
50% carbon concentration hexagonal boron-carbon-nitride
BC₂N
75% carbon concentration hexagonal boron-carbon-nitride
BC₆N
domain of vacancies of carbon atoms
dielectric material
Subthreshold slope 80 mV/decade for FET with BC2N channel and double-gate structure | 80 | — |
h-BCN domains can have a gap between 1 and 5 eV | 1–5 | h-BCN |
p-type FET with BC₂N barrier channel
hexagonal boron-carbon-nitride
h-BCN
boron nitride
BN
50% carbon concentration hexagonal boron-carbon-nitride
BC₂N
75% carbon concentration hexagonal boron-carbon-nitride
BC₆N
domain of vacancies of carbon atoms
dielectric material
Subthreshold slope 80 mV/decade for FET with BC2N channel and double-gate structure | 80 | — |
h-BCN domains can have a gap between 1 and 5 eV | 1–5 | h-BCN |
p-type FET with BC₂N barrier channel
hexagonal boron-carbon-nitride
h-BCN
boron nitride
BN
50% carbon concentration hexagonal boron-carbon-nitride
BC₂N
75% carbon concentration hexagonal boron-carbon-nitride
BC₆N
domain of vacancies of carbon atoms
dielectric material
Subthreshold slope 80 mV/decade for FET with BC2N channel and double-gate structure | 80 | — |
h-BCN domains can have a gap between 1 and 5 eV | 1–5 | h-BCN |