Patent
US 10,734,537HEMT UV photodetector with AlN interlayer (described embodiment)
electrically conducting graphene
AlGaN
GaN
semiconductor interlayer
semiconductor cap layer
AlN
intrinsic AlxGa₁-xN
AlxGa₁-xN
silicon doped AlGaN cap layer
| ≤ 1e-12 A |
| — |
UV-to-Vis ratio (visible-blind performance) | ≥ 10000 dimensionless | — |
bandgap range for UVA-UVC photodetection | 3.1–6.2 eV | photoresponsive intrinsic semiconductor |
graphene transparency at operating wavelength(s) | ≥ 99 % | electrically conducting graphene |
Voltage | 0.7–1 V | — |
Thickness | 680–1090 nm | — |
Thickness | 420–680 nm | — |
Thickness | 300–1088 nm | — |
Thickness | 800–1300 nm | — |
Thickness | ≤ 420 nm | — |
Thickness | ≤ 2 nm | — |
Thickness | ≥ 1 nm | — |
Thickness | ≥ 50 nm | — |
Thickness | ≥ 30 nm | — |
HEMT UV photodetector with AlN interlayer (described embodiment)
electrically conducting graphene
AlGaN
GaN
semiconductor interlayer
semiconductor cap layer
AlN
intrinsic AlxGa₁-xN
AlxGa₁-xN
silicon doped AlGaN cap layer
| ≤ 1e-12 A |
| — |
UV-to-Vis ratio (visible-blind performance) | ≥ 10000 dimensionless | — |
bandgap range for UVA-UVC photodetection | 3.1–6.2 eV | photoresponsive intrinsic semiconductor |
graphene transparency at operating wavelength(s) | ≥ 99 % | electrically conducting graphene |
Voltage | 0.7–1 V | — |
Thickness | 680–1090 nm | — |
Thickness | 420–680 nm | — |
Thickness | 300–1088 nm | — |
Thickness | 800–1300 nm | — |
Thickness | ≤ 420 nm | — |
Thickness | ≤ 2 nm | — |
Thickness | ≥ 1 nm | — |
Thickness | ≥ 50 nm | — |
Thickness | ≥ 30 nm | — |
HEMT UV photodetector with AlN interlayer (described embodiment)
electrically conducting graphene
AlGaN
GaN
semiconductor interlayer
semiconductor cap layer
AlN
intrinsic AlxGa₁-xN
AlxGa₁-xN
silicon doped AlGaN cap layer
| ≤ 1e-12 A |
| — |
UV-to-Vis ratio (visible-blind performance) | ≥ 10000 dimensionless | — |
bandgap range for UVA-UVC photodetection | 3.1–6.2 eV | photoresponsive intrinsic semiconductor |
graphene transparency at operating wavelength(s) | ≥ 99 % | electrically conducting graphene |
Voltage | 0.7–1 V | — |
Thickness | 680–1090 nm | — |
Thickness | 420–680 nm | — |
Thickness | 300–1088 nm | — |
Thickness | 800–1300 nm | — |
Thickness | ≤ 420 nm | — |
Thickness | ≤ 2 nm | — |
Thickness | ≥ 1 nm | — |
Thickness | ≥ 50 nm | — |
Thickness | ≥ 30 nm | — |
HEMT UV photodetector with AlN interlayer (described embodiment)
electrically conducting graphene
AlGaN
GaN
semiconductor interlayer
semiconductor cap layer
AlN
intrinsic AlxGa₁-xN
AlxGa₁-xN
silicon doped AlGaN cap layer
| ≤ 1e-12 A |
| — |
UV-to-Vis ratio (visible-blind performance) | ≥ 10000 dimensionless | — |
bandgap range for UVA-UVC photodetection | 3.1–6.2 eV | photoresponsive intrinsic semiconductor |
graphene transparency at operating wavelength(s) | ≥ 99 % | electrically conducting graphene |
Voltage | 0.7–1 V | — |
Thickness | 680–1090 nm | — |
Thickness | 420–680 nm | — |
Thickness | 300–1088 nm | — |
Thickness | 800–1300 nm | — |
Thickness | ≤ 420 nm | — |
Thickness | ≤ 2 nm | — |
Thickness | ≥ 1 nm | — |
Thickness | ≥ 50 nm | — |
Thickness | ≥ 30 nm | — |