Patent
US 7,923,842NiV barrier layer
NiV
copper or gold seed layer
organic solder preservative
titanium tungsten
TiW
| — |
Thickness | 100–900 Å | — |
Thickness | 30–40 µm | — |
NiV barrier layer
NiV
copper or gold seed layer
organic solder preservative
titanium tungsten
TiW
| — |
Thickness | 100–900 Å | — |
Thickness | 30–40 µm | — |
NiV barrier layer
NiV
copper or gold seed layer
organic solder preservative
titanium tungsten
TiW
| — |
Thickness | 100–900 Å | — |
Thickness | 30–40 µm | — |
NiV barrier layer
NiV
copper or gold seed layer
organic solder preservative
titanium tungsten
TiW
| — |
Thickness | 100–900 Å | — |
Thickness | 30–40 µm | — |