A method for modifying surfaces of a substrate and sidewalls of high aspect holes of the substrate with reduced graphene oxide (rGO), the method comprising steps of: (a) contacting a substrate with an aqueous solution of a conditioner including an amino compound at 40-80 ° C for 3-10 minutes to form layers of the amino compound on surfaces of the substrate and sidewalls of the holes, wherein the amino compound has a concentration of 0.1-3g/L; (b) contacting the substrate with a graphene oxide (GO) solution for 5-10 minutes to bond the GO with the amino compound, wherein the GO solution has a pH value 3-6, a temperature of 35-80 ° C and a solid content of 0.1-1g/L; and (c) contacting the substrate with a solution containing a reducing agent at 60-90 C for 5-10 minutes to reduce the GO and modify the surfaces of the substrate with the reduced GO (rGO), wherein the solution containing the reducing agent has a pH value 3-10 and a concentration of 0.5-2M.

A method for modifying surfaces of a substrate and sidewalls of blind vias or through holes of the substrate with reduced graphene oxide (rGO), the method comprising steps of: (a) contacting a substrate with an aqueous solution containing a conditioner 18 including a polymer with a quaternary ammonium group and alkamine at 40-80 °C for 3-10 minutes to form layers of the polymer having a quaternary ammonium group on surfaces of the substrate and sidewalls of the blind vias or the through holes, wherein the polymer with a quaternary ammonium group has a concentration of 0.5-3g/L and the alkamine has a concentration of 10-50 g/L; (b) contacting the substrate with a graphene oxide (GO) solution for 5-10 minutes to bond the GO with the polymer having a quaternary ammonium group, wherein the GO solution has a pH value 3-6, a temperature of 35-80 ° C and a solid content of 0.1-1 g/L; and (c) contacting the substrate with a solution containing a reducing agent at 60-90 0 C for 5-10 minutes to reduce the GO and modify the surfaces of the substrate and the sidewalls of the blind vias or the through holes with the reduced GO (rGO), wherein the solution of the reducing agent has a pH value 3-10 and a concentration of 0.5-2M.

A conditioner for use in a process for grafting graphene oxide (GO) on surfaces of a substrate and sidewalls of high-aspect holes of the substrate, whereby a 19 layer of amino compound can be formed on the surfaces of the substrate and the sidewalls of the holes to chemically bond a layer of GO, the conditioner comprising: deionized water and an amino compound added into the deionized water, wherein the amino compound has a concentration of 0.3 g/L-1g/L.

A conditioner for use in a process for grafting graphene oxide (GO) on surfaces of a substrate and sidewalls of high-aspect holes of the substrate, whereby a layer of quaternary ammonium group can be formed on the surfaces of the substrate and the sidewalls of the holes to chemically bond a layer of GO, the conditioner comprising: deionized water and an polymer having a quaternary ammonium group and alkamine added into the deionized water, wherein the polymer having a quaternary ammonium group has a concentration of 0.5 g/L-1g/L and the alkamine has a concentration of 10-50 g/L.

A method for modifying surfaces of a substrate and sidewalls of high aspect holes of the substrate with reduced graphene oxide (rGO), the method comprising steps of: (a) contacting a substrate with an aqueous solution of a conditioner including an amino compound at 40-80 ° C for 3-10 minutes to form layers of the amino compound on surfaces of the substrate and sidewalls of the holes, wherein the amino compound has a concentration of 0.1-3g/L; (b) contacting the substrate with a graphene oxide (GO) solution for 5-10 minutes to bond the GO with the amino compound, wherein the GO solution has a pH value 3-6, a temperature of 35-80 ° C and a solid content of 0.1-1g/L; and (c) contacting the substrate with a solution containing a reducing agent at 60-90 C for 5-10 minutes to reduce the GO and modify the surfaces of the substrate with the reduced GO (rGO), wherein the solution containing the reducing agent has a pH value 3-10 and a concentration of 0.5-2M.

A method for modifying surfaces of a substrate and sidewalls of blind vias or through holes of the substrate with reduced graphene oxide (rGO), the method comprising steps of: (a) contacting a substrate with an aqueous solution containing a conditioner 18 including a polymer with a quaternary ammonium group and alkamine at 40-80 °C for 3-10 minutes to form layers of the polymer having a quaternary ammonium group on surfaces of the substrate and sidewalls of the blind vias or the through holes, wherein the polymer with a quaternary ammonium group has a concentration of 0.5-3g/L and the alkamine has a concentration of 10-50 g/L; (b) contacting the substrate with a graphene oxide (GO) solution for 5-10 minutes to bond the GO with the polymer having a quaternary ammonium group, wherein the GO solution has a pH value 3-6, a temperature of 35-80 ° C and a solid content of 0.1-1 g/L; and (c) contacting the substrate with a solution containing a reducing agent at 60-90 0 C for 5-10 minutes to reduce the GO and modify the surfaces of the substrate and the sidewalls of the blind vias or the through holes with the reduced GO (rGO), wherein the solution of the reducing agent has a pH value 3-10 and a concentration of 0.5-2M.

A conditioner for use in a process for grafting graphene oxide (GO) on surfaces of a substrate and sidewalls of high-aspect holes of the substrate, whereby a 19 layer of amino compound can be formed on the surfaces of the substrate and the sidewalls of the holes to chemically bond a layer of GO, the conditioner comprising: deionized water and an amino compound added into the deionized water, wherein the amino compound has a concentration of 0.3 g/L-1g/L.

A conditioner for use in a process for grafting graphene oxide (GO) on surfaces of a substrate and sidewalls of high-aspect holes of the substrate, whereby a layer of quaternary ammonium group can be formed on the surfaces of the substrate and the sidewalls of the holes to chemically bond a layer of GO, the conditioner comprising: deionized water and an polymer having a quaternary ammonium group and alkamine added into the deionized water, wherein the polymer having a quaternary ammonium group has a concentration of 0.5 g/L-1g/L and the alkamine has a concentration of 10-50 g/L.

A method for modifying surfaces of a substrate and sidewalls of high aspect holes of the substrate with reduced graphene oxide (rGO), the method comprising steps of: (a) contacting a substrate with an aqueous solution of a conditioner including an amino compound at 40-80 ° C for 3-10 minutes to form layers of the amino compound on surfaces of the substrate and sidewalls of the holes, wherein the amino compound has a concentration of 0.1-3g/L; (b) contacting the substrate with a graphene oxide (GO) solution for 5-10 minutes to bond the GO with the amino compound, wherein the GO solution has a pH value 3-6, a temperature of 35-80 ° C and a solid content of 0.1-1g/L; and (c) contacting the substrate with a solution containing a reducing agent at 60-90 C for 5-10 minutes to reduce the GO and modify the surfaces of the substrate with the reduced GO (rGO), wherein the solution containing the reducing agent has a pH value 3-10 and a concentration of 0.5-2M.

A method for modifying surfaces of a substrate and sidewalls of blind vias or through holes of the substrate with reduced graphene oxide (rGO), the method comprising steps of: (a) contacting a substrate with an aqueous solution containing a conditioner 18 including a polymer with a quaternary ammonium group and alkamine at 40-80 °C for 3-10 minutes to form layers of the polymer having a quaternary ammonium group on surfaces of the substrate and sidewalls of the blind vias or the through holes, wherein the polymer with a quaternary ammonium group has a concentration of 0.5-3g/L and the alkamine has a concentration of 10-50 g/L; (b) contacting the substrate with a graphene oxide (GO) solution for 5-10 minutes to bond the GO with the polymer having a quaternary ammonium group, wherein the GO solution has a pH value 3-6, a temperature of 35-80 ° C and a solid content of 0.1-1 g/L; and (c) contacting the substrate with a solution containing a reducing agent at 60-90 0 C for 5-10 minutes to reduce the GO and modify the surfaces of the substrate and the sidewalls of the blind vias or the through holes with the reduced GO (rGO), wherein the solution of the reducing agent has a pH value 3-10 and a concentration of 0.5-2M.

A conditioner for use in a process for grafting graphene oxide (GO) on surfaces of a substrate and sidewalls of high-aspect holes of the substrate, whereby a 19 layer of amino compound can be formed on the surfaces of the substrate and the sidewalls of the holes to chemically bond a layer of GO, the conditioner comprising: deionized water and an amino compound added into the deionized water, wherein the amino compound has a concentration of 0.3 g/L-1g/L.

A conditioner for use in a process for grafting graphene oxide (GO) on surfaces of a substrate and sidewalls of high-aspect holes of the substrate, whereby a layer of quaternary ammonium group can be formed on the surfaces of the substrate and the sidewalls of the holes to chemically bond a layer of GO, the conditioner comprising: deionized water and an polymer having a quaternary ammonium group and alkamine added into the deionized water, wherein the polymer having a quaternary ammonium group has a concentration of 0.5 g/L-1g/L and the alkamine has a concentration of 10-50 g/L.

A method for modifying surfaces of a substrate and sidewalls of high aspect holes of the substrate with reduced graphene oxide (rGO), the method comprising steps of: (a) contacting a substrate with an aqueous solution of a conditioner including an amino compound at 40-80 ° C for 3-10 minutes to form layers of the amino compound on surfaces of the substrate and sidewalls of the holes, wherein the amino compound has a concentration of 0.1-3g/L; (b) contacting the substrate with a graphene oxide (GO) solution for 5-10 minutes to bond the GO with the amino compound, wherein the GO solution has a pH value 3-6, a temperature of 35-80 ° C and a solid content of 0.1-1g/L; and (c) contacting the substrate with a solution containing a reducing agent at 60-90 C for 5-10 minutes to reduce the GO and modify the surfaces of the substrate with the reduced GO (rGO), wherein the solution containing the reducing agent has a pH value 3-10 and a concentration of 0.5-2M.

A method for modifying surfaces of a substrate and sidewalls of blind vias or through holes of the substrate with reduced graphene oxide (rGO), the method comprising steps of: (a) contacting a substrate with an aqueous solution containing a conditioner 18 including a polymer with a quaternary ammonium group and alkamine at 40-80 °C for 3-10 minutes to form layers of the polymer having a quaternary ammonium group on surfaces of the substrate and sidewalls of the blind vias or the through holes, wherein the polymer with a quaternary ammonium group has a concentration of 0.5-3g/L and the alkamine has a concentration of 10-50 g/L; (b) contacting the substrate with a graphene oxide (GO) solution for 5-10 minutes to bond the GO with the polymer having a quaternary ammonium group, wherein the GO solution has a pH value 3-6, a temperature of 35-80 ° C and a solid content of 0.1-1 g/L; and (c) contacting the substrate with a solution containing a reducing agent at 60-90 0 C for 5-10 minutes to reduce the GO and modify the surfaces of the substrate and the sidewalls of the blind vias or the through holes with the reduced GO (rGO), wherein the solution of the reducing agent has a pH value 3-10 and a concentration of 0.5-2M.

A conditioner for use in a process for grafting graphene oxide (GO) on surfaces of a substrate and sidewalls of high-aspect holes of the substrate, whereby a 19 layer of amino compound can be formed on the surfaces of the substrate and the sidewalls of the holes to chemically bond a layer of GO, the conditioner comprising: deionized water and an amino compound added into the deionized water, wherein the amino compound has a concentration of 0.3 g/L-1g/L.

A conditioner for use in a process for grafting graphene oxide (GO) on surfaces of a substrate and sidewalls of high-aspect holes of the substrate, whereby a layer of quaternary ammonium group can be formed on the surfaces of the substrate and the sidewalls of the holes to chemically bond a layer of GO, the conditioner comprising: deionized water and an polymer having a quaternary ammonium group and alkamine added into the deionized water, wherein the polymer having a quaternary ammonium group has a concentration of 0.5 g/L-1g/L and the alkamine has a concentration of 10-50 g/L.