Patent
US 10,815,565carbon source
growth inhibitor containing oxygen
passivation layer
hexagonal boron nitride
h-BN
hexagonal boron nitride carbide
h-BNC
hydrocarbon gas
oxygen gas
O₂
silicon
Si
silicon oxide
SiO₂
FIG. 5 is a picture showing the graphene thin film synthesized on the quartz substrate of Example 1. [0026] FIG 6A is an XPS graph of the graphene thin film …
| 5–1000000 nm |
| — |
Duration | 1–30 minutes | — |
— | 0.00001 eV | — |
Thickness | ≤ 5 nm | — |
Thickness | ≥ 0.33 nm | — |
carbon source
growth inhibitor containing oxygen
passivation layer
hexagonal boron nitride
h-BN
hexagonal boron nitride carbide
h-BNC
hydrocarbon gas
oxygen gas
O₂
silicon
Si
silicon oxide
SiO₂
FIG. 5 is a picture showing the graphene thin film synthesized on the quartz substrate of Example 1. [0026] FIG 6A is an XPS graph of the graphene thin film …
| 5–1000000 nm |
| — |
Duration | 1–30 minutes | — |
— | 0.00001 eV | — |
Thickness | ≤ 5 nm | — |
Thickness | ≥ 0.33 nm | — |
carbon source
growth inhibitor containing oxygen
passivation layer
hexagonal boron nitride
h-BN
hexagonal boron nitride carbide
h-BNC
hydrocarbon gas
oxygen gas
O₂
silicon
Si
silicon oxide
SiO₂
FIG. 5 is a picture showing the graphene thin film synthesized on the quartz substrate of Example 1. [0026] FIG 6A is an XPS graph of the graphene thin film …
| 5–1000000 nm |
| — |
Duration | 1–30 minutes | — |
— | 0.00001 eV | — |
Thickness | ≤ 5 nm | — |
Thickness | ≥ 0.33 nm | — |
carbon source
growth inhibitor containing oxygen
passivation layer
hexagonal boron nitride
h-BN
hexagonal boron nitride carbide
h-BNC
hydrocarbon gas
oxygen gas
O₂
silicon
Si
silicon oxide
SiO₂
FIG. 5 is a picture showing the graphene thin film synthesized on the quartz substrate of Example 1. [0026] FIG 6A is an XPS graph of the graphene thin film …
| 5–1000000 nm |
| — |
Duration | 1–30 minutes | — |
— | 0.00001 eV | — |
Thickness | ≤ 5 nm | — |
Thickness | ≥ 0.33 nm | — |