Research paper
Experimental GrowthExperimental CharacterizationEach sample groups how it was prepared, characterized, and measured. Click a card to expand.
2 preparations2 characterizations1 property3 figures
2 preparations2 characterizations1 property3 figures
2 preparations2 characterizations1 property3 figures
2 preparations2 characterizations2 properties3 figures
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Fet Sheet Resistance | ZrN buffer layer resistance | 8ohm/sq | — | |||
| Fet Carrier Concentration | expected Si doping concentration | 1000000000000000000cm⁻³ | — | |||
| Fet Carrier Concentration | expected Mg doping concentration | 2500000000000000000cm⁻³ | — | |||
| Substrate Thickness | GaN:Si segment length | 620nm | — | |||
| Substrate Thickness | GaN:Mg segment length | 350nm | — |
Related documents with shared materials, methods, properties, or citations.
Active nitrogen flux measurement during GaN growth based on the transmitted signal detected with a pyrometer
kV-Class Lateral NiOx/GaN Super-Heterojunction Diode via Ammonia Molecular Beam Epitaxy (NH3-MBE)
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Each sample groups how it was prepared, characterized, and measured. Click a card to expand.
2 preparations2 characterizations1 property3 figures
2 preparations2 characterizations1 property3 figures
2 preparations2 characterizations1 property3 figures
2 preparations2 characterizations2 properties3 figures
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Fet Sheet Resistance | ZrN buffer layer resistance | 8ohm/sq | — | |||
| Fet Carrier Concentration | expected Si doping concentration | 1000000000000000000cm⁻³ | — | |||
| Fet Carrier Concentration | expected Mg doping concentration | 2500000000000000000cm⁻³ | — | |||
| Substrate Thickness | GaN:Si segment length | 620nm | — | |||
| Substrate Thickness | GaN:Mg segment length | 350nm | — |
Related documents with shared materials, methods, properties, or citations.
Active nitrogen flux measurement during GaN growth based on the transmitted signal detected with a pyrometer
kV-Class Lateral NiOx/GaN Super-Heterojunction Diode via Ammonia Molecular Beam Epitaxy (NH3-MBE)
Comparison of reverse current mechanisms in GaN Schottky diodes grown on sapphire versus ammonothermal GaN substrates
Dependence of the Mn sticking coefficient on Ga-rich, N-rich, and Ga/N-flux-free conditions in GaN grown by plasma-assisted molecular beam epitaxy
Electrically tunable Floquet Weyl photon emission from Dirac semimetal Cd3As2
Spin Hall magnetoresistance in Pt/(Ga,Mn)N devices
DOUBLE-LAYER GRAPHENE OPTICAL MODULATORS AND METHODS OF FABRICATION THEREOF
Momentum-resolved electronic structures and strong electronic correlations in graphene-like nitride superconductors
Cavity Plasmon: Enhanced Luminescence Effect on InGaN Light Emitting Diodes
Near-surface InAs 2DEG on a GaAs substrate: characterization and superconducting proximity effect
Initial demonstration of AlGaAs-GaAsP-β-Ga2O3 n-p-n double heterojunctions
Each sample groups how it was prepared, characterized, and measured. Click a card to expand.
2 preparations2 characterizations1 property3 figures
2 preparations2 characterizations1 property3 figures
2 preparations2 characterizations1 property3 figures
2 preparations2 characterizations2 properties3 figures
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Fet Sheet Resistance | ZrN buffer layer resistance | 8ohm/sq | — | |||
| Fet Carrier Concentration | expected Si doping concentration | 1000000000000000000cm⁻³ | — | |||
| Fet Carrier Concentration | expected Mg doping concentration | 2500000000000000000cm⁻³ | — | |||
| Substrate Thickness | GaN:Si segment length | 620nm | — | |||
| Substrate Thickness | GaN:Mg segment length | 350nm | — |
Related documents with shared materials, methods, properties, or citations.
Active nitrogen flux measurement during GaN growth based on the transmitted signal detected with a pyrometer
kV-Class Lateral NiOx/GaN Super-Heterojunction Diode via Ammonia Molecular Beam Epitaxy (NH3-MBE)
Comparison of reverse current mechanisms in GaN Schottky diodes grown on sapphire versus ammonothermal GaN substrates
Dependence of the Mn sticking coefficient on Ga-rich, N-rich, and Ga/N-flux-free conditions in GaN grown by plasma-assisted molecular beam epitaxy
Electrically tunable Floquet Weyl photon emission from Dirac semimetal Cd3As2
Spin Hall magnetoresistance in Pt/(Ga,Mn)N devices
DOUBLE-LAYER GRAPHENE OPTICAL MODULATORS AND METHODS OF FABRICATION THEREOF
Momentum-resolved electronic structures and strong electronic correlations in graphene-like nitride superconductors
Cavity Plasmon: Enhanced Luminescence Effect on InGaN Light Emitting Diodes
Near-surface InAs 2DEG on a GaAs substrate: characterization and superconducting proximity effect
Initial demonstration of AlGaAs-GaAsP-β-Ga2O3 n-p-n double heterojunctions
Each sample groups how it was prepared, characterized, and measured. Click a card to expand.
2 preparations2 characterizations1 property3 figures
2 preparations2 characterizations1 property3 figures
2 preparations2 characterizations1 property3 figures
2 preparations2 characterizations2 properties3 figures
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Fet Sheet Resistance | ZrN buffer layer resistance | 8ohm/sq | — | |||
| Fet Carrier Concentration | expected Si doping concentration | 1000000000000000000cm⁻³ | — | |||
| Fet Carrier Concentration | expected Mg doping concentration | 2500000000000000000cm⁻³ | — | |||
| Substrate Thickness | GaN:Si segment length | 620nm | — | |||
| Substrate Thickness | GaN:Mg segment length | 350nm | — |
Related documents with shared materials, methods, properties, or citations.
Active nitrogen flux measurement during GaN growth based on the transmitted signal detected with a pyrometer
kV-Class Lateral NiOx/GaN Super-Heterojunction Diode via Ammonia Molecular Beam Epitaxy (NH3-MBE)
Comparison of reverse current mechanisms in GaN Schottky diodes grown on sapphire versus ammonothermal GaN substrates
Dependence of the Mn sticking coefficient on Ga-rich, N-rich, and Ga/N-flux-free conditions in GaN grown by plasma-assisted molecular beam epitaxy
Electrically tunable Floquet Weyl photon emission from Dirac semimetal Cd3As2
Spin Hall magnetoresistance in Pt/(Ga,Mn)N devices
DOUBLE-LAYER GRAPHENE OPTICAL MODULATORS AND METHODS OF FABRICATION THEREOF
Momentum-resolved electronic structures and strong electronic correlations in graphene-like nitride superconductors
Cavity Plasmon: Enhanced Luminescence Effect on InGaN Light Emitting Diodes
Near-surface InAs 2DEG on a GaAs substrate: characterization and superconducting proximity effect
Initial demonstration of AlGaAs-GaAsP-β-Ga2O3 n-p-n double heterojunctions