Research paper
Experimental GrowthExperimental Characterization| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Growth Rate | ALD Al₂O₃ growth rate | 0.13nm/cycle | — | |||
| Substrate Thickness | pillar step height | 15.37nm | — | |||
| Substrate Thickness | residual Al₂O₃ island thickness maximum | 5nm | — | |||
| Flake Size | hBN flake lateral size range | 50-200nm | — | |||
| Thickness | hBN flake thickness range | 1-5monolayers | — | |||
| PL Peak | ZPL | 586nm | — | |||
| PL Peak | PSB | 635nm | — | |||
| PL Peak | PSB | 650nm | — | |||
| PL Peak | ZPL | 579nm | — | |||
| PL Peak | PSB | 622nm | — | |||
| PL Peak | PSB | 632nm | — | |||
| PL Peak | ZPL | 551nm | — | |||
| PL Peak | PSB | 606nm | — | |||
| PL Peak | ZPL | 579nm | — | |||
| Pl Peak Shift | PSB red-shift relative to ZPL | 170meV | — |
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Growth Rate | ALD Al₂O₃ growth rate | 0.13nm/cycle | — | |||
| Substrate Thickness | pillar step height | 15.37nm | — | |||
| Substrate Thickness | residual Al₂O₃ island thickness maximum | 5nm | — | |||
| Flake Size | hBN flake lateral size range | 50-200nm | — | |||
| Thickness | hBN flake thickness range | 1-5monolayers | — | |||
| PL Peak | ZPL | 586nm | — | |||
| PL Peak | PSB | 635nm | — | |||
| PL Peak | PSB | 650nm | — | |||
| PL Peak | ZPL | 579nm | — | |||
| PL Peak | PSB | 622nm | — | |||
| PL Peak | PSB | 632nm | — | |||
| PL Peak | ZPL | 551nm | — | |||
| PL Peak | PSB | 606nm | — | |||
| PL Peak | ZPL | 579nm | — | |||
| Pl Peak Shift | PSB red-shift relative to ZPL | 170meV | — |
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Growth Rate | ALD Al₂O₃ growth rate | 0.13nm/cycle | — | |||
| Substrate Thickness | pillar step height | 15.37nm | — | |||
| Substrate Thickness | residual Al₂O₃ island thickness maximum | 5nm | — | |||
| Flake Size | hBN flake lateral size range | 50-200nm | — | |||
| Thickness | hBN flake thickness range | 1-5monolayers | — | |||
| PL Peak | ZPL | 586nm | — | |||
| PL Peak | PSB | 635nm | — | |||
| PL Peak | PSB | 650nm | — | |||
| PL Peak | ZPL | 579nm | — | |||
| PL Peak | PSB | 622nm | — | |||
| PL Peak | PSB | 632nm | — | |||
| PL Peak | ZPL | 551nm | — | |||
| PL Peak | PSB | 606nm | — | |||
| PL Peak | ZPL | 579nm | — | |||
| Pl Peak Shift | PSB red-shift relative to ZPL | 170meV | — |
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Growth Rate | ALD Al₂O₃ growth rate | 0.13nm/cycle | — | |||
| Substrate Thickness | pillar step height | 15.37nm | — | |||
| Substrate Thickness | residual Al₂O₃ island thickness maximum | 5nm | — | |||
| Flake Size | hBN flake lateral size range | 50-200nm | — | |||
| Thickness | hBN flake thickness range | 1-5monolayers | — | |||
| PL Peak | ZPL | 586nm | — | |||
| PL Peak | PSB | 635nm | — | |||
| PL Peak | PSB | 650nm | — | |||
| PL Peak | ZPL | 579nm | — | |||
| PL Peak | PSB | 622nm | — | |||
| PL Peak | PSB | 632nm | — | |||
| PL Peak | ZPL | 551nm | — | |||
| PL Peak | PSB | 606nm | — | |||
| PL Peak | ZPL | 579nm | — | |||
| Pl Peak Shift | PSB red-shift relative to ZPL | 170meV | — |