Patent
US 10,168,297insulator thin-film
gold
Au
chromium
Cr
silicon dioxide
SiO₂
silicon (p-doped or n-doped)
Si
hole mobility (claimed range, claim 20 variant) | 1600–5000 cm2/V-s | clean graphene |
Thickness | 10–1000 nm | — |
Thickness | 0.1–1 mm | — |
Thickness | ≥ 400 nm | — |
insulator thin-film
gold
Au
chromium
Cr
silicon dioxide
SiO₂
silicon (p-doped or n-doped)
Si
hole mobility (claimed range, claim 20 variant) | 1600–5000 cm2/V-s | clean graphene |
Thickness | 10–1000 nm | — |
Thickness | 0.1–1 mm | — |
Thickness | ≥ 400 nm | — |
insulator thin-film
gold
Au
chromium
Cr
silicon dioxide
SiO₂
silicon (p-doped or n-doped)
Si
hole mobility (claimed range, claim 20 variant) | 1600–5000 cm2/V-s | clean graphene |
Thickness | 10–1000 nm | — |
Thickness | 0.1–1 mm | — |
Thickness | ≥ 400 nm | — |
insulator thin-film
gold
Au
chromium
Cr
silicon dioxide
SiO₂
silicon (p-doped or n-doped)
Si
hole mobility (claimed range, claim 20 variant) | 1600–5000 cm2/V-s | clean graphene |
Thickness | 10–1000 nm | — |
Thickness | 0.1–1 mm | — |
Thickness | ≥ 400 nm | — |