Research paper
Experimental GrowthExperimental CharacterizationComputational DFT| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Substrate Thickness | film thickness | 34nm | — | |||
| Substrate Thickness | film thickness | 81nm | — | |||
| Substrate Thickness | film thickness | 130nm | — | |||
| Substrate Thickness | film thickness | 150nm | — | |||
| Substrate Thickness | film thickness | 242nm | — | |||
| Substrate Thickness | film thickness | 326nm | — | |||
| Xrd Peak Two Theta | (004) | 27.5deg | RF-sputtered WSe₂ thin film sample with thickness 34 nm.RF-sputtered WSe₂ thin film sample with thickness 81 nm.RF-sputtered WSe₂ thin film sample with thickness 130 nm.RF-sputtered WSe₂ thin film sample with thickness 150 nm.RF-sputtered WSe₂ thin film sample with thickness 242 nm.RF-sputtered WSe₂ thin film sample with thickness 326 nm. | — | ||
| Optical Band Gap | band gap | 1.4eV | — | — | — |
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Substrate Thickness | film thickness | 34nm | — | |||
| Substrate Thickness | film thickness | 81nm | — | |||
| Substrate Thickness | film thickness | 130nm | — | |||
| Substrate Thickness | film thickness | 150nm | — | |||
| Substrate Thickness | film thickness | 242nm | — | |||
| Substrate Thickness | film thickness | 326nm | — | |||
| Xrd Peak Two Theta | (004) | 27.5deg | RF-sputtered WSe₂ thin film sample with thickness 34 nm.RF-sputtered WSe₂ thin film sample with thickness 81 nm.RF-sputtered WSe₂ thin film sample with thickness 130 nm.RF-sputtered WSe₂ thin film sample with thickness 150 nm.RF-sputtered WSe₂ thin film sample with thickness 242 nm.RF-sputtered WSe₂ thin film sample with thickness 326 nm. | — | ||
| Optical Band Gap | band gap | 1.4eV | — | — | — |
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Substrate Thickness | film thickness | 34nm | — | |||
| Substrate Thickness | film thickness | 81nm | — | |||
| Substrate Thickness | film thickness | 130nm | — | |||
| Substrate Thickness | film thickness | 150nm | — | |||
| Substrate Thickness | film thickness | 242nm | — | |||
| Substrate Thickness | film thickness | 326nm | — | |||
| Xrd Peak Two Theta | (004) | 27.5deg | RF-sputtered WSe₂ thin film sample with thickness 34 nm.RF-sputtered WSe₂ thin film sample with thickness 81 nm.RF-sputtered WSe₂ thin film sample with thickness 130 nm.RF-sputtered WSe₂ thin film sample with thickness 150 nm.RF-sputtered WSe₂ thin film sample with thickness 242 nm.RF-sputtered WSe₂ thin film sample with thickness 326 nm. | — | ||
| Optical Band Gap | band gap | 1.4eV | — | — | — |
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Substrate Thickness | film thickness | 34nm | — | |||
| Substrate Thickness | film thickness | 81nm | — | |||
| Substrate Thickness | film thickness | 130nm | — | |||
| Substrate Thickness | film thickness | 150nm | — | |||
| Substrate Thickness | film thickness | 242nm | — | |||
| Substrate Thickness | film thickness | 326nm | — | |||
| Xrd Peak Two Theta | (004) | 27.5deg | RF-sputtered WSe₂ thin film sample with thickness 34 nm.RF-sputtered WSe₂ thin film sample with thickness 81 nm.RF-sputtered WSe₂ thin film sample with thickness 130 nm.RF-sputtered WSe₂ thin film sample with thickness 150 nm.RF-sputtered WSe₂ thin film sample with thickness 242 nm.RF-sputtered WSe₂ thin film sample with thickness 326 nm. | — | ||
| Optical Band Gap | band gap | 1.4eV | — | — | — |
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