Research paper
Experimental CharacterizationEach sample groups how it was prepared, characterized, and measured. Click a card to expand.
1 preparation1 characterization1 property2 figures
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Substrate Thickness | thickness | 350um | — | |||
| Xrd Lattice Constant A | lattice constant a | 3.189Å | — | — | — | — |
| Xrd Unit Cell Volume | unit cell volume | 45.67Å3 | — | — | — | — |
| Xrd Space Group | space group | P6₃mc | — | — | — | — |
Related documents with shared materials, methods, properties, or citations.
Comprehensive determination of Burgers vectors of threading dislocations in GaN substrates by combining reflection and transmission synchrotron-radiation x-ray topography
MANUFACTURING METHOD OF GAN THIN FILM TEMPLATE SUBSTRATE, GAN THIN FILM TEMPLATE SUBSTRATE AND GAN THICK FILM SINGLE CRYSTAL
GALLIUM NITRIDE-BASED SINTERED COMPACT AND METHOD FOR MANUFACTURING SAME
n-TYPE GaN CRYSTAL, GaN WAFER, AND GaN CRYSTAL, GaN WAFER AND NITRIDE SEMICONDUCTOR DEVICE PRODUCTION METHOD
Elastic modeling and total energy calculations of the structural characteristics of ‘free-standing’, periodic, pseudomorphic GaN/AlN superlattices
Fundamentals of the metal contact to p-type GaN – new multilayer design
Three-dimensional visualization of threading dislocation in GaN by polarized-light microscopy
Design of high-mobility p-type GaN via the piezomobility tensor
Electric-field effects on defect migration energetics in GaN
SUBSTRATE FOR THE EPITAXIAL GROWTH OF GALLIUM NITRIDE
NON-POLAR OR SEMI-POLAR GaN WAFER
GALLIUM NITRIDE-BASED SINTERED BODY AND METHOD FOR MANUFACTURING SAME
Each sample groups how it was prepared, characterized, and measured. Click a card to expand.
1 preparation1 characterization1 property2 figures
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Substrate Thickness | thickness | 350um | — | |||
| Xrd Lattice Constant A | lattice constant a | 3.189Å | — | — | — | — |
| Xrd Unit Cell Volume | unit cell volume | 45.67Å3 | — | — | — | — |
| Xrd Space Group | space group | P6₃mc | — | — | — | — |
Related documents with shared materials, methods, properties, or citations.
Comprehensive determination of Burgers vectors of threading dislocations in GaN substrates by combining reflection and transmission synchrotron-radiation x-ray topography
MANUFACTURING METHOD OF GAN THIN FILM TEMPLATE SUBSTRATE, GAN THIN FILM TEMPLATE SUBSTRATE AND GAN THICK FILM SINGLE CRYSTAL
GALLIUM NITRIDE-BASED SINTERED COMPACT AND METHOD FOR MANUFACTURING SAME
n-TYPE GaN CRYSTAL, GaN WAFER, AND GaN CRYSTAL, GaN WAFER AND NITRIDE SEMICONDUCTOR DEVICE PRODUCTION METHOD
Elastic modeling and total energy calculations of the structural characteristics of ‘free-standing’, periodic, pseudomorphic GaN/AlN superlattices
Fundamentals of the metal contact to p-type GaN – new multilayer design
Three-dimensional visualization of threading dislocation in GaN by polarized-light microscopy
Design of high-mobility p-type GaN via the piezomobility tensor
Electric-field effects on defect migration energetics in GaN
SUBSTRATE FOR THE EPITAXIAL GROWTH OF GALLIUM NITRIDE
NON-POLAR OR SEMI-POLAR GaN WAFER
GALLIUM NITRIDE-BASED SINTERED BODY AND METHOD FOR MANUFACTURING SAME
Each sample groups how it was prepared, characterized, and measured. Click a card to expand.
1 preparation1 characterization1 property2 figures
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Substrate Thickness | thickness | 350um | — | |||
| Xrd Lattice Constant A | lattice constant a | 3.189Å | — | — | — | — |
| Xrd Unit Cell Volume | unit cell volume | 45.67Å3 | — | — | — | — |
| Xrd Space Group | space group | P6₃mc | — | — | — | — |
Related documents with shared materials, methods, properties, or citations.
Comprehensive determination of Burgers vectors of threading dislocations in GaN substrates by combining reflection and transmission synchrotron-radiation x-ray topography
MANUFACTURING METHOD OF GAN THIN FILM TEMPLATE SUBSTRATE, GAN THIN FILM TEMPLATE SUBSTRATE AND GAN THICK FILM SINGLE CRYSTAL
GALLIUM NITRIDE-BASED SINTERED COMPACT AND METHOD FOR MANUFACTURING SAME
n-TYPE GaN CRYSTAL, GaN WAFER, AND GaN CRYSTAL, GaN WAFER AND NITRIDE SEMICONDUCTOR DEVICE PRODUCTION METHOD
Elastic modeling and total energy calculations of the structural characteristics of ‘free-standing’, periodic, pseudomorphic GaN/AlN superlattices
Fundamentals of the metal contact to p-type GaN – new multilayer design
Three-dimensional visualization of threading dislocation in GaN by polarized-light microscopy
Design of high-mobility p-type GaN via the piezomobility tensor
Electric-field effects on defect migration energetics in GaN
SUBSTRATE FOR THE EPITAXIAL GROWTH OF GALLIUM NITRIDE
NON-POLAR OR SEMI-POLAR GaN WAFER
GALLIUM NITRIDE-BASED SINTERED BODY AND METHOD FOR MANUFACTURING SAME
Each sample groups how it was prepared, characterized, and measured. Click a card to expand.
1 preparation1 characterization1 property2 figures
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Substrate Thickness | thickness | 350um | — | |||
| Xrd Lattice Constant A | lattice constant a | 3.189Å | — | — | — | — |
| Xrd Unit Cell Volume | unit cell volume | 45.67Å3 | — | — | — | — |
| Xrd Space Group | space group | P6₃mc | — | — | — | — |
Related documents with shared materials, methods, properties, or citations.
Comprehensive determination of Burgers vectors of threading dislocations in GaN substrates by combining reflection and transmission synchrotron-radiation x-ray topography
MANUFACTURING METHOD OF GAN THIN FILM TEMPLATE SUBSTRATE, GAN THIN FILM TEMPLATE SUBSTRATE AND GAN THICK FILM SINGLE CRYSTAL
GALLIUM NITRIDE-BASED SINTERED COMPACT AND METHOD FOR MANUFACTURING SAME
n-TYPE GaN CRYSTAL, GaN WAFER, AND GaN CRYSTAL, GaN WAFER AND NITRIDE SEMICONDUCTOR DEVICE PRODUCTION METHOD
Elastic modeling and total energy calculations of the structural characteristics of ‘free-standing’, periodic, pseudomorphic GaN/AlN superlattices
Fundamentals of the metal contact to p-type GaN – new multilayer design
Three-dimensional visualization of threading dislocation in GaN by polarized-light microscopy
Design of high-mobility p-type GaN via the piezomobility tensor
Electric-field effects on defect migration energetics in GaN
SUBSTRATE FOR THE EPITAXIAL GROWTH OF GALLIUM NITRIDE
NON-POLAR OR SEMI-POLAR GaN WAFER
GALLIUM NITRIDE-BASED SINTERED BODY AND METHOD FOR MANUFACTURING SAME