Patent
US 8,593,180NDR device-back-gate configuration
NDR device-front-gate configuration
aluminum oxide
Al₂O₃
hafnium oxide
HfO₂
silicon oxide
SiO₂
yttrium oxide
Y₂O₃
zirconium oxide
ZrO₂
SrO
CaO
HfSiO₄
ZrSiO₄
SiC
Figure 4 provides a graph illustrating characteristics of the NDR device 110, according to an exemplary aspect of the present invention;
Figure 7 provides a graph illustrating the negative differential resistance behavior of the 25 NDR device 110, according to an exemplary aspect of the present invention;
Figure 8 illustrates output conductance, g DS, (e.g., m o deled o utput co ndu c tance) a s a function of drain voltage, VDS, for different gate voltages (e.g., VG = OV, I V, 2V, 3V and 4V), assuming amin/K = 0.5, in the NDR device 110, according to an exemplary aspect of the present invention; 30
Figure 9 shows the corresponding drain current, ID, as a function of drain voltage, VD S, for different gate voltages (e.g., V G = OV, 1V, 2V, 3V and 4V), in the NDR device 110, according to 4 YO R₉₂₀ 11 0566US 1 an exemplary aspect of the present invention;
Figure 11 illustrates a method 1100 of operating a circuit which includes a negative 5 differential resistance (NDR) device which includes a gate and a graphene channel, and a gate voltage source, according to an exemplary aspect of the present invention.
| — |
Thickness | 4–20 nm | — |
Voltage | 0–10 V | — |
NDR device-back-gate configuration
NDR device-front-gate configuration
aluminum oxide
Al₂O₃
hafnium oxide
HfO₂
silicon oxide
SiO₂
yttrium oxide
Y₂O₃
zirconium oxide
ZrO₂
SrO
CaO
HfSiO₄
ZrSiO₄
SiC
Figure 4 provides a graph illustrating characteristics of the NDR device 110, according to an exemplary aspect of the present invention;
Figure 7 provides a graph illustrating the negative differential resistance behavior of the 25 NDR device 110, according to an exemplary aspect of the present invention;
Figure 8 illustrates output conductance, g DS, (e.g., m o deled o utput co ndu c tance) a s a function of drain voltage, VDS, for different gate voltages (e.g., VG = OV, I V, 2V, 3V and 4V), assuming amin/K = 0.5, in the NDR device 110, according to an exemplary aspect of the present invention; 30
Figure 9 shows the corresponding drain current, ID, as a function of drain voltage, VD S, for different gate voltages (e.g., V G = OV, 1V, 2V, 3V and 4V), in the NDR device 110, according to 4 YO R₉₂₀ 11 0566US 1 an exemplary aspect of the present invention;
Figure 11 illustrates a method 1100 of operating a circuit which includes a negative 5 differential resistance (NDR) device which includes a gate and a graphene channel, and a gate voltage source, according to an exemplary aspect of the present invention.
| — |
Thickness | 4–20 nm | — |
Voltage | 0–10 V | — |
NDR device-back-gate configuration
NDR device-front-gate configuration
aluminum oxide
Al₂O₃
hafnium oxide
HfO₂
silicon oxide
SiO₂
yttrium oxide
Y₂O₃
zirconium oxide
ZrO₂
SrO
CaO
HfSiO₄
ZrSiO₄
SiC
Figure 4 provides a graph illustrating characteristics of the NDR device 110, according to an exemplary aspect of the present invention;
Figure 7 provides a graph illustrating the negative differential resistance behavior of the 25 NDR device 110, according to an exemplary aspect of the present invention;
Figure 8 illustrates output conductance, g DS, (e.g., m o deled o utput co ndu c tance) a s a function of drain voltage, VDS, for different gate voltages (e.g., VG = OV, I V, 2V, 3V and 4V), assuming amin/K = 0.5, in the NDR device 110, according to an exemplary aspect of the present invention; 30
Figure 9 shows the corresponding drain current, ID, as a function of drain voltage, VD S, for different gate voltages (e.g., V G = OV, 1V, 2V, 3V and 4V), in the NDR device 110, according to 4 YO R₉₂₀ 11 0566US 1 an exemplary aspect of the present invention;
Figure 11 illustrates a method 1100 of operating a circuit which includes a negative 5 differential resistance (NDR) device which includes a gate and a graphene channel, and a gate voltage source, according to an exemplary aspect of the present invention.
| — |
Thickness | 4–20 nm | — |
Voltage | 0–10 V | — |
NDR device-back-gate configuration
NDR device-front-gate configuration
aluminum oxide
Al₂O₃
hafnium oxide
HfO₂
silicon oxide
SiO₂
yttrium oxide
Y₂O₃
zirconium oxide
ZrO₂
SrO
CaO
HfSiO₄
ZrSiO₄
SiC
Figure 4 provides a graph illustrating characteristics of the NDR device 110, according to an exemplary aspect of the present invention;
Figure 7 provides a graph illustrating the negative differential resistance behavior of the 25 NDR device 110, according to an exemplary aspect of the present invention;
Figure 8 illustrates output conductance, g DS, (e.g., m o deled o utput co ndu c tance) a s a function of drain voltage, VDS, for different gate voltages (e.g., VG = OV, I V, 2V, 3V and 4V), assuming amin/K = 0.5, in the NDR device 110, according to an exemplary aspect of the present invention; 30
Figure 9 shows the corresponding drain current, ID, as a function of drain voltage, VD S, for different gate voltages (e.g., V G = OV, 1V, 2V, 3V and 4V), in the NDR device 110, according to 4 YO R₉₂₀ 11 0566US 1 an exemplary aspect of the present invention;
Figure 11 illustrates a method 1100 of operating a circuit which includes a negative 5 differential resistance (NDR) device which includes a gate and a graphene channel, and a gate voltage source, according to an exemplary aspect of the present invention.
| — |
Thickness | 4–20 nm | — |
Voltage | 0–10 V | — |