Patent
US 9,252,704aluminum nitride
AlN
N+ doped silicon
silicon oxide
SiO₂
FIG. 3 is a diagrammatic cross-sectional view of the GFET transistor;
FIG. 4 is a graph illustrating the operation of the present invention;
aluminum nitride
AlN
N+ doped silicon
silicon oxide
SiO₂
FIG. 3 is a diagrammatic cross-sectional view of the GFET transistor;
FIG. 4 is a graph illustrating the operation of the present invention;
aluminum nitride
AlN
N+ doped silicon
silicon oxide
SiO₂
FIG. 3 is a diagrammatic cross-sectional view of the GFET transistor;
FIG. 4 is a graph illustrating the operation of the present invention;
aluminum nitride
AlN
N+ doped silicon
silicon oxide
SiO₂
FIG. 3 is a diagrammatic cross-sectional view of the GFET transistor;
FIG. 4 is a graph illustrating the operation of the present invention;