Patent
US 9,331,735SiC substrate
SiC
GaN
| — |
signal loss reduction improvement over prior art | 5x | — |
SNR improvement for same IMR and instantaneous bandwidth | 30 dB | — |
copper metal thickness in true time delay (claimed range) | 6–10 µm | Cu |
— | 1–2 W | — |
SiC substrate
SiC
GaN
| — |
signal loss reduction improvement over prior art | 5x | — |
SNR improvement for same IMR and instantaneous bandwidth | 30 dB | — |
copper metal thickness in true time delay (claimed range) | 6–10 µm | Cu |
— | 1–2 W | — |
SiC substrate
SiC
GaN
| — |
signal loss reduction improvement over prior art | 5x | — |
SNR improvement for same IMR and instantaneous bandwidth | 30 dB | — |
copper metal thickness in true time delay (claimed range) | 6–10 µm | Cu |
— | 1–2 W | — |
SiC substrate
SiC
GaN
| — |
signal loss reduction improvement over prior art | 5x | — |
SNR improvement for same IMR and instantaneous bandwidth | 30 dB | — |
copper metal thickness in true time delay (claimed range) | 6–10 µm | Cu |
— | 1–2 W | — |