Patent
US 9,385,281nickel (Ni)
Ni
FIG. 4 is the SEM photograph of the nickel thin film after the heat treatment according to Example 1.
FIG. 5 is the SEM photograph of the graphene sheet according to Example 1. 10
FIG. 7 is the SEM photograph of a graphene sheet according to Example 2.
FIG. 9 provides sheet resistance measurement results of a graphene sheet according to Example 3.
FIG. 10 provides a graph showing the average grain size change of a nickel thin film depending on heat treatment time under a vacuum and hydrogen 20 atmosphere.
FIG. 11 is the SEM photograph of the cross section of a PMMA layer on a silicon substrate according to Example 4.
FIG. 12 is the SEM photograph of a graphene sheet according to Example 4.
FIG. 13 provides thickness measurements of the graphenes according to Examples 4 to 7.
FIG. 17 is the SEM photograph of the graphene sheet according to Example c. 10
FIG. 18 provides Raman mapping data of the graphene according to Example c.
FIG. 19 is the SEM photograph of the surface of the graphene according to Comparative Example c 1.
FIG. 20 shows the AFM photograph of the surface of the graphene 15 according to Comparative Example c 1.
FIG. 21 provides Raman mapping data of graphene according to Comparative Example c2.
durability and thus was mixed with a hardener (PDMS kit B) and cured without a sol-gel process regardless of its thickness. PDMS (A) and a hardener (PDMS kit B) were mixed in a ratio of 10:1 or 7:3 at most, and crosslinked together. The two materials with high
| ≥ 80 % |
graphene sheet |
sheet resistance (claimed maximum, broad) | ≤ 2000 Ω/square | graphene sheet |
sheet resistance (claimed maximum, narrow) | ≤ 274 Ω/square | graphene sheet |
Thickness | 10–10000000 nm | — |
Thickness | 50–1000000 nm | — |
Thickness | 0–10000000 nm | — |
Thickness | 0–1000000 nm | — |
Thickness | 10–900 nm | — |
Thickness | 30–500 nm | — |
Thickness | 50–500 nm | — |
Thickness | 1–1000000000 nm | — |
Thickness | 1–1000000 nm | — |
Duration | 1–36000 s | — |
Duration | 1–3600 s | — |
Duration | 2–1200 s | — |
Duration | 1–360000 s | — |
Duration | 5–10800 s | — |
Duration | 20–3600 s | — |
Duration | 2–1800 s | — |
Duration | 60–18000 s | — |
Thickness | 0.1–10 nm | — |
Duration | 3–1800 s | — |
Duration | 10–36000 s | — |
Duration | 30–10800 s | — |
Duration | 60–3600 s | — |
Duration | 1–1800 s | — |
Duration | 3–600 s | — |
Duration | 30–18000 s | — |
Duration | 60–10800 s | — |
Duration | 35–10800 s | — |
Duration | 30–5400 s | — |
Duration | 1–7200 s | — |
Duration | 15–3600 s | — |
Duration | 1–20 minutes | — |
Duration | 3–300 s | — |
Duration | 5–3600 s | — |
Duration | 2–600 s | — |
Duration | 30–3600 s | — |
Duration | 1–86400 s | — |
Duration | 1–10800 s | — |
Duration | 2–3600 s | — |
Duration | 10–86400 s | — |
Duration | 1–30 minutes | — |
Thickness | 0.1–100 nm | — |
Duration | 10–3600 s | — |
Duration | 30–7200 s | — |
Thickness | 30–100 nm | — |
Thickness | 0.1–5 nm | — |
Temperature | 10–20 °C | — |
Thickness | 100–1000 cm | — |
Thickness | 10000–100000 cm | — |
Thickness | 50–150 nm | — |
Thickness | 40–50 nm | — |
Thickness | 1–2 nm | — |
Thickness | 1–1640 cm | — |
Thickness | 1–1400 cm | — |
Pressure | 0–9 Torr | — |
Pressure | 0–7 Torr | — |
Thickness | ≤ 0.1 nm | — |
Thickness | ≥ 1 nm | — |
nickel (Ni)
Ni
FIG. 4 is the SEM photograph of the nickel thin film after the heat treatment according to Example 1.
FIG. 5 is the SEM photograph of the graphene sheet according to Example 1. 10
FIG. 7 is the SEM photograph of a graphene sheet according to Example 2.
FIG. 9 provides sheet resistance measurement results of a graphene sheet according to Example 3.
FIG. 10 provides a graph showing the average grain size change of a nickel thin film depending on heat treatment time under a vacuum and hydrogen 20 atmosphere.
FIG. 11 is the SEM photograph of the cross section of a PMMA layer on a silicon substrate according to Example 4.
FIG. 12 is the SEM photograph of a graphene sheet according to Example 4.
FIG. 13 provides thickness measurements of the graphenes according to Examples 4 to 7.
FIG. 17 is the SEM photograph of the graphene sheet according to Example c. 10
FIG. 18 provides Raman mapping data of the graphene according to Example c.
FIG. 19 is the SEM photograph of the surface of the graphene according to Comparative Example c 1.
FIG. 20 shows the AFM photograph of the surface of the graphene 15 according to Comparative Example c 1.
FIG. 21 provides Raman mapping data of graphene according to Comparative Example c2.
durability and thus was mixed with a hardener (PDMS kit B) and cured without a sol-gel process regardless of its thickness. PDMS (A) and a hardener (PDMS kit B) were mixed in a ratio of 10:1 or 7:3 at most, and crosslinked together. The two materials with high
| ≥ 80 % |
graphene sheet |
sheet resistance (claimed maximum, broad) | ≤ 2000 Ω/square | graphene sheet |
sheet resistance (claimed maximum, narrow) | ≤ 274 Ω/square | graphene sheet |
Thickness | 10–10000000 nm | — |
Thickness | 50–1000000 nm | — |
Thickness | 0–10000000 nm | — |
Thickness | 0–1000000 nm | — |
Thickness | 10–900 nm | — |
Thickness | 30–500 nm | — |
Thickness | 50–500 nm | — |
Thickness | 1–1000000000 nm | — |
Thickness | 1–1000000 nm | — |
Duration | 1–36000 s | — |
Duration | 1–3600 s | — |
Duration | 2–1200 s | — |
Duration | 1–360000 s | — |
Duration | 5–10800 s | — |
Duration | 20–3600 s | — |
Duration | 2–1800 s | — |
Duration | 60–18000 s | — |
Thickness | 0.1–10 nm | — |
Duration | 3–1800 s | — |
Duration | 10–36000 s | — |
Duration | 30–10800 s | — |
Duration | 60–3600 s | — |
Duration | 1–1800 s | — |
Duration | 3–600 s | — |
Duration | 30–18000 s | — |
Duration | 60–10800 s | — |
Duration | 35–10800 s | — |
Duration | 30–5400 s | — |
Duration | 1–7200 s | — |
Duration | 15–3600 s | — |
Duration | 1–20 minutes | — |
Duration | 3–300 s | — |
Duration | 5–3600 s | — |
Duration | 2–600 s | — |
Duration | 30–3600 s | — |
Duration | 1–86400 s | — |
Duration | 1–10800 s | — |
Duration | 2–3600 s | — |
Duration | 10–86400 s | — |
Duration | 1–30 minutes | — |
Thickness | 0.1–100 nm | — |
Duration | 10–3600 s | — |
Duration | 30–7200 s | — |
Thickness | 30–100 nm | — |
Thickness | 0.1–5 nm | — |
Temperature | 10–20 °C | — |
Thickness | 100–1000 cm | — |
Thickness | 10000–100000 cm | — |
Thickness | 50–150 nm | — |
Thickness | 40–50 nm | — |
Thickness | 1–2 nm | — |
Thickness | 1–1640 cm | — |
Thickness | 1–1400 cm | — |
Pressure | 0–9 Torr | — |
Pressure | 0–7 Torr | — |
Thickness | ≤ 0.1 nm | — |
Thickness | ≥ 1 nm | — |
nickel (Ni)
Ni
FIG. 4 is the SEM photograph of the nickel thin film after the heat treatment according to Example 1.
FIG. 5 is the SEM photograph of the graphene sheet according to Example 1. 10
FIG. 7 is the SEM photograph of a graphene sheet according to Example 2.
FIG. 9 provides sheet resistance measurement results of a graphene sheet according to Example 3.
FIG. 10 provides a graph showing the average grain size change of a nickel thin film depending on heat treatment time under a vacuum and hydrogen 20 atmosphere.
FIG. 11 is the SEM photograph of the cross section of a PMMA layer on a silicon substrate according to Example 4.
FIG. 12 is the SEM photograph of a graphene sheet according to Example 4.
FIG. 13 provides thickness measurements of the graphenes according to Examples 4 to 7.
FIG. 17 is the SEM photograph of the graphene sheet according to Example c. 10
FIG. 18 provides Raman mapping data of the graphene according to Example c.
FIG. 19 is the SEM photograph of the surface of the graphene according to Comparative Example c 1.
FIG. 20 shows the AFM photograph of the surface of the graphene 15 according to Comparative Example c 1.
FIG. 21 provides Raman mapping data of graphene according to Comparative Example c2.
durability and thus was mixed with a hardener (PDMS kit B) and cured without a sol-gel process regardless of its thickness. PDMS (A) and a hardener (PDMS kit B) were mixed in a ratio of 10:1 or 7:3 at most, and crosslinked together. The two materials with high
| ≥ 80 % |
graphene sheet |
sheet resistance (claimed maximum, broad) | ≤ 2000 Ω/square | graphene sheet |
sheet resistance (claimed maximum, narrow) | ≤ 274 Ω/square | graphene sheet |
Thickness | 10–10000000 nm | — |
Thickness | 50–1000000 nm | — |
Thickness | 0–10000000 nm | — |
Thickness | 0–1000000 nm | — |
Thickness | 10–900 nm | — |
Thickness | 30–500 nm | — |
Thickness | 50–500 nm | — |
Thickness | 1–1000000000 nm | — |
Thickness | 1–1000000 nm | — |
Duration | 1–36000 s | — |
Duration | 1–3600 s | — |
Duration | 2–1200 s | — |
Duration | 1–360000 s | — |
Duration | 5–10800 s | — |
Duration | 20–3600 s | — |
Duration | 2–1800 s | — |
Duration | 60–18000 s | — |
Thickness | 0.1–10 nm | — |
Duration | 3–1800 s | — |
Duration | 10–36000 s | — |
Duration | 30–10800 s | — |
Duration | 60–3600 s | — |
Duration | 1–1800 s | — |
Duration | 3–600 s | — |
Duration | 30–18000 s | — |
Duration | 60–10800 s | — |
Duration | 35–10800 s | — |
Duration | 30–5400 s | — |
Duration | 1–7200 s | — |
Duration | 15–3600 s | — |
Duration | 1–20 minutes | — |
Duration | 3–300 s | — |
Duration | 5–3600 s | — |
Duration | 2–600 s | — |
Duration | 30–3600 s | — |
Duration | 1–86400 s | — |
Duration | 1–10800 s | — |
Duration | 2–3600 s | — |
Duration | 10–86400 s | — |
Duration | 1–30 minutes | — |
Thickness | 0.1–100 nm | — |
Duration | 10–3600 s | — |
Duration | 30–7200 s | — |
Thickness | 30–100 nm | — |
Thickness | 0.1–5 nm | — |
Temperature | 10–20 °C | — |
Thickness | 100–1000 cm | — |
Thickness | 10000–100000 cm | — |
Thickness | 50–150 nm | — |
Thickness | 40–50 nm | — |
Thickness | 1–2 nm | — |
Thickness | 1–1640 cm | — |
Thickness | 1–1400 cm | — |
Pressure | 0–9 Torr | — |
Pressure | 0–7 Torr | — |
Thickness | ≤ 0.1 nm | — |
Thickness | ≥ 1 nm | — |
nickel (Ni)
Ni
FIG. 4 is the SEM photograph of the nickel thin film after the heat treatment according to Example 1.
FIG. 5 is the SEM photograph of the graphene sheet according to Example 1. 10
FIG. 7 is the SEM photograph of a graphene sheet according to Example 2.
FIG. 9 provides sheet resistance measurement results of a graphene sheet according to Example 3.
FIG. 10 provides a graph showing the average grain size change of a nickel thin film depending on heat treatment time under a vacuum and hydrogen 20 atmosphere.
FIG. 11 is the SEM photograph of the cross section of a PMMA layer on a silicon substrate according to Example 4.
FIG. 12 is the SEM photograph of a graphene sheet according to Example 4.
FIG. 13 provides thickness measurements of the graphenes according to Examples 4 to 7.
FIG. 17 is the SEM photograph of the graphene sheet according to Example c. 10
FIG. 18 provides Raman mapping data of the graphene according to Example c.
FIG. 19 is the SEM photograph of the surface of the graphene according to Comparative Example c 1.
FIG. 20 shows the AFM photograph of the surface of the graphene 15 according to Comparative Example c 1.
FIG. 21 provides Raman mapping data of graphene according to Comparative Example c2.
durability and thus was mixed with a hardener (PDMS kit B) and cured without a sol-gel process regardless of its thickness. PDMS (A) and a hardener (PDMS kit B) were mixed in a ratio of 10:1 or 7:3 at most, and crosslinked together. The two materials with high
| ≥ 80 % |
graphene sheet |
sheet resistance (claimed maximum, broad) | ≤ 2000 Ω/square | graphene sheet |
sheet resistance (claimed maximum, narrow) | ≤ 274 Ω/square | graphene sheet |
Thickness | 10–10000000 nm | — |
Thickness | 50–1000000 nm | — |
Thickness | 0–10000000 nm | — |
Thickness | 0–1000000 nm | — |
Thickness | 10–900 nm | — |
Thickness | 30–500 nm | — |
Thickness | 50–500 nm | — |
Thickness | 1–1000000000 nm | — |
Thickness | 1–1000000 nm | — |
Duration | 1–36000 s | — |
Duration | 1–3600 s | — |
Duration | 2–1200 s | — |
Duration | 1–360000 s | — |
Duration | 5–10800 s | — |
Duration | 20–3600 s | — |
Duration | 2–1800 s | — |
Duration | 60–18000 s | — |
Thickness | 0.1–10 nm | — |
Duration | 3–1800 s | — |
Duration | 10–36000 s | — |
Duration | 30–10800 s | — |
Duration | 60–3600 s | — |
Duration | 1–1800 s | — |
Duration | 3–600 s | — |
Duration | 30–18000 s | — |
Duration | 60–10800 s | — |
Duration | 35–10800 s | — |
Duration | 30–5400 s | — |
Duration | 1–7200 s | — |
Duration | 15–3600 s | — |
Duration | 1–20 minutes | — |
Duration | 3–300 s | — |
Duration | 5–3600 s | — |
Duration | 2–600 s | — |
Duration | 30–3600 s | — |
Duration | 1–86400 s | — |
Duration | 1–10800 s | — |
Duration | 2–3600 s | — |
Duration | 10–86400 s | — |
Duration | 1–30 minutes | — |
Thickness | 0.1–100 nm | — |
Duration | 10–3600 s | — |
Duration | 30–7200 s | — |
Thickness | 30–100 nm | — |
Thickness | 0.1–5 nm | — |
Temperature | 10–20 °C | — |
Thickness | 100–1000 cm | — |
Thickness | 10000–100000 cm | — |
Thickness | 50–150 nm | — |
Thickness | 40–50 nm | — |
Thickness | 1–2 nm | — |
Thickness | 1–1640 cm | — |
Thickness | 1–1400 cm | — |
Pressure | 0–9 Torr | — |
Pressure | 0–7 Torr | — |
Thickness | ≤ 0.1 nm | — |
Thickness | ≥ 1 nm | — |