A package structure of a common-source common-gate gallium nitride field-effect transistor, comprising: a lead frame; a gallium nitride field-effect transistor, comprising a first matrix directly disposed on the lead frame, wherein a first drain, a first gate, and a first source are disposed on a surface side of the first matrix, and the first drain and the first gate are separately electrically connected to the lead frame; and a metal oxide semiconductor, comprising a second matrix directly disposed on the lead frame, wherein a second drain, a second gate, and a second source are disposed on a surface side of the second matrix, and the second drain is directly electrically connected to the first source, and the second gate and the second source are separately electrically connected to the lead frame.
The package structure of the common-source common-gate gallium nitride field-effect transistor according to claim 1, wherein a package body covers the lead frame, the gallium nitride field-effect transistor, and the metal oxide semiconductor.
Device structures
Layer stacks claimed or described, ordered top of device to substrate.
package structure of common-source common-gate gallium nitride field-effect transistor
metal oxide semiconductorhorizontal MOS second matrix (with second drain, second gate, second source on surface side)
GaNGaN FET first matrix (with first drain, first gate, first source on surface side)
lead framelead frame
Materials
Materials described outside the worked examples.
gallium nitride
GaN
Transistor Channel/Matrix Material For GaN FET
metal oxide semiconductor
Horizontal MOS Transistor Matrix Material
Why these are connected
Related documents with shared materials, methods, properties, or citations.
A package structure of a common-source common-gate gallium nitride field-effect transistor, comprising: a lead frame; a gallium nitride field-effect transistor, comprising a first matrix directly disposed on the lead frame, wherein a first drain, a first gate, and a first source are disposed on a surface side of the first matrix, and the first drain and the first gate are separately electrically connected to the lead frame; and a metal oxide semiconductor, comprising a second matrix directly disposed on the lead frame, wherein a second drain, a second gate, and a second source are disposed on a surface side of the second matrix, and the second drain is directly electrically connected to the first source, and the second gate and the second source are separately electrically connected to the lead frame.
The package structure of the common-source common-gate gallium nitride field-effect transistor according to claim 1, wherein a package body covers the lead frame, the gallium nitride field-effect transistor, and the metal oxide semiconductor.
Device structures
Layer stacks claimed or described, ordered top of device to substrate.
package structure of common-source common-gate gallium nitride field-effect transistor
metal oxide semiconductorhorizontal MOS second matrix (with second drain, second gate, second source on surface side)
GaNGaN FET first matrix (with first drain, first gate, first source on surface side)
lead framelead frame
Materials
Materials described outside the worked examples.
gallium nitride
GaN
Transistor Channel/Matrix Material For GaN FET
metal oxide semiconductor
Horizontal MOS Transistor Matrix Material
Why these are connected
Related documents with shared materials, methods, properties, or citations.
A package structure of a common-source common-gate gallium nitride field-effect transistor, comprising: a lead frame; a gallium nitride field-effect transistor, comprising a first matrix directly disposed on the lead frame, wherein a first drain, a first gate, and a first source are disposed on a surface side of the first matrix, and the first drain and the first gate are separately electrically connected to the lead frame; and a metal oxide semiconductor, comprising a second matrix directly disposed on the lead frame, wherein a second drain, a second gate, and a second source are disposed on a surface side of the second matrix, and the second drain is directly electrically connected to the first source, and the second gate and the second source are separately electrically connected to the lead frame.
The package structure of the common-source common-gate gallium nitride field-effect transistor according to claim 1, wherein a package body covers the lead frame, the gallium nitride field-effect transistor, and the metal oxide semiconductor.
Device structures
Layer stacks claimed or described, ordered top of device to substrate.
package structure of common-source common-gate gallium nitride field-effect transistor
metal oxide semiconductorhorizontal MOS second matrix (with second drain, second gate, second source on surface side)
GaNGaN FET first matrix (with first drain, first gate, first source on surface side)
lead framelead frame
Materials
Materials described outside the worked examples.
gallium nitride
GaN
Transistor Channel/Matrix Material For GaN FET
metal oxide semiconductor
Horizontal MOS Transistor Matrix Material
Why these are connected
Related documents with shared materials, methods, properties, or citations.
A package structure of a common-source common-gate gallium nitride field-effect transistor, comprising: a lead frame; a gallium nitride field-effect transistor, comprising a first matrix directly disposed on the lead frame, wherein a first drain, a first gate, and a first source are disposed on a surface side of the first matrix, and the first drain and the first gate are separately electrically connected to the lead frame; and a metal oxide semiconductor, comprising a second matrix directly disposed on the lead frame, wherein a second drain, a second gate, and a second source are disposed on a surface side of the second matrix, and the second drain is directly electrically connected to the first source, and the second gate and the second source are separately electrically connected to the lead frame.
The package structure of the common-source common-gate gallium nitride field-effect transistor according to claim 1, wherein a package body covers the lead frame, the gallium nitride field-effect transistor, and the metal oxide semiconductor.
Device structures
Layer stacks claimed or described, ordered top of device to substrate.
package structure of common-source common-gate gallium nitride field-effect transistor
metal oxide semiconductorhorizontal MOS second matrix (with second drain, second gate, second source on surface side)
GaNGaN FET first matrix (with first drain, first gate, first source on surface side)
lead framelead frame
Materials
Materials described outside the worked examples.
gallium nitride
GaN
Transistor Channel/Matrix Material For GaN FET
metal oxide semiconductor
Horizontal MOS Transistor Matrix Material
Why these are connected
Related documents with shared materials, methods, properties, or citations.